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Author: charles tarrio
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Displaying records 31 to 40 of 96 records.
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31. Extreme-ultraviolet radiation transmission and diffraction measurements of freestanding transmission gratings,
Published: 1/1/2004
Authors: D R McMullin, D L Judge, Charles S Tarrio, Robert Edward Vest, F Hanser
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101634

32. Fabrication of Multilayer Optics by Sputtering: Application to EUV Optics with Greater than 30% Normal Reflectance,
Published: 1/1/1995
Authors: P N Peters, Richard Brice Hoover, R N. Watts, Charles S Tarrio, A Walker
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100183

33. Facility for EUV reflectometry of lithography optics,
Published: 1/1/2003
Authors: Charles S Tarrio, Steven E Grantham, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101761

34. Facility for Extreme Ultraviolet Reflectometry of Lithography Optics
Published: 2/1/2003
Authors: Charles S Tarrio, S Grantham, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme-ultraviolet (EUV) optics is in lithography. A commercial extreme-ultraviolet stepper will likely have six or more normal-incidence reflective optics, and the largest of these will be tens of cm in d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840130

35. Facility for Pulsed Extreme Ultraviolet Detector Calibration
Published: Date unknown
Authors: Steven E Grantham, Robert Edward Vest, Charles S Tarrio, Thomas B Lucatorto
Abstract: All of the Extreme Ultraviolet light sources currently under consideration for Extreme Ultraviolet lithography are based on plasmas that emit radiation with a wavelength of approximately 13.4 nm. These sources whether they are produced by a discharg ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841761

36. First Results From the Updated NIST/DARPA EUV Reflectometry Facility
Published: 7/1/2002
Authors: S Grantham, Charles S Tarrio, M B Squires, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme-ultraviolet (EUV) optics is in lithography. A commercial extreme-ultraviolet stepper will likely have six or more normal-incidence reflective optics, and the largest of these will be tens of cm in d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840123

37. First Solar EUV Irradiances Obtained from SOHO by the SEM,
Published: 1/1/1998
Authors: D L Judge, D R McMullin, H S Ogawa, D Hovestadt, B Klecker, M Hilchenbach, E M{omlat}bius, L R Canfield, Robert Edward Vest, R N. Watts, Charles S Tarrio, M K{umlat}hne
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101579

38. Forty Years of Metrology with Synchrtron Radiation at SURF
Published: 1/1/2003
Authors: Uwe Arp, Alex P. Farrell, Mitchell L. Furst, Steven E Grantham, Edward Walter Hagley, Simon Grant Kaplan, Ping-Shine Shaw, Charles S Tarrio, Robert Edward Vest
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100995

39. Forty years of metrology with synchrotron radiation at SURF
Published: 1/1/2003
Authors: Uwe Arp, Alex P. Farrell, Mitchell L. Furst, Steven E Grantham, Edward Walter Hagley, Simon Grant Kaplan, Ping-Shine Shaw, Charles S Tarrio, Robert Edward Vest
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100997

40. High Effeciency Fast Scintillators for the Development of Optical Soft X-Ray Arrays for Laboratory Plasma Diagnostics
Published: Date unknown
Authors: L F Delgado-Aparicio, R Vero, D Stutman, M Finkenthal, K Tritz, G Suliman, H W Moos, R Kaita, R Majeski, B Stratton, L Roquemore, D Johnson, Charles S Tarrio
Abstract: Scintillator-based optical soft x-ray (OSXR) arrays may in the near future, replace the conventional diode arrays used for plasma imaging, tomographic reconstruction, magnetohydrodynamics, transport and turbulence studies in magnetically confined ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840207



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