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Topic Area: Nanotechnology
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Displaying records 51 to 60 of 382 records.
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51. Preparation of Nanoscale TiO2 Dispersions in Biological Test Media for Toxicological Assessment
Series: Special Publication (NIST SP)
Report Number: 1200-4
Topic: Nanotechnology
Published: 6/19/2012
Authors: Julian S. Taurozzi, Vincent A Hackley, Mark R Wiesner
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910683

52. Preparation of Nanoscale TiO2 Dispersions in an Environmental Matrix for Eco-Toxicological Assessment
Series: Special Publication (NIST SP)
Report Number: 1200-5
Topic: Nanotechnology
Published: 6/19/2012
Authors: Julian S. Taurozzi, Vincent A Hackley, Mark R Wiesner
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910684

53. Preparation of a Nanoscale TiO2 Aqueous Dispersion for Toxicological or Environmental Testing
Series: Special Publication (NIST SP)
Report Number: 1200-3
Topic: Nanotechnology
Published: 6/19/2012
Authors: Julian S. Taurozzi, Vincent A Hackley, Mark R Wiesner
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910682

54. Reporting Guidelines for the Preparation of Aqueous Nanoparticle Dispersions from Dry Materials
Series: Special Publication (NIST SP)
Report Number: 1200-1
Topic: Nanotechnology
Published: 6/19/2012
Authors: Julian S. Taurozzi, Vincent A Hackley, Mark R Wiesner
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910681

55. Nanoparticle Size and Shape Evaluation Using the TSOM Method
Topic: Nanotechnology
Published: 6/1/2012
Authors: Bradley N Damazo, Ravikiran Attota, Premsagar Purushotham Kavuri, Andras Vladar
Abstract: A novel through-focus scanning optical microscopy (TSOM) method that yields nanoscale information from optical images obtained at multiple focal planes will be used here for nanoparticle dimensional analysis. The TSOM method can distinguish not only ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911138

56. Controlled dielectrophoretic nanowire self-assembly using atomic layer deposition and suspended microfabricated electrodes
Topic: Nanotechnology
Published: 5/28/2012
Authors: Kristine A Bertness, Joseph J. Brown, Alicia I Baca, Victor M. Bright
Abstract: Effects of design and materials on the dielectrophoretic self-assembly of individual gallium nitride nanowires (GaN NWs) onto microfabricated electrodes have been experimentally investigated. The use of TiO^d2^ surface coating generated by atomic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910631

57. Effect of Diamond Nanolubricant on R134a Pool Boiling Heat Transfer
Topic: Nanotechnology
Published: 5/21/2012
Author: Mark A Kedzierski
Abstract: This paper quantifies the influence of diamond nanoparticles on the boiling performance of R134a/polyolester mixtures on a roughened, horizontal, flat surface. Nanofluids are liquids that contain dispersed nano-size particles. A lubricant based nan ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902857

58. Microscopy for STEM Educators
Topic: Nanotechnology
Published: 5/21/2012
Authors: Michael T Postek, Mary B Satterfield, Bradley N Damazo, Robert Gordon
Abstract: The future of our nation hinges on our ability to prepare our next generation to be innovators in science, technology, engineering and math (STEM). Excitement for STEM must begin at the earliest stages of our education process. Yet, today far too few ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910648

59. Patterned Defect & CD Metrology by TSOM Beyond the 22 nm Node
Topic: Nanotechnology
Published: 4/10/2012
Authors: Ravikiran Attota, Abraham Arceo, Benjamin Bunday, Victor Vertanian
Abstract: Through-focus scanning optical microscopy (TSOM) is a novel method [1-8] that allows conventional optical microscopes to collect dimensional information down to the nanometer level by combining two-dimensional optical images captured at several throu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910910

60. On CD-AFM bias related to probe bending
Topic: Nanotechnology
Published: 4/9/2012
Authors: Vladimir A Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology. To characterize modern semiconductor devices, very small and flexible probes, often 15 nm to 20 nm in diameter, are now frequently used. Several recent publications have reported ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910903



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