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Displaying records 81 to 90 of 106 records.
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81. Quantitative Measurement of Outgas Products From EUV Photoresists
Published: 3/14/2008
Authors: Charles S Tarrio, Bruce A Benner Jr, Robert Edward Vest, Steven E Grantham, Shannon Bradley Hill, Thomas B Lucatorto, Jay H Hendricks, Patrick J Abbott, Greg Denbeaux, Alin Antohe, Chimaobi Mbanaso, Kevin Orbek
Abstract: The photon-stimulated emission of organic molecules from the photoresist during exposure is a serious problem for extreme- ultraviolet lithography (EUVL) because the adsorption of the outgassing products on the EUV optics can lead to carbonization an ...

82. SURF III: A flexible Synchrotron Radiation Source for Radiometry and Research
Published: 9/1/2011
Authors: Uwe Arp, Charles W Clark, Lu Deng, Nadir S. Faradzhev, Alex P. Farrell, Mitchell L. Furst, Steven E Grantham, Edward W Hagley, Shannon Bradley Hill, Thomas B Lucatorto, Ping-Shine Shaw, Charles S Tarrio, Robert Edward Vest
Abstract: The calculability of synchrotron radiation (SR) makes electron storage rings wonderful light sources for radiometry. The broadband nature of SR allows coverage of the whole spectral region from the x-ray to the far-infrared. Compact low-energy storag ...

83. Selected Programs at the New SURF III Electron Storage Ring
Published: 6/1/2000
Authors: Mitchell L. Furst, Uwe Arp, G P Cauchon, A D Hamilton, L R Hughey, Thomas B Lucatorto, Charles S Tarrio
Abstract: The conversion of the electron storage ring at NIST (the National Institute of Standards and Technology) to SURF III (the Synchrotron Ultraviolet Radiation Facility) has resulted in a significant improvement to the azimuthal uniformity of magnetic fi ...

84. Si/B^d4C Narrow-Bandpass Mirrors for the Extreme Ultraviolet,
Published: 1/1/1994
Authors: J M Slaughter, B S Meadower, R N. Watts, Charles S Tarrio, Thomas B Lucatorto, C M Falco

85. Smoothing of Mirror Substrates by Thin-Film Deposition
Published: 9/8/1999
Authors: E Spiller, S Baker, E Parra, Charles S Tarrio
Abstract: Superpolished optical flats with high spatial frequency roughness below 0.1 nm have been commercially available for years. However, it is much more difficult to obtain figured optics of similar quality. We have obtained and tested the finish of fig ...

86. Soft X-Ray Calibration of the Co/C Multilayer Mirrors for the Objective Crystal Spectrometer (OXS) on the Spectrum R {omlat} ntgen-Gamma Satellite (SRG)
Published: 1/1/1996
Authors: S Abdoli, Charles S Tarrio, F E Christensen, H W Schnopper

87. Soft X-Ray Damage to p-terphenyl Coatings for Detectors
Published: 1/1/1994
Authors: E L Benitez, M L Dark, D E Husk, S E Schnatterly, Charles S Tarrio

88. Structure and Performance of Si/Mo Multilayer Mirrors for the Extreme Ultra-violet,
Published: 1/1/1994
Authors: J M Slaughter, D W Schulze, C R Hillis, A Mirone, R Stalio, R N. Watts, Charles S Tarrio, Thomas B Lucatorto, Michael Krumrey, P Mueller, C M Falco

89. Synchrotron Beamline for Extreme-Ultraviolet Multilayer Mirror Endurance Testing
Published: 5/1/2005
Authors: Charles S Tarrio, Steven E Grantham

90. The NIST EUV facility for advanced photoresist qualification using the witness-sample test
Published: 8/29/2011
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Lee J Richter, Thomas B Lucatorto, J. van Dijk, C. Kaya, N. Harned, R. Hoefnagels, M. Silova, J. Steinhoff
Abstract: Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be qualified to ensure that they will not excessively contaminate the scanner optics or other parts of the vacuum environment of the scanner. At the National Institute ...

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