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Topic Area: Chemical Engineering
Processing

Displaying records 41 to 50 of 104 records.
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41. Tele-Metrology and Advanced Ultrasonic Flow Metering
Topic: Chemical Engineering & Processing
Published: 12/1/1999
Authors: Pedro I Espina, P I Rothfleisch, Tsyh Tyan Yeh, S A Osella
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100623

42. Tele-Metrology: Remote Flow Meter Calibration
Topic: Chemical Engineering & Processing
Published: 12/1/1999
Author: Pedro I Espina
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100624

43. The Effects of Different Property Models on a Computational Fluid Dynamics Simulation of a Reciprocating Compressor
Topic: Chemical Engineering & Processing
Published: 12/1/1999
Author: A P Peskin
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100746

44. Thermodynamic Properties of Vanadium Silicides. I. Standard Molar Enthalpy of Formation {delta}^df^H( of Vanadium Disilicide VSi^d2^ at the Temperature of 298.15K
Topic: Chemical Engineering & Processing
Published: 12/1/1999
Authors: P A O'Hare, K Watling, G A Hope
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100743

45. Thermodynamic Properties of Vanadium Silicides. II. Standard Molar Enthalpy of Formation {delta}^df^Hm 298.15K and Reassessed Thermodynamic Porperties of Trivanadium Monosilicide V^d3^Si
Topic: Chemical Engineering & Processing
Published: 12/1/1999
Authors: P A O'Hare, K Watling, G A Hope
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100744

46. Thermodynamics of Silicon Nitride. I. Standard Molar Enthalpy of Formation {delta}^df^H^dm^^u0^ at the Temperature 298.15 K of {alpha}-Si^d3^N^d4^ and {epsilon}-Si^d3^N^d4^
Topic: Chemical Engineering & Processing
Published: 12/1/1999
Authors: P A O'Hare, I. Tomaszkiewicz, C. M. Beck II, H. J. Seifert
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100742

47. Vapor-Liquid Critical Surface of Ternary Difluoromethane + Pentafluoroethane + 1,1,1,2-Trifluoroethane R-32/125/134a Mixtures
Topic: Chemical Engineering & Processing
Published: 12/1/1999
Author: Y Higashi
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100687

48. Vapor-Liquid Equilibria for the Binary Difluoromethane R-32 + Propane R-290 Mixture
Topic: Chemical Engineering & Processing
Published: 12/1/1999
Author: Y Higashi
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100688

49. Doping Effects and Reversibility Studies on Gas-Exposed alpha-Sexithiophene Thin Films
Topic: Chemical Engineering & Processing
Published: 12/25/1998
Authors: C Kendrick, Stephen Semancik
Abstract: Research on the electronic applications of organic semiconductors is growing rapidly, and both polymeric and small molcule organics are being used in the fabrication of LEDs, transistors, and biological/chemical sensors. As a part of the chemical mic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830590

50. Inexpensive Vibrational Anharmonicities from Estimated Derivatives: Diatomic Molecules
Topic: Chemical Engineering & Processing
Published: 12/1/1998
Authors: P Hassanzadeh, Karl K Irikura
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901943



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