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Author: robert vest
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Displaying records 51 to 60 of 65 records.
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51. SURF III - A New Electron Storage Ring at NIST
Published: 10/15/1999
Authors: R A Bosch, D E Eisert, Mitchell L. Furst, R M Graves, L Greenler, A D Hamilton, L R Hughey, R P. Madden, P Robl, Ping-Shine Shaw, W S Trzeciak, Robert Edward Vest, D Wahl
Abstract: The National Institute of Standards and Technology (NIST), formerly the National Bureau of Standards (NBS), has operated the Synchrotron Ultraviolet Radiation Facility (SURF), based on an electron accelerator, continuously since the early 1960's. SU ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841427

52. SURF III: A flexible Synchrotron Radiation Source for Radiometry and Research
Published: 9/1/2011
Authors: Uwe Arp, Charles W Clark, Lu Deng, Nadir S. Faradzhev, Alex P. Farrell, Mitchell L. Furst, Steven E Grantham, Edward Walter Hagley, Shannon Bradley Hill, Thomas B Lucatorto, Ping-Shine Shaw, Charles S Tarrio, Robert Edward Vest
Abstract: The calculability of synchrotron radiation (SR) makes electron storage rings wonderful light sources for radiometry. The broadband nature of SR allows coverage of the whole spectral region from the x-ray to the far-infrared. Compact low-energy storag ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906750

53. Saturation effects in solid state photodiodes and impact on EUVL pulse energy measurements,
Published: 1/1/2006
Authors: Robert Edward Vest, Shannon Bradley Hill, Steven E Grantham
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101785

54. Stable Silicon Photodiodes for Absolute Intensity Measurements in the VUV and Soft X-Ray Regions
Published: 1/1/1996
Authors: Eric M Gullikson, R Korde, L R Canfield, Robert Edward Vest
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101548

55. The Conversion of SURF II to SURF III
Published: 1/1/1999
Authors: Mitchell L. Furst, R M Graves, A D Hamilton, L R Hughey, R P. Madden, Robert Edward Vest, W S Trzeciak, R A Bosch, L Greenler, P Robl, D Wahl
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100156

56. The Conversion of SURF II to SURF III
Published: 4/2/1999
Authors: Mitchell L. Furst, R M Graves, A D Hamilton, L R Hughey, R P. Madden, Robert Edward Vest, W S Trzeciak, L Greenler, P Robl, D Wahl
Abstract: The Electron and Optical Physics Division of the Physics Laboratory has operated the Synchrotron Ultraviolet Radiation Facility (SURF) at the National Institute of Standards and Technology (NIST) for over 30 years. Initially operated in a parasitic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840068

57. The Conversion of SURF II to SURF III,
Published: 1/1/1999
Authors: Mitchell L. Furst, R M Graves, A D Hamilton, L R Hughey, R P. Madden, Robert Edward Vest, W S Trzeciak, R A Bosch, L Greenler, P Robl, D Wahl
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101818

58. The New Ultraviolet Spectral Responsivity Scale Based on Cryogenic Radiometry at Synchrotron Ultraviolet Radiation Facility III
Published: 5/1/2001
Authors: Ping-Shine Shaw, Thomas C Larason, R Gupta, Steven W Brown, Robert Edward Vest, Keith R Lykke
Abstract: The recently completed upgrade of the Synchrotron Ultraviolet Radiation Facility (SURF III) at the National Institute of Standards and Technology (NIST) has improved the accuracy of radiometric measurements over a broad spectral range from the infrar ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841478

59. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography
Series: Journal of Research (NIST JRES)
Published: 7/1/2003
Authors: Charles S Tarrio, S Grantham, M B Squires, Robert Edward Vest, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer EUV stepper mirrors require the highest attainable reflectivity a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841623

60. Towards high accuracy reflectometry for extreme-ultraviolet lithography,
Published: 1/1/2003
Authors: Charles S Tarrio, Steven E Grantham, M B Squires, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101861



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