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Author: charles tarrio
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Displaying records 81 to 90 of 96 records.
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81. The NIST EUV facility for advanced photoresist qualification using the witness-sample test
Published: 8/29/2011
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Lee J Richter, Thomas B Lucatorto, J. van Dijk, C. Kaya, N. Harned, R. Hoefnagels, M. Silova, J. Steinhoff
Abstract: Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be qualified to ensure that they will not excessively contaminate the scanner optics or other parts of the vacuum environment of the scanner. At the National Institute ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908029

82. The New NIST/DARPA National Soft X-Ray Reflectometry Facility,
Published: 1/1/1994
Authors: Charles S Tarrio, R N. Watts, Thomas B Lucatorto, M Haass, T A Callcott, J J Jia
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101765

83. Tomography of Integrated Circuit Interconnect With an Electromigration Void
Published: 5/1/2000
Authors: Zachary H Levine, A R Kalukin, M Kuhn, S P Frigo, I McNulty, C C Retsch, Y Wang, Uwe Arp, Thomas B Lucatorto, Bruce D Ravel, Charles S Tarrio
Abstract: An integrated circuit interconnect was subject to accelerated-life conditions to induce an electromigration void. The silicon substrate was removed, leaving only the interconnect encased test structure encased in silica. We imaged the sample wit ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840087

84. Tomography of Integrated Circuit Interconnects
Published: 10/1/2001
Authors: Zachary H Levine, A R Kalukin, M Kuhn, S P Frigo, I McNulty, C C Retsch, Y Wang, Uwe Arp, Thomas B Lucatorto, Bruce D Ravel, Charles S Tarrio
Abstract: 00 Word summary based on the paper:Z. H. Levine, A. R. Kalukin, M. Kuhn, S. P. Frigo, I. McNulty,>C. C. Retsch, Y. Wang, U. Arp, T. B. Lucatorto, B. D. Ravel, and C. Tarrio,>``Microtomography of Integrated Circuit Interconnect with an> Electromigra ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840113

85. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography
Series: Journal of Research (NIST JRES)
Published: 7/1/2003
Authors: Charles S Tarrio, S Grantham, M B Squires, Robert Edward Vest, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer EUV stepper mirrors require the highest attainable reflectivity a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841623

86. Towards high accuracy reflectometry for extreme-ultraviolet lithography,
Published: 1/1/2003
Authors: Charles S Tarrio, Steven E Grantham, M B Squires, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101861

87. Transmission grating based EUV imaging spectrometer for time and space resolved impurity measurements
Published: 10/31/2010
Authors: Charles S Tarrio, Steven E Grantham, D Kumar, D Stutman, K Tritz, M Finkenthal, NSTX Team N/A
Abstract: A free standing transmission grating based imaging spectrometer in the extreme ultraviolet (EUV)range has been developed for the National Spherical Torus Experiment (NSTX). The spectrometer operates in a survey mode covering the approximate spectral ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905975

88. Trends in the X-Ray Diffraction of Multilayers, in Physics of X-Ray Multilayer Structures
Published: 1/1/1994
Authors: Charles S Tarrio, R Deslattes, Ariel Caticha, J Pedulla
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=102920

89. Ultrahigh-Resolution Photographic Films for X-Ray/EUV/FUV Astronomy, ed. by R.B. Hoover and A.B.C. Walker Jr.
Published: 1/1/1992
Authors: Richard Brice Hoover, A B Walker, C E Deforest, R N. Watts, Charles S Tarrio
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100164

90. Upgrades to the NIST/DARPA EUV Reflectometry Facility
Published: 12/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto, S Grantham, M B Squires, Uwe Arp, Lu Deng
Abstract: We have recently installed a new sample chamber at the NIST/DARPA EUV Reflectometry Facility at the National Institute of Standards and Technology. The chamber replaces a much smaller system on Beamline 7 at the Synchrotron Ultraviolet Radiation Fac ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841579



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