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Topic Area: Nanotechnology
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Displaying records 291 to 300 of 342 records.
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291.
What Do We Need to Look Out for When Doing Energy Dispersive X-Ray Analysis in the Environmental Scanning Electron Microscope?
Topic: Nanotechnology
Published: 8/1/1999
Author: Scott A Wight
Abstract: Electron scattering in the environmental scanning electron microscope may contribute x-ray contamination to quantitative analysis. A series of experiments explores at what range and conditions the analyst in the real world needs to be concerned about
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831119
292.
Development of a Triplasmatron Ion Source for the Generation of SF^d5^+ and F- Primary Ion Beams on an Ion Microscope Secondary Ion Mass Spectrometry Instrument
Topic: Nanotechnology
Published: 5/1/1999
Authors: John G Gillen, R Lance King, F Chmara
Abstract: A hot filament duoplasmatron ion source operating with argon has been modified by addition of an enclosed expansion cup mounted to the extraction side of the duoplasmatron anode. Using sulfur hexafluoride (SF^d6^) as a feed gas, this triplasmatron i
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831074
293.
Elemental and Molecular Imaging of Human Hair Using Secondary Ion Mass Spectrometry
Topic: Nanotechnology
Published: 4/1/1999
Authors: John G Gillen, S V. Roberson, C M. Ng, M Stranick
Abstract: Secondary ion mass spectrometry (SIMS) is used to image the spatial distribution of elemental and molecular species on the surface and in cross-sections of doped human hair using a magnetic sector SIMS instrument operated as an ion microprobe. Analy
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831098
294.
Fractal Dimension of Particle Outlines: Meaning, Utility, Limitations, Standard Images and Examples
Topic: Nanotechnology
Published: 4/1/1999
Author: David S. Bright
Abstract: Only a handful of shape parameters, such as aspect ratio and circularity, are in common use for characterizing individual microscopic particles. The fractal dimension, D, is seeing increased use as an additional shape parameter because particle shape
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831092
295.
Preliminary Evaluation of an SF5+ Polyatomic Primary Ion Beam for Analysis of Organic Thin Films by Secondary Ion Mass Spectrometry
Topic: Nanotechnology
Published: 12/1/1998
Authors: John G Gillen, S V. Roberson
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100651
296.
The Formation of Abrupt n+ Doping Profiles Using Atomic Hydrogen and Sb During Si MBE
Topic: Nanotechnology
Published: 12/1/1998
Authors: P E Thompson, C Silvestre, M E Twigg, G Jernigan, David S Simons
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100665
297.
The Southern California Ozone Study 97 Radiocarbon Experiment
Topic: Nanotechnology
Published: 12/1/1998
Authors: George A Klouda, C. W. Lewis, J L Marolf, D C Stiles, K G Kronmiller, K D Oliver, J R Adams
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100653
298.
Standard Test Data for Estimating Peak Parameter Errors in X-Ray Photoelectron Spectroscopy: I. Results for Peak Binding Energies
Topic: Nanotechnology
Published: 10/1/1998
Authors: Joseph M Conny, Cedric John Powell, Lloyd A. Currie
Abstract: Standard test data(STD) are simulations of analytical instrument responses that help determine the veracity of computer-based, data analysis procedures that are typically used with instruments. The STD were developed for determining errors in peak p
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831051
299.
Quantitative secondary ion mass spectrometry imaging of self-assembled monolayer films for electron beam dose mapping in the environmental scanning electron microscope
Topic: Nanotechnology
Published: 7/1/1998
Authors: John G Gillen, Scott A Wight, David S. Bright, T M. Herne
Abstract: Fluorinated alkanethiol self assembled monolayers (SAM) films immobilized on gold substrates have been used as electron-sensitive resists to map quantitatively the spatial distribution of the primary electron beam scattering in an environmental scann
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831060
300.
Atomic Hydrogen for the Formation of Abrupt Sb Doping Profiles in MBE-Grown Si
Topic: Nanotechnology
Published: 5/1/1998
Authors: P E Thompson, C Silvestre, M E Twigg, G Jernigan, David S Simons
Abstract: Previously atomic hydrogen has been shown to be effective in reducing the segregation of Ge on Si[100] during solid source molecular beam epitaxygrowth. In this work we have investigated atomic hydrogen to determine if it is equally effective in red
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831040