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Topic Area: Metrology

Displaying records 781 to 790 of 846 records.
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781. User's Manual for the Program MONEL-I: Monte Carlo Simulation of SEM Signals for Linewidth Metrology
Series: Technical Note (NIST TN)
Report Number: 400
Topic: Metrology
Published: 1/1/1995
Authors: J R. Lowney, Egon Marx
Abstract: This user's manual is a guide to the FORTRAN code MONSEL-I which is a Monte Carlo simulation of the transmitted and backscattered electron signals in a scanning electron microscope (SEM) associated with a line specimen with a trapezoidal cross sectio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820688

782. Working and Check Standards for NIST Surface and Microform Measurements
Topic: Metrology
Published: 1/1/1995
Authors: Jun-Feng Song, Theodore Vincent Vorburger
Abstract: Different working standards and check standards are used in the NIST surface and microform measurement laboratory for calibrating instruments, establishing measurement traceability and control measurement uncertainty. The basic requirements for these ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820773

783. Workshop Report 1: Scanning Electron Microscope Metrology as Related to a Defined Edge Structure
Topic: Metrology
Published: 1/1/1995
Authors: Michael T Postek, Andras Vladar, G Banke, T Reilly
Abstract: An accurate electron beam model is primary to the understanding of the SEM image. Several independently developed Monte Carlo models have been introduced for this purpose and a modeling round-robin has just been conducted to compare the results of th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820756

784. National Institute of Standards and Technology (NIST) J93 Project Interim Report
Topic: Metrology
Published: 12/22/1994
Authors: Michael T Postek, James Edward Potzick, J Schneir, T Mcwaid, Robert D. Larrabee
Abstract: Unavailable.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820705

785. Accuracy in Integrated Circuit Dimensional Measurements
Topic: Metrology
Published: 12/1/1994
Author: James Edward Potzick
Abstract: The measurement of critical dimensions of features on integrated circuits and photomasks is modeled as the comparison of the images of the test object and of a standard object in a measuring device. A length measuring instrument is then a comparator. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820706

786. Improving Photomask Linewidth Measurement Accuracy via Emulated Stepper Aerial Image Measurement
Topic: Metrology
Published: 12/1/1994
Author: James Edward Potzick
Abstract: Photomask linewidth measurements are needed for vendor/buyer communication, for developing specifications and ensuring that products meet specifications, and sometimes for legal compliance. Linewidths are also measured for process monitoring for eith ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820707

787. Parameters Characterizing a Critical Dimension Measurement
Topic: Metrology
Published: 12/1/1994
Authors: Robert D. Larrabee, Michael T Postek
Abstract: There are a number of parameters used to characterize a measurement result for the purposes of specifying its value for the intended purpose. Precision (variability) and accuracy (correctness) are two of the more often used parameters and, like many ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820687

788. Ambient and Vacuum Scanning Tunneling Spectroscopy of Sulfur and Oxygen-Terminated Gallium Arsenide
Topic: Metrology
Published: 11/1/1994
Authors: Richard M Silver, John A. Dagata, H. W. Tseng
Abstract: Tunneling spectroscopy of sulfur- and oxygen-terminated n- and p-type GaAs (110) surfaces is reported for air and ultrahigh-vacuum conditions. Simulations of the complete I-V characteristics with explicit inclusion of surface states within the planar ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820713

789. Comprehensive Study of Parameters for Characterizing 3-D Surface Topography III: Parameters for Amplitude and Some Functional Properties
Topic: Metrology
Published: 11/1/1994
Authors: W Dong, P Sullivan, K Stout
Abstract: It is recognized that profiling techniques have been widely used in industry and academic research for manufacturing control and functional control of surface roughness, in some cases, however, the profiling techniques and two-dimensional (2D) parame ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820679

790. Comprehensive Study of Parameters for Characterizing 3-D Surface Topography IV: Parameters for Characterizing Spatial and Hybrid Properties
Topic: Metrology
Published: 11/1/1994
Authors: W Dong, P Sullivan, K Stout
Abstract: This is the last part in a series of reports describing a comprehensive study of parameters to characterize three-dimensional surface topography. In conjunction with other parts of the report, this paper deals with parameters used to characterize spa ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820680



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