NIST logo

Publications Portal

You searched on: Topic Area: Microelectronics Sorted by: title

Displaying records 21 to 30 of 42 records.
Resort by: Date / Title


21. Metrology Needs for TSV Fabrication
Topic: Microelectronics
Published: 3/4/2014
Authors: Victor Vartanian, Richard A Allen, Larry Smith, Klaus Hummler, Steve Olson, Brian Sapp
Abstract: This paper focuses on the metrology needs and challenges of through silicon via (TSV) fabrication, consisting of TSV etch, liner, barrier, and seed (L/B/S) depositions, copper plating, and copper CMP. These TSVs, with typical dimensions within a f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914497

22. Metrology for Nanosystems and Nanoelectronics Reliability Assessments
Topic: Microelectronics
Published: 8/20/2012
Authors: Yaw S Obeng, Chukwudi Azubuike Okoro, Joseph J Kopanski
Abstract: The traditional models and techniques for studying reliability in integrated circuits may not be appropriate for nanoelectronics and nanosystems. In this paper, we present an overview of a number of materials and metrology techniques currently un ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911433

23. Microwave-Based Metrology Platform Development: Application of Broad-Band RF Metrology to Integrated Circuit Reliability Analyses
Topic: Microelectronics
Published: 5/12/2014
Authors: Lin You, Chukwudi Azubuike Okoro, Jungjoon Ahn, Joseph J Kopanski, Yaw S Obeng
Abstract: In this paper we describe the development of a suite of techniques, based on the application of high frequency electromagnetic waves, to probe material and structural changes in integrated circuits under various external perturbations. We discuss how ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915367

24. Noise Characterization of Multiport Amplifiers
Topic: Microelectronics
Published: 10/1/2001
Author: James Paul Randa
Abstract: I address the issue of the definition and measurement of noise figure and parameters to characterize multiport devices, particularly differential amplifiers. A parameterization in terms of the noise matrix appears to be the most practical. the noise ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=5219

25. Noise Temperature Measurements on Wafer
Series: Technical Note (NIST TN)
Report Number: 1390
Topic: Microelectronics
Published: 3/1/1997
Author: James Paul Randa
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=11089

26. Non-destructive Measurement of the Residual Stresses in Copper Through-Silicon Vias using Synchrotron Based Micro-beam X-ray Diffraction
Topic: Microelectronics
Published: 7/1/2014
Authors: Chukwudi Azubuike Okoro, Lyle E Levine, Yaw S Obeng, Klaus Hummler, Ruqing Xu
Abstract: In this study, we report a new method for achieving depth resolved determination of the full stress tensor in buried Cu through-silicon vias (TSVs), using synchrotron based X-ray micro-diffraction technique. Two adjacent Cu TSVs were analyzed; on ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915348

27. On-Wafer Measurement of Transistor Noise Parameters at NIST
Topic: Microelectronics
Published: 4/1/2007
Authors: James Paul Randa, David K Walker
Abstract: NIST has developed the capability to measure noise parameters on a wafer int he 1-12.4 GHz range. We describe the measurement method and the uncertainty analysis and present results of measurements on a very poorly matched transistor.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32348

28. On-Wafer Measurements of Noise Temperature
Topic: Microelectronics
Published: 12/1/1999
Authors: James Paul Randa, Robert L Billinger, Joseph Paul Rice
Abstract: The NIST Noise Project has developed the theoretical formalism and experimental methods for performing accurate noise-temperature measurements on wafer. This report summarizes the theoretical formulation and describes the design, methods, and results ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=27649

29. On-Wafer Noise-Parameter Measurements at NIST
Topic: Microelectronics
Published: 7/14/2006
Authors: James Paul Randa, David K Walker
Abstract: NIST has developed the capability to measure noise parameters on a wafer int he 1-12.4 GHz range. In this paper we briefly describe the measurement methods and the uncertainty analysis and present results of measurements on a very poorly matched tran ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32179

30. Organic Electronics: Challenges and Opportunities
Topic: Microelectronics
Published: 3/31/2010
Author: Calvin Chan
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905389



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series