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Author: charles tarrio
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Displaying records 81 to 90 of 96 records.
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81. Local Fields in High-T^dc Materials,
Published: 1/1/1992
Authors: Charles S Tarrio, E L Benitez, S E Schnatterly
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101767

82. Local Fields in Solids: Microscopic Aspects for Dielectrics,
Published: 1/1/1992
Authors: S E Schnatterly, Charles S Tarrio
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101704

83. Momentum Dependence of Local Fields in Solids,
Published: 1/1/1992
Authors: Charles S Tarrio, S E Schnatterly
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101768

84. Photon Damage and Absolute Photoluminescent Efficiency of Sodium Salicylate in the Soft X-ray Regime
Published: 1/1/1992
Authors: D E Husk, Charles S Tarrio, E L Benitez, S E Schnatterly
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101562

85. Ultrahigh-Resolution Photographic Films for X-Ray/EUV/FUV Astronomy, ed. by R.B. Hoover and A.B.C. Walker Jr.
Published: 1/1/1992
Authors: Richard Brice Hoover, A B Walker, C E Deforest, R N. Watts, Charles S Tarrio
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100164

86. XUV Optics Characterization at NIST,
Published: 1/1/1992
Authors: R N. Watts, Charles S Tarrio, Thomas B Lucatorto, R P. Madden, R Deslattes, Ariel Caticha, A Henins
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100210

87. XUV Optics Characterization at NIST,
Published: 1/1/1992
Authors: R N. Watts, Charles S Tarrio, Thomas B Lucatorto, R P. Madden, R Deslattes, Ariel Caticha, Albert Henins
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101843

88. Local Fields Effects,
Published: 1/1/1991
Authors: Charles S Tarrio, S E Schnatterly
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101770

89. At-Wavelength Metrology for EUV Lithography at NIST
Published: Date unknown
Authors: Charles S Tarrio, Steven E Grantham, Robert Edward Vest, Thomas B Lucatorto
Abstract: The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mir ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841693

90. Effect of Xenon Bombardment on Ruthenium-Coated Grazing Incidence Collector Mirror Lifetime for EUV Lithography
Published: Date unknown
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S Tarrio, Yaniv Barad, Steven E Grantham, Thomas B Lucatorto, Bryan Rice
Abstract: The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performance of mirrors is of vital importance for the performance of discharge- and laser-produced plasma extreme ultraviolet lithography (EUVL) sources. To s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840246



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