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Topic Area: Metrology

Displaying records 831 to 840 of 851 records.
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831. Some Considerations for a Measurement Strategy for Circular Features
Topic: Metrology
Published: 1/1/1994
Authors: Howard H. Harary, C Buchard, P L heritier, J Dufraigne, P Chollet
Abstract: The careful study of manufactured parts is a prerequisite for their intelligent inspection. For this study, we conducted a survey of the processes for making holes by manufacturing a set of test parts using ten different machining processes. The hole ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820683

832. Standards for Coordinate Measuring Machines,
Topic: Metrology
Published: 1/1/1994
Authors: Steven David Phillips, Bruce R. Borchardt, Gregory W Caskey, David E Ward, Daniel S Sawyer, P Snoots, K Harrell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820699

833. Strategy for Post-Process Control of a Machine Tool
Topic: Metrology
Published: 1/1/1994
Authors: Theodore Vincent Vorburger, K Yee, Brian R Scace, F Rudder
Abstract: The automated control of machine-tool accuracy is discussed based on a quality architecture containing three control loops: real-time, process-intermittent, and post-process. This paper highlights the post-process loop. The architecture is being impl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820726

834. TOF-SIMS Imaging of STM-Modified Semiconductor Surfaces
Topic: Metrology
Published: 1/1/1994
Authors: J. Bennett, John A. Dagata
Abstract: Not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820670

835. The Design of an Atomic Force Microscope for Metrology
Topic: Metrology
Published: 1/1/1994
Authors: T Mcwaid, J Schneir
Abstract: Atomic force microscope (AFM) is a rapidly evolving technique which has been used in numerous academic studies since its invention eight years ago. AFM manufacturers are now marketing instruments for industrial metrology applications. The National In ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820694

836. The Development of a Calibrated Atomic Force Microscope
Topic: Metrology
Published: 1/1/1994
Authors: T Mcwaid, J Schneir
Abstract: Advances in the manufacture of integrated circuits, x-ray optics, magnetic read-write heads, optical data storage media, razor blades, etc. require advances in ultraprecision metrology. Each of these industries is currently investigating the use of A ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820695

837. The Geometric Characterization of Rockwell Diamond Indenters
Topic: Metrology
Published: 1/1/1994
Authors: Jun-Feng Song, F Rudder, Theodore Vincent Vorburger, A Hartman, Brian R Scace, J Smith
Abstract: By using a stylus instrument, a series of calibration and check standards, and calibration and uncertainty calculation procedures, we have calibrated Rockwell diamond indenters with a traceability to fundamental measurements. The combined measurement ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820714

838. The International Standard of Length
Topic: Metrology
Published: 1/1/1994
Author: Dennis A Swyt
Abstract: This chapter discusses the modern concept of traceability as it applies to CMM measurements of manufactured parts. It shows the means by which those dimensional measurements are functionally related to the international standard of length, the variou ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820721

839. The NIST/DOE Oak Ridge Centers for Manufacturing Technology Collaboration in Dimensional Metrology
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5482
Topic: Metrology
Published: 1/1/1994
Author: David C Stieren
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820715

840. Traceable Standards for Scanning Electron Microscopy
Topic: Metrology
Published: 1/1/1994
Author: Michael T Postek
Abstract: The emphasis on International Standards Organization (ISO) certification of laboratories has resulted in a renewed interest in NIST traceable standards for scanning electron microscopy (SEM). Under ISO certification, it is mandatory to calibrate and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820996



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