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You searched on: Topic Area: Nanomanufacturing

Displaying records 21 to 30 of 39 records.
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21. High-voltage Nanoimprint Lithography of Refractory Metal Film
Topic: Nanomanufacturing
Published: 7/1/2010
Authors: John A Dagata, Natalia Farkas, R Ramsier
Abstract: Local oxidation of metal, semiconductor, and polymer surfaces has provided a common basis from which to explore fundamental principles of nanolithography and prototype functional nanostructures for many years now. This article summarizes an investiga ...

22. Measuring the Structure of Epitaxially Assembled Block Copolymer Domains with Soft X-ray Diffraction
Topic: Nanomanufacturing
Published: 11/30/2009
Authors: Gila Stein, James Alexander Liddle, Andrew Aquila, Eric M Gullikson
Abstract: The size, shape, and roughness of poly(styrene-b-methyl methacrylate) block copolymer domains assembled on an epitaxial template are characterized with soft x-ray diffraction. The domain size and shape are deformed when the dimensions of the epitax ...

23. Measurement Traceability and Quality Assurance in a Nanomanufacturing Environment
Topic: Nanomanufacturing
Published: 9/25/2009
Authors: Ndubuisi George Orji, Ronald G Dixson, Aaron Cordes, Benjamin Bunday, John Allgair
Abstract: A key requirement for nano-manufacturing is maintaining acceptable traceability of measurements performed to determine size. Given that properties and functionality at the nanoscale are governed by absolute size, maintaining the traceability of dimen ...

24. 2nd Annual Tri-National Workshop on Standards for Nanotechnology - (NIST presentations)
Topic: Nanomanufacturing
Published: 12/10/2008
Authors: Ronald G Dixson, Jon Robert Pratt, Vincent A Hackley, James Edward Potzick, Richard A Allen, Ndubuisi George Orji, Michael T Postek, Herbert S Bennett, Theodore Vincent Vorburger, Jeffrey A Fagan, Robert L. Watters
Abstract: A new era of cooperation between North American National Measurement Institutes (NMIs) was ushered by the National Research Council of Canada Institute for National Measurement Standards (NRC-INMS) on February 7, 2007 when the first Tri-National wo ...

25. Blind estimation of general tip shape in AFM imaging
Topic: Nanomanufacturing
Published: 12/1/2008
Authors: Fenglei Tian, Xiaoping Qian, John S Villarrubia
Abstract: The use of flared tip and bi-directional servo control in some recent atomic force microscopes (AFM) has made it possible for these advanced AFMs to image structures of general shapes with undercuts and reentrant surfaces. Since AFM images are distor ...

26. Helium Ion Microscopy and its Application to Nanotechnology and Nanometrology
Topic: Nanomanufacturing
Published: 11/4/2008
Authors: Michael T Postek, Andras Vladar

Topic: Nanomanufacturing
Published: 10/19/2008
Authors: Jing Li, Yin-Lin Shen, Jaehwa Jeong, Fredric Scire, John A Kramar
Abstract: A compact, two-stage, vertical actuator with built-in sensors has been developed for the Molecular Measuring Machine (M3) and other potential precision instrumentation applications, such as scanning probe microscopy (SPM). In this article, we descri ...

Topic: Nanomanufacturing
Published: 10/19/2008
Authors: Jun-Feng Song, Li Ma, Theodore Vincent Vorburger, Susan M Ballou
Abstract: In the ballistics measurements and correlations, optimum selection of c has particular importance for an unambiguous extraction of Individual Characteristics from the Class Characteristics . Poorly selected c might result in the Class Character ...

29. International photomask linewidth comparison by NIST and PTB
Topic: Nanomanufacturing
Published: 10/17/2008
Authors: James Edward Potzick, Ronald G Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Egbert Buhr, Bernd Bodermann, Wolfgang Hassler-Grohne, Harald Bosse, C.G. Frase
Abstract: In preparation of the international Nano1 linewidth comparison on photomasks between 8 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to tes ...

30. Re-calibration of the NIST SRM 2059 Master Standard using Traceable Atomic Force Microscope Metrology
Topic: Nanomanufacturing
Published: 10/17/2008
Authors: Ronald G Dixson, James Edward Potzick, Ndubuisi George Orji
Abstract: The National Institute of Standards and Technology (NIST) has had a robust program in photomask dimensional metrology since the late 70s when the late Diana Nyyssonen and coworkers developed the first chrome-on-glass (COG) Standard Reference Materi ...

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