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You searched on: Topic Area: Chemical Engineering Processing

Displaying records 51 to 60 of 101 records.
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51. Thermodynamic Properties of Vanadium Silicides. I. Standard Molar Enthalpy of Formation {delta}^df^H( of Vanadium Disilicide VSi^d2^ at the Temperature of 298.15K
Topic: Chemical Engineering & Processing
Published: 12/1/1999
Authors: P A O'Hare, K Watling, G A Hope
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100743

52. Thermodynamic Properties of Vanadium Silicides. II. Standard Molar Enthalpy of Formation {delta}^df^Hm 298.15K and Reassessed Thermodynamic Porperties of Trivanadium Monosilicide V^d3^Si
Topic: Chemical Engineering & Processing
Published: 12/1/1999
Authors: P A O'Hare, K Watling, G A Hope
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100744

53. Vapor-Liquid Critical Surface of Ternary Difluoromethane + Pentafluoroethane + 1,1,1,2-Trifluoroethane R-32/125/134a Mixtures
Topic: Chemical Engineering & Processing
Published: 12/1/1999
Author: Y Higashi
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100687

54. Vapor-Liquid Equilibria for the Binary Difluoromethane R-32 + Propane R-290 Mixture
Topic: Chemical Engineering & Processing
Published: 12/1/1999
Author: Y Higashi
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100688

55. Doping Effects and Reversibility Studies on Gas-Exposed alpha-Sexithiophene Thin Films
Topic: Chemical Engineering & Processing
Published: 12/25/1998
Authors: C Kendrick, Stephen Semancik
Abstract: Research on the electronic applications of organic semiconductors is growing rapidly, and both polymeric and small molcule organics are being used in the fabrication of LEDs, transistors, and biological/chemical sensors. As a part of the chemical mic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830590

56. Critical Viscosity of the Ionic Mixture Triethyl n-Hexyl Ammonium Triethyl n-Hexyl borate in Diphenyl Ether
Topic: Chemical Engineering & Processing
Published: 9/15/1998
Authors: S. Wiegand, Robert F Berg, Johanna M.H. Levelt-Sengers
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902025

57. A Molecular Dynamics Study of a Reversed-Phased Liquid Chromatography Model
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6222
Topic: Chemical Engineering & Processing
Published: 9/1/1998
Authors: J T. Slusher, Raymond Dale Mountain
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902011

58. Parametric Analysis of the Propagation of Uncertainties in Sorption Measurements Made with a Pressure-Decay Apparatus
Topic: Chemical Engineering & Processing
Published: 9/1/1998
Authors: J Tighe, J J. Pellegrino
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902018

59. NIST Calibration Services for Gas Flow Meters: Piston Prover and Bell Prover Gas Flow Facilities
Series: Special Publication (NIST SP)
Report Number: 250-49
Topic: Chemical Engineering & Processing
Published: 8/1/1998
Authors: John D Wright, G E. Mattingly
Abstract: This document provides a description of the small and medium range gas flow calibration facilities at the National Institute of Standards and Technology (NIST), Fluid Flow Group, as reported in NIST Special Publication 250 for Test Nos. 18010C-18040C ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830588

60. In Situ Rheometric Shearing Apparatus at the NIST Center for Neutron Research
Topic: Chemical Engineering & Processing
Published: 5/11/1998
Authors: G C. Straty, Chris D Muzny, B D. Butler, M Y Lin, T Slawecki, Charles Joseph Glinka, Howard J. Hanley
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902013



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