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Topic Area: Metrology
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Displaying records 831 to 840 of 855 records.
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831. Photomask Linewidth Measurement Uncertainty: An Alternative Approach via Stepper Emulation
Topic: Metrology
Published: 1/1/1994
Author: James Edward Potzick
Abstract: The most significant contribution to uncertainty in the measurement of photomask linewidths is the rough shape of the edge of the etched chrome lines. This uncertainty can be greatly reduced if the emulated stepper aerial image of the feature is meas ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820708

832. Precision Engineering/Precision Optics in Japan:  Status, Technology and Culture
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5491
Topic: Metrology
Published: 1/1/1994
Author: Christopher J. Evans
Abstract: Precision engineering and precision optics are commercially and strategically important enabling technologies. The character of precision engineering research and development in Japan is different from that in the U.S. and Europe; these differences a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820681

833. Rapid Post-Polishing of Diamond-Turned Optics
Topic: Metrology
Published: 1/1/1994
Authors: R E. Parks, Christopher J. Evans
Abstract: A simple technique for post-polishing single-point, diamond-turned optics is described. Synthetic fabric-faced laps are used. Surface finish converges to a limiting value set by process parameters. Lap construction and diamond grit size affects both ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820697

834. Scanning Electron Microscope Metrology
Topic: Metrology
Published: 1/1/1994
Author: Michael T Postek
Abstract: During the manufacturing of present-day integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high degree of precision. Optical microscopy, scanning electron microscopy and the various form ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820702

835. Some Considerations for a Measurement Strategy for Circular Features
Topic: Metrology
Published: 1/1/1994
Authors: Howard H. Harary, C Buchard, P L heritier, J Dufraigne, P Chollet
Abstract: The careful study of manufactured parts is a prerequisite for their intelligent inspection. For this study, we conducted a survey of the processes for making holes by manufacturing a set of test parts using ten different machining processes. The hole ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820683

836. Standards for Coordinate Measuring Machines,
Topic: Metrology
Published: 1/1/1994
Authors: Steven David Phillips, Bruce R. Borchardt, Gregory W Caskey, David E Ward, Daniel S Sawyer, P Snoots, K Harrell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820699

837. Strategy for Post-Process Control of a Machine Tool
Topic: Metrology
Published: 1/1/1994
Authors: Theodore Vincent Vorburger, K Yee, Brian R Scace, F Rudder
Abstract: The automated control of machine-tool accuracy is discussed based on a quality architecture containing three control loops: real-time, process-intermittent, and post-process. This paper highlights the post-process loop. The architecture is being impl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820726

838. TOF-SIMS Imaging of STM-Modified Semiconductor Surfaces
Topic: Metrology
Published: 1/1/1994
Authors: J. Bennett, John A Dagata
Abstract: Not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820670

839. The Design of an Atomic Force Microscope for Metrology
Topic: Metrology
Published: 1/1/1994
Authors: T Mcwaid, J Schneir
Abstract: Atomic force microscope (AFM) is a rapidly evolving technique which has been used in numerous academic studies since its invention eight years ago. AFM manufacturers are now marketing instruments for industrial metrology applications. The National In ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820694

840. The Development of a Calibrated Atomic Force Microscope
Topic: Metrology
Published: 1/1/1994
Authors: T Mcwaid, J Schneir
Abstract: Advances in the manufacture of integrated circuits, x-ray optics, magnetic read-write heads, optical data storage media, razor blades, etc. require advances in ultraprecision metrology. Each of these industries is currently investigating the use of A ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820695



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