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Displaying records 21 to 30 of 106 records.
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21. Development and evaluation of interface-stabilized and reactive-sputtered oxide-capped multilayers for EUV lithography
Published: 3/16/2015
Authors: Michael Kriese, Jim Rodriguez, Gary Fournier, Steven E Grantham, Shannon Bradley Hill, John J Curry, Thomas B Lucatorto, Charles S Tarrio, Yuriy Platonov
Abstract: A critical component of high-performance EUV lithography source optics is the reflecting multilayer coating. The ideal multilayer will have both high reflectance and high stability to thermal load. Additionally the capping layers must provide resis ...

22. Development of an EUVL collector with infrared radiation suppression
Published: 8/1/2014
Authors: Steven E Grantham, Mike Kriese, Yuriy Platonov, Bodo Ehlers, Licai Jiang, Jim Rodriguez, Mueller Ulrich, Shayna khatri, Adam Magruder, Charles S Tarrio, Thomas B Lucatorto
Abstract: Laser-produced plasma (LPP) sources for extreme ultraviolet lithography (EUVL) systems utilize CO2 lasers operating with wavelength 10.6μm. Since multilayer-coated optics have high reflectivity for this infrared radiation (IR), a significant and ...

23. EUV component and system characterization at NIST for the support of extreme-ultraviolet lithography, ed. by R.S. Mackay
Published: 5/13/2005
Authors: S Grantham, Shannon Bradley Hill, Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto

24. EUV testing of multilayer mirrors: critical issues
Published: 1/1/2006
Authors: Shannon Bradley Hill, I Ermanoski, Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto, T. E Madey, S Bajt, M Chandhok, P Yan, Obert Wood, S Wurm, N V Edwards

25. EUVL dosimetry at NIST
Published: 3/13/2009
Authors: Charles S Tarrio, Steven E Grantham, Marc J Cangemi, Robert Edward Vest, Thomas B Lucatorto, Noreen Harned
Abstract: As part of its role in providing radiometric standards in support of industry, NIST has been active in advancing extreme ultraviolet dosimetry on various fronts. Recently, we undertook a major effort in accurately measuring the sensitivity of three ...

26. Effect of Xenon Bombardment on Ruthenium-Coated Grazing Incidence Collector Mirror Lifetime for EUV Lithography
Published: Date unknown
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S Tarrio, Yaniv Barad, Steven E Grantham, Thomas B Lucatorto, Bryan Rice
Abstract: The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performance of mirrors is of vital importance for the performance of discharge- and laser-produced plasma extreme ultraviolet lithography (EUVL) sources. To s ...

27. Effect of xenon bombardment on ruthenium coated grazing incidence collector lifetime for EUV lithography,
Published: 1/1/2006
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S Tarrio, Yaniv Barad, Steven E Grantham, Thomas B Lucatorto, Bryan Rice

28. Effective Masses of the 4p Excitons in Solid Krypton,
Published: 1/1/1992
Authors: Charles S Tarrio, S E Schnatterly

29. Energetic and Thermal Sn Interactions and Their Effect on EUVL Source Collector Mirror Lifetime at High Temperatures
Published: Date unknown
Authors: J P Allain, M Nieto, M R Hendricks, A Hassanein, Charles S Tarrio, Steven E Grantham, Vivek Bakshi
Abstract: Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources remains one of the highest critical issues of source component lifetime and commercial feasibility of EUV lithography technology. Studies at Argonne h ...

30. Evaluating Optical Materials
Published: 5/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto
Abstract: curately quantifying optical constants is key to fabricating successful multiplayer film components

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