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Author: charles tarrio
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Displaying records 21 to 30 of 96 records.
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21. EUV testing of multilayer mirrors: critical issues
Published: 1/1/2006
Authors: Shannon Bradley Hill, I Ermanoski, Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto, T. E Madey, S Bajt, M Chandhok, P Yan, Obert Wood, S Wurm, N V Edwards
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101847

22. Effect of Xenon Bombardment on Ruthenium-Coated Grazing Incidence Collector Mirror Lifetime for EUV Lithography
Published: Date unknown
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S Tarrio, Yaniv Barad, Steven E Grantham, Thomas B Lucatorto, Bryan Rice
Abstract: The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performance of mirrors is of vital importance for the performance of discharge- and laser-produced plasma extreme ultraviolet lithography (EUVL) sources. To s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840246

23. Effect of xenon bombardment on ruthenium coated grazing incidence collector lifetime for EUV lithography,
Published: 1/1/2006
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S Tarrio, Yaniv Barad, Steven E Grantham, Thomas B Lucatorto, Bryan Rice
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101650

24. Effective Masses of the 4p Excitons in Solid Krypton,
Published: 1/1/1992
Authors: Charles S Tarrio, S E Schnatterly
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101769

25. Energetic and Thermal Sn Interactions and Their Effect on EUVL Source Collector Mirror Lifetime at High Temperatures
Published: Date unknown
Authors: J P Allain, M Nieto, M R Hendricks, A Hassanein, Charles S Tarrio, Steven E Grantham, Vivek Bakshi
Abstract: Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources remains one of the highest critical issues of source component lifetime and commercial feasibility of EUV lithography technology. Studies at Argonne h ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840260

26. Evaluating Optical Materials
Published: 5/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto
Abstract: curately quantifying optical constants is key to fabricating successful multiplayer film components
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840104

27. Evaluating optical materials,
Published: 5/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100202

28. Extreme Ultraviolet Metrology at SURF III
Published: 1/1/2001
Authors: Charles S Tarrio, Robert Edward Vest, S Grantham, Thomas B Lucatorto
Abstract: The last two decades have seen the development normal-incidence multiplayer mirrors and semiconductor photodiodes for extreme ultraviolet (EUV) radiation. Applications such as in astrophysics, lithography, and plasma physics, require precise calibra ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840120

29. Extreme-Ultraviolet Efficiency Measurements of Freestanding Transmission Gratings
Published: 7/1/2004
Authors: D R McMullin, D L Judge, Charles S Tarrio, Robert Edward Vest, F Hanser
Abstract: We report the results of transmission and diffraction measurements at EUV wavelengths (4-30 nm) for two gratings, one with a line density of 5000 mm^u-1^ and the other 2500 mm^u-1^. Measurements were made to provide absolute transmission efficiency ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840108

30. Extreme-Ultraviolet Metrology at SURF III,
Published: 1/1/2001
Authors: Charles S Tarrio, Robert Edward Vest, Steven E Grantham, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101762



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