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Topic Area: Metrology
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Displaying records 811 to 820 of 850 records.
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811. Uncertainty and Dimensional Calibrations
Topic: Metrology
Published: 11/1/1997
Authors: Theodore D Doiron, John Richard Stoup
Abstract: The calculation of uncertainty for a measurement is an effort to set reasonable bounds for the measurement result according to standardized rules. Since every measurement produces only an estimate of the answer, the primary requisite of an uncertaint ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820840

812. Uncertainty in Measurement of the Maximum Cutting Tool Temperature by Infrared Thermography
Topic: Metrology
Published: 6/13/2014
Authors: Brandon M Lane, Eric Paul Whitenton, Viswanathan Madhavan, M Alkan Donmez
Abstract: This paper presents an analysis of the uncertainty in measurement of the peak temperature on the side face of a cutting tool by infrared thermography. An analytical method uses the temperature measurement equation to study the uncertainty arising f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915534

813. Uncertainty of temperature measurements by infrared thermography for metal cutting applications
Topic: Metrology
Published: 12/31/2013
Authors: Brandon M Lane, Eric Paul Whitenton, Viswanathan Madhavan, M Alkan Donmez
Abstract: This paper presents the methodology and results of a comprehensive measurement uncertainty analysis for infrared thermography of a cutting tool during the metal cutting process. The analysis is based on a commercial off-the-shelf (COTS) camera, ty ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913632

814. Understanding Scanned Probe Oxidation of Silicon
Topic: Metrology
Published: 1/1/1998
Authors: John A. Dagata, T Inoue, J Itoh, H Yokoyama
Abstract: A model for scanned probe microscope (SPM) silicon oxidation is presented. The model was derived from a consideration of the space-charge dependence of this solid-state reaction as a function of substrate doping type/level and has been verified exper ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821775

815. Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version)
Topic: Metrology
Published: 1/31/2000
Authors: J Allgair, C Archie, W Banke, H Bogardus, A Delaporte, Michael T Postek, J Schlesinger, B Singh, Andras Vladar, A Yanof
Abstract: The Advanced Metrology Advisory Group (AMAG) comprised of representatives from: the International SEMATECH (ISEMATECH) consortium member companies; the National Institute of Standards and Technology; and ISEMATECH assignees have joined to develop a u ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823125

816. Update on DMIS Certification
Topic: Metrology
Published: 10/1/2009
Author: William G Rippey
Abstract: The Dimensional Standards Consortium (DMSC) and the National Institute of Standards and Technology (NIST) announced the rollout of the DMSC's DMIS Certification Program at the International Manufacturing Technology Show (IMTS), September 2008. Th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903180

817. Updated NIST Photomask Linewidth Standard
Topic: Metrology
Published: 1/1/2003
Authors: James Edward Potzick, J Pedulla, Michael T. Stocker
Abstract: NIST is preparing to issue the next generation in its line of binary photomask linewidth standards. Called SRM 2059, it was developed for calibrating microscopes used to measure linewidths on photomasks, and consists of antireflecting chrome line and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821970

818. Updated NIST Photomask Linewidth Standard
Topic: Metrology
Published: 5/1/2003
Authors: J Pedulla, James Edward Potzick, Michael T. Stocker
Abstract: NIST is preparing to issue the next generation in its line of binary photomask linewidth standards. Called SRM 2059, it was developed for calibrating microscopes used to measure linewidths on photomasks, and consists of antireflecting chrome line and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822399

819. User Manual for the Interim Testing Artifact for CMMs
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5602
Topic: Metrology
Published: 2/1/1995
Authors: Amy Singer, J Land, Steven David Phillips, Daniel S Sawyer, Bruce R. Borchardt, Gregory W Caskey, et al
Abstract: The Interim Testing Artifact (ITA) is designed to quickly test CMMs for performance problems so that they can be repaired before significant numbers of good parts are erroneously rejected (or bad parts accepted) by the CMM. Frequent testing using the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820767

820. User's Manual for the Program MONEL-I: Monte Carlo Simulation of SEM Signals for Linewidth Metrology
Series: Technical Note (NIST TN)
Report Number: 400
Topic: Metrology
Published: 1/1/1995
Authors: J R. Lowney, Egon Marx
Abstract: This user's manual is a guide to the FORTRAN code MONSEL-I which is a Monte Carlo simulation of the transmitted and backscattered electron signals in a scanning electron microscope (SEM) associated with a line specimen with a trapezoidal cross sectio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820688



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