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Author: charles tarrio
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21. Design and Performance of Capping Layers for Extreme-Ulatraviolet Multilayer Mirrors
Published: 10/1/2003
Authors: S Bajt, H N Chapman, Nhan Nguyen, J Alameda, J C Robinson, M Malinowski, E Gullikson, Andrew Aquila, Charles S. Tarrio, Steven Grantham
Abstract: Multilayer lifetime has emerged as one of the major issues for the commercialization of extreme-ultraviolet lithography (EUVL). We describe the performance of an oxidation-resistant capping layer of Ru atop multilayers that results in a reflectivity ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840180

22. 40 Years of Metrology With Synchrotron Radiation at SURF
Published: 9/1/2003
Authors: Uwe Arp, Steven Grantham, Simon Grant Kaplan, Ping-Shine Shaw, Charles S. Tarrio, Robert Edward Vest
Abstract: the advantages of a compact synchrotron radiation source like the Synchrotron Ultraviolet Radiation Facility for metrology in the ultraviolet and extreme ultraviolet are shown. The capabilities of the different experimental stations are explained an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840164

23. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography
Series: Journal of Research (NIST JRES)
Published: 7/1/2003
Authors: Charles S. Tarrio, S Grantham, M B Squires, Robert Edward Vest, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer EUV stepper mirrors require the highest attainable reflectivity a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841623

24. Design and Performance of Capping Layers for EUV Multilayer Mirrors
Published: 6/1/2003
Authors: S Bajt, H N Chapman, Nhan Nguyen, J Alameda, J C Robinson, M Malinowski, E Gullikson, Andrew Aquila, Charles S. Tarrio, Steven Grantham
Abstract: The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of utmost importance to ensure continuous exposures with minimum maintenance cost. We have made substantial progress in d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840159

25. Facility for Extreme Ultraviolet Reflectometry of Lithography Optics
Published: 2/1/2003
Authors: Charles S. Tarrio, S Grantham, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme-ultraviolet (EUV) optics is in lithography. A commercial extreme-ultraviolet stepper will likely have six or more normal-incidence reflective optics, and the largest of these will be tens of cm in d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840130

26. Design and performance of capping layers for extreme-ultraviolet multilayer mirrors
Published: 1/1/2003
Authors: S Bajt, H N Chapman, Nhan Nguyen, J Alameda, J C Robinson, M E Malinowski, Eric M Gullikson, Andrew Aquila, Charles S. Tarrio, Steven Grantham
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101435

27. Facility for EUV reflectometry of lithography optics,
Published: 1/1/2003
Authors: Charles S. Tarrio, Steven Grantham, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101761

28. Forty Years of Metrology with Synchrtron Radiation at SURF
Published: 1/1/2003
Authors: Uwe Arp, Alex P. Farrell, Mitchell L. Furst, Steven Grantham, Edward Walter Hagley, Simon Grant Kaplan, Ping-Shine Shaw, Charles S. Tarrio, Robert Edward Vest
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100995

29. Forty years of metrology with synchrotron radiation at SURF
Published: 1/1/2003
Authors: Uwe Arp, Alex P. Farrell, Mitchell L. Furst, Steven Grantham, Edward Walter Hagley, Simon Grant Kaplan, Ping-Shine Shaw, Charles S. Tarrio, Robert Edward Vest
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100997

30. Mass Absorption Coefficient of Tungsten and Tantalum, 1450 eV to 2350 eV: Experiment, Theory, and Application
Series: Journal of Research (NIST JRES)
Published: 1/1/2003
Authors: Zachary H Levine, S Grantham, Charles S. Tarrio, D Paterson, I McNulty, T M Levin, A L Ankudinov, J J Rehr
Abstract: The mass absorption coefficient of tungsten and tantalum was measured with soft x-ray photons from 1450 eV to 2350 eV using an undulator source. This includes the M^d3^, M^d4^, and M^d5^ absorption edges. X-ray absorption fine structure was calcul ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840133