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Topic Area: Semiconductors

Displaying records 131 to 140 of 147 records.
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131. Characterization of Pore Structure in Nanoporous Low-Dielectric Constant Thin Film by Neutron Porosimetry X-Ray Porosimetry
Topic: Semiconductors
Published: 7/2/2004
Authors: R C. Hedden, Hae-Jeong Lee, Christopher L Soles, Barry J. Bauer
Abstract: A small-angle neutron scattering (SANS) porosimetry technique is presented for characterization of pore structure in nanoporous thin films. The technique is applied to characterize a spin-on organosilicate low dielectric constant (low-k) material wi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852279

132. Compound Semiconductor Roadmap Embedded in the 2003 International Technology Roadmap for Semiconductors
Topic: Semiconductors
Published: 7/1/2004
Author: Herbert S Bennett
Abstract: This paper contains higlights from a technology roadmap on compound semiconductors. This roadmap is part on an overall technology roadmap on RF and analog-mixed signal (AMS) technologies for wireless communications that is in the 2003 International T ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31661

133. Valence and Conduction Band Offsets of a ZrO2/SiOxNy/n-Si CMOS Gate Stack: A Combined Photoemission and Inverse Photoemission Study
Topic: Semiconductors
Published: 4/2/2004
Authors: Safak Sayan, Robert A Bartynski, Xin Zhao, Evgeni Gusev, David V Vanderbilt, Mark Croft, M M Banaszak-Holl, Eric Garfunkel
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906325

134. Semiconductor Factory and Equipment Time Synchronization
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 7088
Topic: Semiconductors
Published: 2/25/2004
Authors: YaShian Li-Baboud, Brad Van Eck
Abstract: With the advent of e-manufacturing including automated process control (APC), such as fault detection classification (FDC), more stringent accuracy requirements for time stamps are required to perform analysis intended for process and business critic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31600

135. Raman and Magneto Transport Studies of MBE Grown B-FeSi2, B-(Fe1-xCrx)Si2, and B-(Fe1-xCox)Si2
Topic: Semiconductors
Published: 5/1/2002
Authors: A Srujana, A Wadhawan, K Srikala, R L Cottier, W Zhao, Christopher Littler, J M. Perez, T D Golding, Anthony Birdwell, W Henrion, M Rebien, P Stauss, R Glosser
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906323

136. A Combinatorial Methodology to Discovering the Material Factors Controlling Resist Line Edge Roughness, Shape, and Critical Dimension
Topic: Semiconductors
Published: 1/28/2002
Authors: Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald Leland Jones, Eric K Lin, Christopher L Soles, Wen-Li Wu, D M Goldfarb, M Angelopoulos
Abstract: A combinatorial research methodology is discussed to determine the material factors that control line edge roughness (LER), shape, and critical dimension (CD) of developed photo-resist features. The approach involves generating a gradient of process ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852808

137. Reliability of Ultra-Thin Silicon Dioxide Under Substrate Hot-Electronic, Substrate Hot-Hole, and Tunneling Stress
Topic: Semiconductors
Published: 11/1/2001
Authors: Eric M. Vogel, Monica D Edelstein, John S Suehle
Abstract: Substrate hot-electron and substrate hot-hole injection experiments are used to provide insight into defect generation and breakdown of ultra-thin silicon dioxide under constant voltage tunneling stress. Results from substrate hot-electron injection ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=25004

138. Embedded Decoupling Capacitance Materials Characterization
Topic: Semiconductors
Published: 12/1/2000
Author: Jan Obrzut
Abstract: The dielectric constant of the embedded capacitance materials was measured in the frequency range from 100 Hz to 5 GHz. The testing included evaluation of the capacitance density, leakage current, and the effect of HAST on the capacitance. A test sp ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=851697

139. Micromachined Branch Line Coupler in CMOS Technology
Topic: Semiconductors
Published: 6/1/2000
Authors: Mehmet Ozgur, Ulas C. Kozat, Mona Elwakkad Zaghloul, Michael Gaitan
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906354

140. Charaterization of PFC Emissions from Semiconductor Process Tools
Topic: Semiconductors
Published: 9/1/1998
Authors: David S. Green, J. Meyers
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903728



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