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Topic Area: Metrology

Displaying records 841 to 850 of 856 records.
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841. The Development of a Calibrated Atomic Force Microscope
Topic: Metrology
Published: 1/1/1994
Authors: T Mcwaid, J Schneir
Abstract: Advances in the manufacture of integrated circuits, x-ray optics, magnetic read-write heads, optical data storage media, razor blades, etc. require advances in ultraprecision metrology. Each of these industries is currently investigating the use of A ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820695

842. The Geometric Characterization of Rockwell Diamond Indenters
Topic: Metrology
Published: 1/1/1994
Authors: Jun-Feng Song, F Rudder, Theodore Vincent Vorburger, A Hartman, Brian R Scace, J Smith
Abstract: By using a stylus instrument, a series of calibration and check standards, and calibration and uncertainty calculation procedures, we have calibrated Rockwell diamond indenters with a traceability to fundamental measurements. The combined measurement ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820714

843. The International Standard of Length
Topic: Metrology
Published: 1/1/1994
Author: Dennis A Swyt
Abstract: This chapter discusses the modern concept of traceability as it applies to CMM measurements of manufactured parts. It shows the means by which those dimensional measurements are functionally related to the international standard of length, the variou ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820721

844. The NIST/DOE Oak Ridge Centers for Manufacturing Technology Collaboration in Dimensional Metrology
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5482
Topic: Metrology
Published: 1/1/1994
Author: David C Stieren
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820715

845. Traceable Standards for Scanning Electron Microscopy
Topic: Metrology
Published: 1/1/1994
Author: Michael T Postek
Abstract: The emphasis on International Standards Organization (ISO) certification of laboratories has resulted in a renewed interest in NIST traceable standards for scanning electron microscopy (SEM). Under ISO certification, it is mandatory to calibrate and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820996

846. U.S. Navy Coordinate Measuring Machines: A Study of Needs
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5379
Topic: Metrology
Published: 1/1/1994
Authors: David C Stieren, Ralph C. Veale, Howard H. Harary, Shaw C Feng
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820716

847. Ultrashallow Depth Profiling with Time-of-flight Secondary Ion Mass Spectrometry
Topic: Metrology
Published: 1/1/1994
Authors: J. Bennett, John A Dagata
Abstract: Time-of-flight secondary ion mass spectrometry (TOF-SIMS) is an efficient, sensitive method for characterizing semiconductor surfaces. In addition, TOF-SIMS can be applied in a depth profiling mode allowing qualitative characterization of the top 10? ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820671

848. Uncertainties in Dimensional Measurements Made at Nonstandard Temperatures
Topic: Metrology
Published: 1/1/1994
Author: Dennis A Swyt
Abstract: This report examines the effects of uncertainties in temperature and coefficient of thermal expansion on the expanded uncertainty of length dimensional measurements made away from the international standard reference temperature of 20degrees C for ar ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820722

849. Variations in Size Measurements by Indicating Gaging Systems
Topic: Metrology
Published: 1/1/1994
Authors: Ralph C. Veale, A Strang, S Merrit, H Chou
Abstract: The National Institute of Standards and Technology has investigated the efficacy of indicating gaging systems used to measure pitch diameter and functional size of threaded fasteners. Three external systems and four internal systems, representing fou ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820724

850. Junction Locations by Scanning Tunneling Microscopy: In-Air-Ambient Investigation of Passivated GaAs pn Junctions
Topic: Metrology
Published: 9/5/1993
Authors: H. W. Tseng, John A Dagata, Richard M Silver, Joseph Fu, J R. Lowney
Abstract: Scanning tunneling microscopy (STM) and atomic force microscopy operating in air have been used to investigate locations of molecular-beam epitaxially grown GaAs multiple pn junctions cleaved and passivated with P(2)S(5). Symmetrically and asymmetric ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820723



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