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Displaying records 81 to 90 of 104 records.
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81. Selected Programs at the New SURF III Electron Storage Ring
Published: 6/1/2000
Authors: Mitchell L. Furst, Uwe Arp, G P Cauchon, A D Hamilton, L R Hughey, Thomas B Lucatorto, Charles S Tarrio
Abstract: The conversion of the electron storage ring at NIST (the National Institute of Standards and Technology) to SURF III (the Synchrotron Ultraviolet Radiation Facility) has resulted in a significant improvement to the azimuthal uniformity of magnetic fi ...

82. Si/B^d4C Narrow-Bandpass Mirrors for the Extreme Ultraviolet,
Published: 1/1/1994
Authors: J M Slaughter, B S Meadower, R N. Watts, Charles S Tarrio, Thomas B Lucatorto, C M Falco

83. Smoothing of Mirror Substrates by Thin-Film Deposition
Published: 9/8/1999
Authors: E Spiller, S Baker, E Parra, Charles S Tarrio
Abstract: Superpolished optical flats with high spatial frequency roughness below 0.1 nm have been commercially available for years. However, it is much more difficult to obtain figured optics of similar quality. We have obtained and tested the finish of fig ...

84. Soft X-Ray Calibration of the Co/C Multilayer Mirrors for the Objective Crystal Spectrometer (OXS) on the Spectrum R {omlat} ntgen-Gamma Satellite (SRG)
Published: 1/1/1996
Authors: S Abdoli, Charles S Tarrio, F E Christensen, H W Schnopper

85. Soft X-Ray Damage to p-terphenyl Coatings for Detectors
Published: 1/1/1994
Authors: E L Benitez, M L Dark, D E Husk, S E Schnatterly, Charles S Tarrio

86. Structure and Performance of Si/Mo Multilayer Mirrors for the Extreme Ultra-violet,
Published: 1/1/1994
Authors: J M Slaughter, D W Schulze, C R Hillis, A Mirone, R Stalio, R N. Watts, Charles S Tarrio, Thomas B Lucatorto, Michael Krumrey, P Mueller, C M Falco

87. Synchrotron Beamline for Extreme-Ultraviolet Multilayer Mirror Endurance Testing
Published: 5/1/2005
Authors: Charles S Tarrio, Steven E Grantham

88. The NIST EUV facility for advanced photoresist qualification using the witness-sample test
Published: 8/29/2011
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Lee J Richter, Thomas B Lucatorto, J. van Dijk, C. Kaya, N. Harned, R. Hoefnagels, M. Silova, J. Steinhoff
Abstract: Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be qualified to ensure that they will not excessively contaminate the scanner optics or other parts of the vacuum environment of the scanner. At the National Institute ...

89. The New NIST/DARPA National Soft X-Ray Reflectometry Facility,
Published: 1/1/1994
Authors: Charles S Tarrio, R N. Watts, Thomas B Lucatorto, M Haass, T A Callcott, J J Jia

90. Tomography of Integrated Circuit Interconnect With an Electromigration Void
Published: 5/1/2000
Authors: Zachary H Levine, A R Kalukin, M Kuhn, S P Frigo, I McNulty, C C Retsch, Y Wang, Uwe Arp, Thomas B Lucatorto, Bruce D Ravel, Charles S Tarrio
Abstract: An integrated circuit interconnect was subject to accelerated-life conditions to induce an electromigration void. The silicon substrate was removed, leaving only the interconnect encased test structure encased in silica. We imaged the sample wit ...

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