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Topic Area: Spectroscopy

Displaying records 61 to 70 of 109 records.
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61. Preface to Cavity-Enhanced Spectroscopies
Topic: Spectroscopy
Published: 12/1/2002
Authors: Roger D van Zee, J P. Looney
Abstract: This submission is an introduction to Cavity-Enhanced Spectroscopy, a book which is to be published by Academic Press.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830789

62. Grazing Incidence X-Ray Photoelectron Spectroscopy: A Method to Study Gate Dielectric Films on Si
Topic: Spectroscopy
Published: 11/1/2002
Authors: Terrence J Jach, E Landree
Abstract: Grazing Incidence X-ray Photoelectron Spectroscopy (GIXPS) is a method that offers promise as a non-destructive technique to measure the thickness and chemistry of ultrathin gate dielectric films. It combines aspects of x-ray reflectivity and convent ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831285

63. The NIST Electron Effective-Attenuation-Length Database
Series: OTHER
Topic: Spectroscopy
Published: 2/1/2002
Authors: Cedric John Powell, Aleksander Jablonski
Abstract: The NIST Electron Effective-Attenuation-Length Database provides values of electron effective attenuation lengths (EALs) in solid elements and compounds at selected electron energies between 50 eV and 2,000 eV. The database was designed mainly to pr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831244

64. Influence of Elastic-Electron Scattering on Measurements of Sillicon Dioxide Film Thicknesses by X-Ray Photoelectron Spectroscopy
Topic: Spectroscopy
Published: 9/1/2001
Authors: Cedric John Powell, Aleksander Jablonski
Abstract: We investigate the systematic error due to neglet of elastic scattering of photoelectrons in measurements of the thicknesses of thin films of SiO^d2^ on Si by x-ray photoelectron spectroscopy (XPS). Calulations were made of substrate Si 2p photoelec ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831215

65. Comparisons of Calculated and Measured Effective Attenuation Lengths for Silicon Dioxide Over a Wide Electron Energy Range
Topic: Spectroscopy
Published: 8/1/2001
Authors: Cedric John Powell, Aleksander Jablonski
Abstract: We report calculations of effective attenuation lengths (EALs) for Si 2p photoelectrons in silicon dioxide at photoelectron energies between 82 and 1385 eV. These EALs are compared with measured values reported recently by Shimada et al. [Surf. Inte ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831218

66. Grazing Incidence X-Ray Photoemission Spectroscopy and the Accuracy of Thickness Measurements of CMOS Gate Dielectrics
Topic: Spectroscopy
Published: 8/1/2001
Authors: Terrence J Jach, E Landree
Abstract: Grazing incidence x-ray photoelectron spectroscopy (GIXPS) is a method that offers promise as a non-destructive technique to measure the thickness and chemical state of ultrathin gate dielectric films. This method utilizes the non-linear dependence o ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831227

67. Measurement of 8-Hydroxy-2'-Deoxyadenosine In DNA by Liquid Chromatography/Mass Spectrometry
Topic: Spectroscopy
Published: 8/1/2001
Authors: Pawel Jaruga, H Rodriguez, M Miral Dizdar
Abstract: 8-Hydroxyadenine (8-OH-Ade) is one of the major lesions, which is formed in DNA by hydroxyl radical attack on the C-8 position of adenine followed by oxidation. We describe the measurement of the nucleoside form of this compound, 8-hydroxy-2'-deoxyad ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830242

68. Effects of Elastic-Electron Scattering on Measurements of Silicon Dioxide Film Thicknesses by X-Ray Photoelectron Spectroscopy
Topic: Spectroscopy
Published: 3/1/2001
Authors: Cedric John Powell, Aleksander Jablonski
Abstract: It is now customary for the effects of elastic-electron scattering to be ignored in measurements of the thicknesses of overlayer films by X-ray photoelectron spectroscopy (XPS). It is known, however, that elastic scattering can cause the effective a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831197

69. NIST Data Resources for Surface Analysis by X-Ray Photoelectron Spectroscopy and Auger Electron Spectroscopy
Topic: Spectroscopy
Published: 3/1/2001
Authors: Cedric John Powell, Aleksander Jablonski, A Naumkin, A Kraut-Vass, Joseph M Conny, J R. Rumble
Abstract: A description is given of data resources that are available from the National Institute of Standards and Technology (NIST) for x-ray photoelectron spectroscopy (XPS) and Auger-electron spectroscopy. NIST currently has three databases available: an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831193

70. Current Projects of ISO Technical Committee 201 on Surface Chemical Analysis
Topic: Spectroscopy
Published: 2/1/2001
Author: Cedric John Powell
Abstract: An overview is given of current work projects of Technical Committee 201 on Surface Chemical Analysis of the International Organization for Standardization (ISO). ISTO/TC 201 has subcommittees for Auger electron spectroscopy (AES), secondary ion mas ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831198



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