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Topic Area: Metrology
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Displaying records 11 to 20 of 855 records.
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11. 2nd Annual Tri-National Workshop on Standards for Nanotechnology - (NIST presentations)
Topic: Metrology
Published: 12/10/2008
Authors: Ronald G Dixson, Jon Robert Pratt, Vincent A Hackley, James Edward Potzick, Richard A Allen, Ndubuisi George Orji, Michael T Postek, Herbert S Bennett, Theodore Vincent Vorburger, Jeffrey A Fagan, Robert L. Watters
Abstract: A new era of cooperation between North American National Measurement Institutes (NMIs) was ushered by the National Research Council of Canada Institute for National Measurement Standards (NRC-INMS) on February 7, 2007 when the first Tri-National wo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824641

12. 3D Ground-Truth Systems for Object/Human Recognition and Tracking
Topic: Metrology
Published: 6/28/2013
Authors: Afzal A Godil, Roger V Bostelman, Kamel Shawki Saidi, William P Shackleford, Geraldine S Cheok, Michael O Shneier, Tsai Hong Hong
Abstract: We have been researching 3D ground-truth systems for performance evaluation of vision and perception systems in the fields of smart manufacturing and robotics safety. In this paper we first present an overview of different systems that have been used ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913818

13. 3D Image Correction of Tilted Sample Through Coordinate Transformation
Topic: Metrology
Published: 1/1/2007
Authors: Wei Chu, Joseph Fu, Ronald G Dixson, Theodore Vincent Vorburger
Abstract: In scanned probe measurements of micrometer- or nanometer-scale lines, it is nearly impossible to maintain the sample in a perfectly level position, and even a small amount of tilt angle can contribute to the accuracy of the result of measurand such ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823244

14. A Benefit/Cost Model for Metrology in Manufacturing
Topic: Metrology
Published: 10/24/2005
Author: James Edward Potzick
Abstract: Every measurement of a feature's size or placement on a wafer or photomask is made for a reason. Usually a measurement leads to a decision, often involving a process adjustment or business transaction, and there are costs and benefits attached to the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822366

15. A COMPACT, COMPOUND ACTUATOR FOR THE MOLECULAR MEASURING MACHINE
Topic: Metrology
Published: 10/19/2008
Authors: Jing Li, Yin-Lin Shen, Jaehwa Jeong, Fredric Scire, John A Kramar
Abstract: A compact, two-stage, vertical actuator with built-in sensors has been developed for the Molecular Measuring Machine (M3) and other potential precision instrumentation applications, such as scanning probe microscopy (SPM). In this article, we descri ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824698

16. A Calibrated Atomic Force Microscope
Topic: Metrology
Published: 1/1/1994
Authors: T Mcwaid, J Schneir
Abstract: Atomic force microscope (AFM) is a rapidly emerging measurement technology. As the technology develops, it is being incorporated into industrial research and development, and manufacturing facilities. At present there are no sub-micrometer pitch or s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820693

17. A Calibrated Atomic Force Microscope
Topic: Metrology
Published: 1/1/1994
Authors: T Mcwaid, J Schneir, Theodore Vincent Vorburger
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901971

18. A Careful Consideration of the Calibration Concept
Series: Journal of Research (NIST JRES)
Topic: Metrology
Published: 3/1/2001
Authors: Steven David Phillips, William Tyler Estler, Theodore D Doiron, K Eberhardt, M Levenson
Abstract: This paper is a detailed discussion of the technical aspects of the calibration process with emphasis on the definition of the measurand, the conditions under which the calibration results are valid, and the subsequent use of the calibration results ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823126

19. A Careful Consideration of the Calibration Concept
Topic: Metrology
Published: 1/1/2001
Authors: Steven David Phillips, William Tyler Estler, Theodore D Doiron, K Eberhardt, M. Levenson
Abstract: This paper is a detailed discussion of the technical aspects of the calibration process with emphasis on the definition of the measurand, the conditions under which the calibration results are valid, and the subsequent use of the calibration results ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824612

20. A Constrained Monte Carlo Simulation Method for the Calculation of CMM Measurement Uncertainty
Topic: Metrology
Published: 1/1/1999
Authors: Steven David Phillips, Bruce R. Borchardt, Daniel S Sawyer, William Tyler Estler, K Eberhardt, M Levenson, Marjorie A McClain, Ted Hopp
Abstract: We describe a Monte Carlo simulation technique where known information about a metrology system is employed as a constraint to distinguish the errors associated with the instrument under consideration from the set of all possible instrument errors. T ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820941



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