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Displaying records 11 to 20 of 103 records.
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11. At-Wavelength Metrology for EUV Lithography at NIST
Published: 7/14/2009
Authors: Charles S Tarrio, Steven E Grantham, Robert Edward Vest, Thomas B Lucatorto
Abstract: The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mir ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841693

12. EUVL dosimetry at NIST
Published: 3/13/2009
Authors: Charles S Tarrio, Steven E Grantham, Marc J Cangemi, Robert Edward Vest, Thomas B Lucatorto, Noreen Harned
Abstract: As part of its role in providing radiometric standards in support of industry, NIST has been active in advancing extreme ultraviolet dosimetry on various fronts. Recently, we undertook a major effort in accurately measuring the sensitivity of three ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901663

13. Quantitative Measurement of Outgas Products From EUV Photoresists
Published: 3/14/2008
Authors: Charles S Tarrio, Bruce A Benner Jr, Robert Edward Vest, Steven E Grantham, Shannon Bradley Hill, Thomas B Lucatorto, Jay H Hendricks, Patrick J Abbott, Greg Denbeaux, Alin Antohe, Chimaobi Mbanaso, Kevin Orbek
Abstract: The photon-stimulated emission of organic molecules from the photoresist during exposure is a serious problem for extreme- ultraviolet lithography (EUVL) because the adsorption of the outgassing products on the EUV optics can lead to carbonization an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=842436

14. Metrology for EUV Lithography Sources and Tools
Published: 7/3/2006
Authors: Steven E Grantham, Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840201

15. EUV testing of multilayer mirrors: critical issues
Published: 1/1/2006
Authors: Shannon Bradley Hill, I Ermanoski, Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto, T. E Madey, S Bajt, M Chandhok, P Yan, Obert Wood, S Wurm, N V Edwards
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101847

16. Effect of xenon bombardment on ruthenium coated grazing incidence collector lifetime for EUV lithography,
Published: 1/1/2006
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S Tarrio, Yaniv Barad, Steven E Grantham, Thomas B Lucatorto, Bryan Rice
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101650

17. Metrology for EUVL Sources and Tools,ed. by V. Bakshi
Published: 1/1/2006
Authors: S Grantham, Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100158

18. NIST VUV Metrology Programs to Support Space Based Research,
Published: 1/1/2006
Authors: Robert Edward Vest, Yaniv Barad, Mitchell L. Furst, Steven E Grantham, Charles S Tarrio, Ping-Shine Shaw
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101784

19. NIST VUV metrology programs to support space-based research
Published: 1/1/2006
Authors: Robert Edward Vest, Yaniv Barad, Mitchell L. Furst, Steven E Grantham, Charles S Tarrio, Ping-Shine Shaw
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104243

20. Narrow band EUV multilayer coating for the MOSES rocket,
Published: 1/1/2006
Authors: S M Owens, J S Gum, Charles S Tarrio, S Grantham, J A Dvorak, B Kjornrattanawanich, R Keski kuha, R J Thomas, C C Kankelborg
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100181



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