NIST logo

Publications Portal

You searched on:
Author: charles tarrio
Sorted by: title

Displaying records 81 to 90 of 102 records.
Resort by: Date / Title


81. Smoothing of Mirror Substrates by Thin-Film Deposition
Published: 9/8/1999
Authors: E Spiller, S Baker, E Parra, Charles S Tarrio
Abstract: Superpolished optical flats with high spatial frequency roughness below 0.1 nm have been commercially available for years. However, it is much more difficult to obtain figured optics of similar quality. We have obtained and tested the finish of fig ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840071

82. Soft X-Ray Calibration of the Co/C Multilayer Mirrors for the Objective Crystal Spectrometer (OXS) on the Spectrum R {omlat} ntgen-Gamma Satellite (SRG)
Published: 1/1/1996
Authors: S Abdoli, Charles S Tarrio, F E Christensen, H W Schnopper
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100145

83. Soft X-Ray Damage to p-terphenyl Coatings for Detectors
Published: 1/1/1994
Authors: E L Benitez, M L Dark, D E Husk, S E Schnatterly, Charles S Tarrio
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101440

84. Structure and Performance of Si/Mo Multilayer Mirrors for the Extreme Ultra-violet,
Published: 1/1/1994
Authors: J M Slaughter, D W Schulze, C R Hillis, A Mirone, R Stalio, R N. Watts, Charles S Tarrio, Thomas B Lucatorto, Michael Krumrey, P Mueller, C M Falco
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101721

85. Synchrotron Beamline for Extreme-Ultraviolet Multilayer Mirror Endurance Testing
Published: 5/1/2005
Authors: Charles S Tarrio, Steven E Grantham
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840203

86. The NIST EUV facility for advanced photoresist qualification using the witness-sample test
Published: 8/29/2011
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Lee J Richter, Thomas B Lucatorto, J. van Dijk, C. Kaya, N. Harned, R. Hoefnagels, M. Silova, J. Steinhoff
Abstract: Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be qualified to ensure that they will not excessively contaminate the scanner optics or other parts of the vacuum environment of the scanner. At the National Institute ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908029

87. The New NIST/DARPA National Soft X-Ray Reflectometry Facility,
Published: 1/1/1994
Authors: Charles S Tarrio, R N. Watts, Thomas B Lucatorto, M Haass, T A Callcott, J J Jia
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101765

88. Tomography of Integrated Circuit Interconnect With an Electromigration Void
Published: 5/1/2000
Authors: Zachary H Levine, A R Kalukin, M Kuhn, S P Frigo, I McNulty, C C Retsch, Y Wang, Uwe Arp, Thomas B Lucatorto, Bruce D Ravel, Charles S Tarrio
Abstract: An integrated circuit interconnect was subject to accelerated-life conditions to induce an electromigration void. The silicon substrate was removed, leaving only the interconnect encased test structure encased in silica. We imaged the sample wit ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840087

89. Tomography of Integrated Circuit Interconnects
Published: 10/1/2001
Authors: Zachary H Levine, A R Kalukin, M Kuhn, S P Frigo, I McNulty, C C Retsch, Y Wang, Uwe Arp, Thomas B Lucatorto, Bruce D Ravel, Charles S Tarrio
Abstract: 00 Word summary based on the paper:Z. H. Levine, A. R. Kalukin, M. Kuhn, S. P. Frigo, I. McNulty,>C. C. Retsch, Y. Wang, U. Arp, T. B. Lucatorto, B. D. Ravel, and C. Tarrio,>``Microtomography of Integrated Circuit Interconnect with an> Electromigra ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840113

90. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography
Series: Journal of Research (NIST JRES)
Published: 7/1/2003
Authors: Charles S Tarrio, S Grantham, M B Squires, Robert Edward Vest, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer EUV stepper mirrors require the highest attainable reflectivity a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841623



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series