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Topic Area: Metrology

Displaying records 771 to 780 of 846 records.
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771. Measurement and Analysis of Forces in Grinding of Silicon Nitride
Topic: Metrology
Published: 1/1/1995
Authors: S Jahanmir, T W. Hwang, Eric Paul Whitenton, S Job, Christopher J. Evans
Abstract: Using an instrumented surface grinder, the two components of grinding forces (normal and tangential) were measured for different types of silicon nitride ceramics. The influences of grinding parameters, such as down feed and table speed, and grinding ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820742

772. Measurement of Patterned Film Linewidth for Interconnect Characterization
Topic: Metrology
Published: 1/1/1995
Authors: L Linholm, Robert Allen, Michael W Cresswell, Rathindra Ghoshtagore, S Mayo, H Schafft, John A Kramar
Abstract: The results from high-quality electrical and physical measurements on the same cross-bridge resistor test structure with approximately vertical sidewalls have shown differences in linewidth as great as 90 nm for selected conductive films. These diffe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820744

773. Measuring Long Gage Blocks with the NIST Line Scale Interferometer
Series: Technical Note (NIST TN)
Report Number: 1410
Topic: Metrology
Published: 1/1/1995
Author: John S Beers
Abstract: An improved method for temporarily converting long gage blocks into line scales is described. The new process employs fused silica rather than previously used steel conversion gage blocks. Conversion blocks are pairs of small (13 mm) gage blocks with ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820727

774. Performance Evaluations
Topic: Metrology
Published: 1/1/1995
Author: Steven David Phillips
Abstract: The subject of coordinate measuring machine (CMM) evaluation is a broad an multifaceted one. The theme of this chapter is the evaluation of CMM measurement uncertainty which is central to the concept of traceability. This chapter elucidates the sourc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820995

775. Pitch Diameter Measurement of Threaded Gages Using a CMM
Topic: Metrology
Published: 1/1/1995
Authors: Ralph C. Veale, Edgar G Erber, Bruce R. Borchardt
Abstract: The reference datum for a screw thread is the pitch diameter cylinder. Although a defined method within the United states for pitch diameter measurement exists, it does not follow worldwide procedures, and the complexity and uncertainties associated ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820782

776. Progress in Tip Modeling
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5640
Topic: Metrology
Published: 1/1/1995
Author: John S Villarrubia
Abstract: Progress since the last Industrial Applications of Scanned Probe Microscopy workshop in the estimation of tip geometries for scanned probe microscopes is discussed. A new method which does not require calibration of the tip characterizers has been de ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820783

777. SPM-Based Lithography for Electronics Device Fabrication: New Strategies and Directions
Topic: Metrology
Published: 1/1/1995
Author: John A. Dagata
Abstract: Direct patterning of a semiconductor surface to produce an ultrathin oxide mask has proven to be a promising approach for integrating lithographic methods based on scanned probe microscopy (SPM) into existing electronics device processing. The result ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820730

778. Scanning Electron Microscopy at the National Institute of Standards and Technology
Topic: Metrology
Published: 1/1/1995
Author: Michael T Postek
Abstract: An attitude has developed that the results of any SEM measurement arc absolutely true. If this were the case, there would be no need for standards and no metrological problems would exist in making submicrometer measurements. Multiple, basic errors a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820755

779. Scattering by a Dielectric Wedge: Oblique Incidence
Topic: Metrology
Published: 1/1/1995
Author: Egon Marx
Abstract: The scattering of a plane monochromatic wave by an infinite dielectric wedge is discussed for arbitrary direction of incidence and polarization. Two sets of coupled integral equations for an unknown surface function are derived. The behavior of the f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820746

780. Summary Report: Second Workshop in Industrial Applications of Scanned Probe Microscopy
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5752
Topic: Metrology
Published: 1/1/1995
Authors: John A. Dagata, A Diebold, C Shih, R Colton
Abstract: The Second Workshop on Industrial Applications of Scanned Probe Microscopy (IASPM) was held at the National Institute of Standards and Technology (NIST) Gaithersburg on May 2-3, 1995. The meeting, co-sponsored by NIST, SEMATECH, the American Society ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820731



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