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Author: charles tarrio
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Displaying records 21 to 30 of 102 records.
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21. EUV component and system characterization at NIST for the support of extreme-ultraviolet lithography, ed. by R.S. Mackay
Published: 5/13/2005
Authors: S Grantham, Shannon Bradley Hill, Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100159

22. EUV testing of multilayer mirrors: critical issues
Published: 1/1/2006
Authors: Shannon Bradley Hill, I Ermanoski, Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto, T. E Madey, S Bajt, M Chandhok, P Yan, Obert Wood, S Wurm, N V Edwards
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101847

23. EUVL dosimetry at NIST
Published: 3/13/2009
Authors: Charles S Tarrio, Steven E Grantham, Marc J Cangemi, Robert Edward Vest, Thomas B Lucatorto, Noreen Harned
Abstract: As part of its role in providing radiometric standards in support of industry, NIST has been active in advancing extreme ultraviolet dosimetry on various fronts. Recently, we undertook a major effort in accurately measuring the sensitivity of three ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901663

24. Effect of Xenon Bombardment on Ruthenium-Coated Grazing Incidence Collector Mirror Lifetime for EUV Lithography
Published: Date unknown
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S Tarrio, Yaniv Barad, Steven E Grantham, Thomas B Lucatorto, Bryan Rice
Abstract: The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performance of mirrors is of vital importance for the performance of discharge- and laser-produced plasma extreme ultraviolet lithography (EUVL) sources. To s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840246

25. Effect of xenon bombardment on ruthenium coated grazing incidence collector lifetime for EUV lithography,
Published: 1/1/2006
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S Tarrio, Yaniv Barad, Steven E Grantham, Thomas B Lucatorto, Bryan Rice
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101650

26. Effective Masses of the 4p Excitons in Solid Krypton,
Published: 1/1/1992
Authors: Charles S Tarrio, S E Schnatterly
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101769

27. Energetic and Thermal Sn Interactions and Their Effect on EUVL Source Collector Mirror Lifetime at High Temperatures
Published: Date unknown
Authors: J P Allain, M Nieto, M R Hendricks, A Hassanein, Charles S Tarrio, Steven E Grantham, Vivek Bakshi
Abstract: Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources remains one of the highest critical issues of source component lifetime and commercial feasibility of EUV lithography technology. Studies at Argonne h ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840260

28. Evaluating Optical Materials
Published: 5/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto
Abstract: curately quantifying optical constants is key to fabricating successful multiplayer film components
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840104

29. Evaluating optical materials,
Published: 5/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100202

30. Extreme Ultraviolet Metrology at SURF III
Published: 1/1/2001
Authors: Charles S Tarrio, Robert Edward Vest, S Grantham, Thomas B Lucatorto
Abstract: The last two decades have seen the development normal-incidence multiplayer mirrors and semiconductor photodiodes for extreme ultraviolet (EUV) radiation. Applications such as in astrophysics, lithography, and plasma physics, require precise calibra ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840120



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