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Topic Area: Metrology

Displaying records 811 to 820 of 851 records.
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811. A Calibrated Atomic Force Microscope
Topic: Metrology
Published: 1/1/1994
Authors: T Mcwaid, J Schneir
Abstract: Atomic force microscope (AFM) is a rapidly emerging measurement technology. As the technology develops, it is being incorporated into industrial research and development, and manufacturing facilities. At present there are no sub-micrometer pitch or s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820693

812. A Calibrated Atomic Force Microscope
Topic: Metrology
Published: 1/1/1994
Authors: T Mcwaid, J Schneir, Theodore Vincent Vorburger
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901971

813. A High Accuracy Micrometer for Diameter Measurements of Cylindrical Standards
Topic: Metrology
Published: 1/1/1994
Authors: John Richard Stoup, Theodore D Doiron
Abstract: NIST has developed a new instrument to measure cylindrical standards including thread wires and plain plug gages. The instrument uses a laser interferometer system which is coupled with an air bearing linear motion slide and precise contact geometry ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820717

814. A Method for the Spatial Calibration of a Commercial Phase Measuring Interferometer - Theoretical Aspects
Topic: Metrology
Published: 1/1/1994
Authors: P Sullivan, Christopher J. Evans
Abstract: In a phase measuring interferometer (PMI), the interference pattern is focused on a charge coupled device (CCD) detector array and data points are sampled at the corresponding locations. In most commercially available systems, a zoom lens forms part ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820718

815. A New Method to Measure the Distance Between Graduation Lines on Graduated Scales
Topic: Metrology
Published: 1/1/1994
Authors: William B. Penzes, Robert Allen, Michael W Cresswell, L Linholm, E Clayton Teague
Abstract: Line scales are used throughout industry for a variety of applications. The most common is the stage micrometer, a small graduated glass scale for the calibration of optical instruments such as microscopes. However, stage micrometers are generally no ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820698

816. A New Workshop Summary Report: Industrial Applications of Scanned Probe Microscopy
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5550
Topic: Metrology
Published: 1/1/1994
Authors: John A. Dagata, A Diebold, C Shih, R Colton
Abstract: An Industrial Applications of Scanned Probe Microscopy (SPM) workshop was held at NIST Gaithersburg on March 24-25 1994. The meeting, co-sponsored by NIST, SEMATECH, ASTM E42.14, and the American Vacuum Society, was attended by over one hundred SPM u ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820677

817. A Novel CMM Interim Testing Artifact
Topic: Metrology
Published: 1/1/1994
Authors: Steven David Phillips, Bruce R. Borchardt, Gregory W Caskey, David E Ward, Bryon S. Faust, Daniel S Sawyer
Abstract: NIST is currently developing equipment and techniques to rapidly access the performance of Coordinate Measuring machines (CMMs). This will allow the frequent testing of CMMs to insure that they measure parts accurately. A novel interim testing artifa ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820700

818. A Study of the Surface Texture of Polycrystalline Phosphor Films Using AFM
Topic: Metrology
Published: 1/1/1994
Authors: Zsolt Revay, J Schneir, D Brower, John S Villarrubia, Joseph Fu, et al
Abstract: Stimulable phosphor thin films are being investigated for use as optical data storage media. We have successfully applied atomic force microscopy (AFM) to the measurement of the surface texture of these films. Determination of the surface texture of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820709

819. Critical Issues in Scanning Electron Microscope Metrology
Topic: Metrology
Published: 1/1/1994
Author: Michael T Postek
Abstract: During the manufacturing of present-day integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high degree of repeatability. Optical microscopy, scanning electron microscopy, and the various ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820701

820. Electron Beam Interaction Modeling as Applied to X-Ray Lithography Mask SEM Linewidth Metrology
Topic: Metrology
Published: 1/1/1994
Authors: Michael T Postek, J R. Lowney, Andras Vladar, William J. Keery, Egon Marx, Robert D. Larrabee
Abstract: This work provides an approach to improved x?ray mask linewidth metrology and a more precise edge location algorithm for measurement of feature sizes on x?ray masks in commercial instrumentation. The transmitted electron detection mode is also useful ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820704



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