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Topic Area: Metrology

Displaying records 771 to 780 of 856 records.
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771. Damage Processes in Ceramics Resulting from Diamond Tool Indentation and Scratching in Various Environments
Topic: Metrology
Published: 1/1/1995
Authors: A Ruff, H Shin, Christopher J. Evans
Abstract: Studies have been carried out to determine the influence of different chemical environments and tool shapes on damage produced during diamond tool scratching and indenting of two advanced ceramics: chemical-vapor-deposited silicon carbide and a compo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820761

772. Design, Specification and Tolerancing of Micrometer - Tolerance Assembles
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5615
Topic: Metrology
Published: 1/1/1995
Author: Dennis A Swyt
Abstract: As increasing number of economically important products manufactured by U.S. companies are comprised of assemblies of macroscopic parts with microscopic tolerances, that is, parts from a few to hundreds of millimeters in size where the acceptable dev ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820779

773. Development of Rockwell Hardness Standards: From Performance Comparisons to Fundamental Metrology
Topic: Metrology
Published: 1/1/1995
Authors: J Smith, Jun-Feng Song, F Rudder, Theodore Vincent Vorburger
Abstract: Based on the Rockwell diamond indenter's microform calibrations recently developed at NIST, as well as a deadweight standardized Rockwell hardness machine, the NIST Rockwell hardness standard calibration has been established. Our approach makes i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820768

774. Device Fabrication by Scanned Probe Oxidation
Topic: Metrology
Published: 1/1/1995
Author: John A Dagata
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820729

775. Enhanced Machinability of Silicon Carbide via Microstructural Design
Topic: Metrology
Published: 1/1/1995
Authors: Nitin P Padture, Christopher J. Evans, Hockin D. Xu, Brian Ronald Lawn
Abstract: The machinability of a heterogeneous silicon carbide with weak interphase boundaries, elongated grains, and high internal stresses is evaluated relative to a homogeneous control material with a well-bonded, equiaxed, and unstressed grain structure. D ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820752

776. Error Compensation for CMM Touch Trigger Probes
Topic: Metrology
Published: 1/1/1995
Authors: William Tyler Estler, Steven David Phillips, Bruce R. Borchardt, Ted Hopp, Christoph Johann Witzgall, M Levenson, et al
Abstract: We present the analysis of a simple mechanical model of a common type of kinematic seat touch trigger probe widely used on modem coordinate measuring machines (CMMs). The model provides a quantitative description of the pre-travel variation or probe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820736

777. Fabrication of Optics by Diamond Turning
Topic: Metrology
Published: 1/1/1995
Authors: Richard L. Rhorer, Christopher J. Evans
Abstract: The use of special machine tools with single-crystal diamond-cutting tools to produce metal optics is called diamond turning. The manufacture of optical surfaces by diamond turning is relatively new compared to the traditional optical-polishing metho ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820759

778. Finishing Performance and Wear Mechanisms of Cubic Boron Nitride Tools in Turning Hardness 52100 Steels
Topic: Metrology
Published: 1/1/1995
Authors: Y K Chou, M Barash, Christopher J. Evans
Abstract: This study investigated the performance and wear behavior of different cubic boron nitride (CBN) tools in finish turning of hardened 52100 steels. Tool performance was evaluated based on surface finish and flank wear land width. Wear mechanisms of CB ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820728

779. Increasing the Value of Atomic Force Microscopy Process Metrology Using a High-Accuracy Scanner, Tip Characterization, and Morphological Image Analysis
Topic: Metrology
Published: 1/1/1995
Authors: J Schneir, John S Villarrubia, T Mcwaid, V W. Tsai, Ronald G Dixson
Abstract: Atomic force microscopes are being used increasingly for process metrology. As a case study, the measurement by atomic force microscope of a soda lime glass optical disk patterned using optical lithography and reactive plasma etching is examined. The ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820816

780. Interferometer Bandwidth Expanded by Software
Topic: Metrology
Published: 1/1/1995
Author: P Sullivan
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820777



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