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Topic Area: Nanomanufacturing

Displaying records 21 to 30 of 77 records.
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21. Development of the Metrology and Imaging of Cellulose Nanocrystals
Topic: Nanomanufacturing
Published: 9/19/2011
Authors: Michael T Postek, Andras Vladar, John A. Dagata, Natalia Farkas, Bin Ming, Ryan Wagner, Arvind Raman, Robert J Moon, Ronald Sabo, Theodore H Wegner, James Beecher
Abstract: The development of metrology for nanoparticles is a significant challenge. Cellulose nanocrystals (CNC) are one group of nanoparticles that have high potential economic value but present substantial challenges to the development of the measurement ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905543

22. Review of Current Progress in Nanometrology with Helium Ions
Topic: Nanomanufacturing
Published: 9/19/2011
Authors: Michael T Postek, Andras Vladar, Bin Ming, Charles Archie
Abstract: Scanning electron microscopy has been employed as an imaging and measurement tool for more than 50 years and it continues as a primary tool in many research and manufacturing facilities across the world. A new challenger to this work is the helium ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905541

23. The New Steel? Enabling the Carbon Nanomaterials Revolution: Markets, Metrology, Safety, and Scale-up
Series: Special Publication (NIST SP)
Report Number: 6203-1
Topic: Nanomanufacturing
Published: 8/31/2011
Author: James Alexander Liddle
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908990

24. GaN Nanowires Grown by Molecular Beam Epitaxy
Topic: Nanomanufacturing
Published: 8/1/2011
Authors: Kristine A Bertness, Norman A Sanford, Albert Davydov
Abstract: The unique properties of GaN nanowires grown by molecular beam epitaxy are reviewed. These properties include the absence of residual strain, exclusion of most extended defects, long photoluminescence lifetime, low surface recombination velocity,and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909502

25. O2 A-band line parameters to support atmospheric remote sensing. Part II: The rare isotopologues
Topic: Nanomanufacturing
Published: 7/21/2011
Authors: Joseph Terence Hodges, David A Long, Daniel K Havey, S. S. Yu, M Okumura, Charles E Miller
Abstract: Frequency-stabilized cavity ring-down spectroscopy (FS-CRDS) was employed to measure over 100 transitions in the R-branch of the b1Σg+←X3Σg-(0,0) band for the rare O2 isotopologues. The use of 17O- and 18O-enriched mixtures allowed fo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907932

26. Modeling for Accurate Dimensional Scanning Electron Microscope Metrology: Then and Now
Topic: Nanomanufacturing
Published: 7/20/2011
Authors: Michael T Postek, Andras Vladar
Abstract: A review of the evolution of modeling for accurate dimensional scanning electron microscopy is presented with an emphasis on developments in the Monte Carlo technique for SEM dimensional metrology. The progress of modeling for accurate metrology is d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908153

27. Highly selective GaN-nanowire/TiO2-nanocluster hybrid sensors for detection of benzene and related environment pollutants
Topic: Nanomanufacturing
Published: 6/15/2011
Author: Norman A Sanford
Abstract: Nanowire‹nanocluster hybrid chemical sensors were realized by functionalizing gallium nitride (GaN) nanowires (NWs) with titanium dioxide (TiO2) nanoclusters for selectively sensing benzene and other related aromatic compounds. Hybrid sensor device ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909995

28. Traceable Calibration of a Critical Dimension Atomic Force Microscope
Topic: Nanomanufacturing
Published: 6/6/2011
Authors: Ronald G Dixson, Ndubuisi George Orji, Craig Dyer McGray, Jon C Geist
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. One component of this effort is a custom in-house metrology AFM, called the calibrated AFM (C-AFM). The NI ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908552

29. Lithography, Metrology and Nanomanufacturing
Topic: Nanomanufacturing
Published: 4/12/2011
Authors: James Alexander Liddle, Gregg M. Gallatin
Abstract: Semiconductor chip manufacturing is by far the predominant nanomanufacturing technology in the world today. Top-down lithography techniques are used for fabrication of logic and memory chips since, in order to function, these chips must essentially b ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907745

30. The effect of growth orientation and diameter on the elasticity of GaN Nanowires - a combined insitu TEM and atomistic modeling investigation
Topic: Nanomanufacturing
Published: 12/20/2010
Authors: Kristine A Bertness, Norman A Sanford, Albert Davydov
Abstract: We characterized the elastic properties of GaN nanowires grown along different crystallographic orientations. In situ transmission electron microscopy tensile tests were conducted using a MEMS-based nanoscale testing system. Complementary atomistic s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906878



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