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Topic Area: Nanotechnology

Displaying records 71 to 80 of 400 records.
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71. Reporting Guidelines for the Preparation of Aqueous Nanoparticle Dispersions from Dry Materials
Series: Special Publication (NIST SP)
Report Number: 1200-1
Topic: Nanotechnology
Published: 6/19/2012
Authors: Julian S. Taurozzi, Vincent A Hackley, Mark R Wiesner

72. Nanoparticle Size and Shape Evaluation Using the TSOM Method
Topic: Nanotechnology
Published: 6/1/2012
Authors: Bradley N Damazo, Ravikiran Attota, Premsagar Purushotham Kavuri, Andras Vladar
Abstract: A novel through-focus scanning optical microscopy (TSOM) method that yields nanoscale information from optical images obtained at multiple focal planes will be used here for nanoparticle dimensional analysis. The TSOM method can distinguish not only ...

73. Controlled dielectrophoretic nanowire self-assembly using atomic layer deposition and suspended microfabricated electrodes
Topic: Nanotechnology
Published: 5/28/2012
Authors: Kristine A Bertness, Joseph J. Brown, Alicia I Baca, Victor M. Bright
Abstract: Effects of design and materials on the dielectrophoretic self-assembly of individual gallium nitride nanowires (GaN NWs) onto microfabricated electrodes have been experimentally investigated. The use of TiO^d2^ surface coating generated by atomic ...

74. Effect of Diamond Nanolubricant on R134a Pool Boiling Heat Transfer
Topic: Nanotechnology
Published: 5/21/2012
Author: Mark A Kedzierski
Abstract: This paper quantifies the influence of diamond nanoparticles on the boiling performance of R134a/polyolester mixtures on a roughened, horizontal, flat surface. Nanofluids are liquids that contain dispersed nano-size particles. A lubricant based nan ...

75. Microscopy for STEM Educators
Topic: Nanotechnology
Published: 5/21/2012
Authors: Michael T Postek, Mary B Satterfield, Bradley N Damazo, Robert Gordon
Abstract: The future of our nation hinges on our ability to prepare our next generation to be innovators in science, technology, engineering and math (STEM). Excitement for STEM must begin at the earliest stages of our education process. Yet, today far too few ...

76. Patterned Defect & CD Metrology by TSOM Beyond the 22 nm Node
Topic: Nanotechnology
Published: 4/10/2012
Authors: Ravikiran Attota, Abraham Arceo, Benjamin Bunday, Victor Vertanian
Abstract: Through-focus scanning optical microscopy (TSOM) is a novel method [1-8] that allows conventional optical microscopes to collect dimensional information down to the nanometer level by combining two-dimensional optical images captured at several throu ...

77. Significantly Improved Trapping Lifetime of Nanoparticles in an Optical Trap using Feedback Control
Topic: Nanotechnology
Published: 4/10/2012
Authors: Arvind Kumar Balijepalli, Thomas W LeBrun, Jason John Gorman
Abstract: We demonstrate an increase in trapping lifetime for optically trapped nanoparticles by more than an order of magnitude using feedback control. This has been demonstrated through simu- lation and experimental results for 100, nm gold particles and 3 ...

78. On CD-AFM bias related to probe bending
Topic: Nanotechnology
Published: 4/9/2012
Authors: Vladimir A Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology. To characterize modern semiconductor devices, very small and flexible probes, often 15 nm to 20 nm in diameter, are now frequently used. Several recent publications have reported ...

79. Optical fiber-coupled cryogenic radiometer with carbon nanotube absorber
Topic: Nanotechnology
Published: 4/1/2012
Authors: David J Livigni, Nathan A Tomlin, Christopher L Cromer, John H Lehman
Abstract: A cryogenic radiometer was constructed for direct-substitution optical fiber power measurements. The cavity is intended to operate at the 3 K temperature stage of a dilution refrigerator or 4.2 K stage of a liquid cryostat. The optical fiber is remov ...

80. Modeling the effects of acid amplifiers on photoresist stochastics
Topic: Nanotechnology
Published: 3/23/2012
Authors: Gregg M. Gallatin, Patrick Naulleau, Robert Brainard
Abstract: The tradeoff between Resolution, Line Edge Roughness (LER) and Sensitivity, the so called RLS tradeoff, continues to be a difficult challenge, especially for EUV lithography. Acid amplifiers have recently been proposed as a method to improve upon t ...

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