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Author: Christina Hacker
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1. Attachment of a Reduction-Oxidative Active Diruthenium Compound to Au and Si Surfaces by ,ClickŠ
Sujitra Jeanie Pookpanratana, Joseph William Robertson, Curt A Richter, Christina Ann Hacker, Lee J Richter, Julia Savchenko, Steven Cummings, Tong Ren
We report the formation of molecular monolayers containing redox-active diruthenium(II,III) compound
to gold and silicon surfaces via ,clickŠ chemistry. The use of Cu-catalyzed azide-alkyne
cycloaddition enables modular design of molecular surfa ...
2. Interface Engineering to Control Magnetic Field Effects of Organic-Based Devices by Using a Molecular Self-Assembled Monolayer
Hyuk-Jae Jang, Sujitra Jeanie Pookpanratana, Alyssa N. Brigeman, Regis J Kline, James Ian Basham, David J Gundlach, Christina Ann Hacker, Oleg A Kirillov, Oana Jurchescu, Curt A Richter
Organic semiconductors hold immense promise for the development of a wide range of innovative devices with their excellent electronic and manufacturing characteristics. Of particular interest are non-magnetic organic semiconductors that show unusual ...
3. Highly reproducible and reliable metal/graphene contact by UV-Ozone treatment
Wei (Wei NMN) Li, Christina Ann Hacker, Guangjun Cheng, Angela R Hight Walker, Curt A Richter, David J Gundlach, Yiran Liang, boyuan Tian, Xuelei Liang, Lianmao Peng
Resist residue from the device fabrication process is a significant source of contamination at the
metal/graphene contact interface. Ultraviolet Ozone (UVO) treatment is proven here, by X-ray
photoelectron spectroscopy (XPS) and Raman measurement ...
4. UV/Ozone treatment to reduce metal-graphene contact resistance
Wei (Wei NMN) Li, Kurt Pernstich, Angela R Hight Walker, Tian T. Shen, Guangjun Cheng, Christina Ann Hacker, Curt A Richter, Qiliang Li, David J Gundlach, Xuelei Liang, Lianmao Peng, Yiran Liang
5. Metrology For Organic Monolayers On Cobalt Surfaces
Sujitra Jeanie Pookpanratana, Leigh Kent Lydecker, Hyuk-Jae Jang, Curt A Richter, Christina Ann Hacker
6. ELECTRICAL AND PHYSICAL CHARACTERIZATION OF BILAYER CARBOXYLIC ACID FUNCTIONALIZED MOLECULAR LAYERS
Sujitra Jeanie Pookpanratana, Joseph William Robertson, Cherno Jaye, Daniel A Fischer, Curt A Richter, Christina Ann Hacker
We have used Flip Chip Lamination (FCL) to form monolayer and bilayer molecular junctions of carboxylic acid-containing molecules with Cu atom incorporation. Carboxylic acid-terminated monolayers are self-assembled onto ultrasmooth Au using thiol che ...
7. 2012 Updates to the International Technology Roadmap for Semiconductors (ITRS) Metrology Chapter
Christina Ann Hacker, Alain C. Diebold
During 2012, the main emphasis of the Metrology Technical Working Group was to revise the Metrology Technology Requirements Tables and initiate the new text for the 2013 revision of the International Technology Roadmap for Semiconductors (ITRS). The ...
8. Towards clean and crackless transfer of graphene
Xuelei X. Liang, Brent A Sperling, Irene G. Calizo, Guangjun Cheng, Christina Ann Hacker, Qin Q. Zhang, Yaw S Obeng, Kai Yan, Hailin Peng, Qiliang Li, Xiaoxiao Zhu, Hui Yuan, Angela R Hight Walker, Zhongfan Liu, Lianmao Peng, Curt A Richter
We present the results of a thorough study of wet chemical methods for transferring chemical vapor deposition grown graphene from the metal growth substrate to a device compatible substrate. Based on these results, we have developed a ,modified RCA c ...
9. Influence of Interfacial Chemistry and Molecular Length on the Electronic Properties of Metal-Molecule-Silicon Junctions Produced by Flip Chip Lamination
Michael A Walsh, Mariona Coll, Benjamin Jones, Curt A Richter, Christina Ann Hacker
10. Structural and electrical properties of Flip Chip Laminated metal-molecule-silicon structures modifying molecular backbone and atomic tether
Mariona Coll Bau, Nadine Emily Gergel-Hackett, Curt A Richter, Christina Ann Hacker
The formation of electrical contacts on organic molecules preserving their integrity and using a scalable technique is a key step toward the fabrication of molecular electronic devices. Here we study the structural and electrical properties of metal- ...