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Author: David Simons

Displaying records 1 to 10 of 58 records.
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1. 99.996% 12C films enriched and deposited in situ
Published: 6/28/2013
Authors: Kevin Joseph Dwyer, Joshua M Pomeroy, David S Simons
Abstract: A mass selected ion beam system is used to isotopically enrich and deposit thin films, which are measured to be 99.9961(4)% 12C. In solid state quantum information, isotopic enrichment of materials has allowed significant improvements in the coheren ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913398

2. Frequentist coverage properties of uncertainty intervals for weak Poisson signals in the presence of background
Published: 2/3/2010
Authors: Kevin J Coakley, Jolene D Splett, David S Simons
Abstract: We construct uncertainty intervals for weak Poisson signals in the presence of background. We consider the case where a primary experiment yields a realization of the signal plus background, and a second experiment yields a realization of the bac ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=150661

3. Characterization of SiGe Films for use as a National Institute of Standards and Technology (NIST) Microanalysis Reference material (RM 8905)
Report Number: 8905
Published: 2/1/2010
Authors: Ryna B. Marinenko, Shirley Turner, David S Simons, Savelas A Rabb, Rolf Louis Zeisler, Lee Lijian Yu, Dale E Newbury, Rick L Paul, Nicholas W m Ritchie, Stefan D Leigh, Michael R Winchester, Lee J Richter, Douglas C Meier, Keana C k Scott, D Klinedinst, John A Small
Abstract: Bulk SiGe wafers cut from single-crystal boules and two SiGe thick films (4 m and 5 m thick) on Si wafers were evaluated with the electron probe microanalyzer for the extent of heterogeneity and composition for use as reference materi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900913

4. Development of Certified Reference Materials of Ion-Implanted Dopants in Silicon for Calibration of Secondary Ion Mass Spectrometers
Published: 11/1/2007
Authors: Robert G Downing, David S Simons, George Paul Lamaze, Richard Mark Lindstrom, Robert Russ Greenberg, Rick L Paul, Susannah B. Schiller, William F Guthrie
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904275

5. Quantitative Surface Analysis of Fe-Ni Alloy Films by XPS, AES and SIMS
Published: 5/21/2007
Authors: David S Simons, K. J. Kim, John G Gillen, D Moon, H Jin, H Kang
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901064

6. Quantitative Depth Profiling of an Alternating Pt/Co Multilayer and a Pt Co Alloy multilayer by SIMS using a Buckminsterfullerene (C60) Source
Published: 5/15/2007
Authors: Kyung Joong Kim, David S Simons, John G Gillen
Abstract: Buckmins erfullerene ion beam has been applied o he dep h profiling of an al erna ing pure P and pure Co mul ilayer. Quan i a ive dep h profiling was performed by secondary ion mass spec rome ry (SIMS) wi h C60 ions using P Co alloy films wi h di ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902088

7. Development of Certified Reference Materials of Ion-Implanted Dopants in Silicon for Calibration of Secondary Ion Mass Spectrometers
Published: 1/1/2007
Authors: David S Simons, Robert G Downing, George Paul Lamaze, Richard Mark Lindstrom, Robert Russ Greenberg, Rick L Paul, Susannah Schiller, William F Guthrie
Abstract: Certified reference materials have been developed for calibration of the concentrations of the most common dopants used in silicon semiconductor technology boron, arsenic, and phosphorus. These materials consist of a single dopant species that is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831437

8. Quantitative Depth Profiling of an Alternating Pt/Co Multilayer and a Pt-Co Alloy Multilayer by SIMS Using a Buckministerfullerene (C^d60^)
Published: 1/1/2007
Authors: K J Kim, David S Simons, John G Gillen
Abstract: A Buckminsterfullerene ion beam has been applied to the depth profiling of an alternating pure Pt and pure Co multilayer. Quantitative depth profiling was performed by secondary ion mass spectrometry (SIMS) with C60 ions using Pt-Co alloy films with ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831431

9. Quantitative Surface Analysis of Fe-Ni Alloy Films by XPS, AES and SIMS
Published: 1/1/2007
Authors: K J Kim, D Moon, C J Park, David S Simons, John G Gillen, H Jin, H Kang
Abstract: Quantitative surface analysis of Fe-Ni alloy thin films has been proposed as a new subject for a pilot study by the surface analysis working group of the Consultative Committee for Amount of Substance (CCQM). Three Fe-Ni alloy films with different ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831430

10. Round-Robin Study of Arsenic Implant Dose Measurement in Silicon by SIMS
Published: 11/1/2006
Authors: Richard Mark Lindstrom, David S Simons, R Bennett, R. Benbalagh, Bruce S MacDonald, A. Chew, D. Gehre, H Hasegawa, C. Hitzman, J. Ko, C W Magee, N. Montgomery, P. Peres, P. Ronsheim, S. Yoshikawa, M. Schuhmacher, W. Stockwell, D. Sykes, M. Tomita, F. Toujou, J. Won
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904431



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