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Author: charles tarrio
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Displaying records 91 to 96.
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91. Energetic and Thermal Sn Interactions and Their Effect on EUVL Source Collector Mirror Lifetime at High Temperatures
Published: Date unknown
Authors: J P Allain, M Nieto, M R Hendricks, A Hassanein, Charles S Tarrio, Steven E Grantham, Vivek Bakshi
Abstract: Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources remains one of the highest critical issues of source component lifetime and commercial feasibility of EUV lithography technology. Studies at Argonne h ...

92. Facility for Pulsed Extreme Ultraviolet Detector Calibration
Published: Date unknown
Authors: Steven E Grantham, Robert Edward Vest, Charles S Tarrio, Thomas B Lucatorto
Abstract: All of the Extreme Ultraviolet light sources currently under consideration for Extreme Ultraviolet lithography are based on plasmas that emit radiation with a wavelength of approximately 13.4 nm. These sources whether they are produced by a discharg ...

93. High Effeciency Fast Scintillators for the Development of Optical Soft X-Ray Arrays for Laboratory Plasma Diagnostics
Published: Date unknown
Authors: L F Delgado-Aparicio, R Vero, D Stutman, M Finkenthal, K Tritz, G Suliman, H W Moos, R Kaita, R Majeski, B Stratton, L Roquemore, D Johnson, Charles S Tarrio
Abstract: Scintillator-based optical soft x-ray (OSXR) arrays may in the near future, replace the conventional diode arrays used for plasma imaging, tomographic reconstruction, magnetohydrodynamics, transport and turbulence studies in magnetically confined ...

94. Metrology for EUV Lithography Sources and Tools
Published: Date unknown
Authors: Steven E Grantham, Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto

95. Multilayers for Next Generation X-Ray Sources
Published: Date unknown
Authors: S Bajt, H N Chapman, E Spiller, S Hau-Riege, J Alameda, A J Nelson, C C Walton, B Kjornrattanawanich, Andrew Aquila, Charles S Tarrio, Steven E Grantham
Abstract: Multilayers are artificially layered structures that can be used to create optics and optical elements for a broad range of x-ray wavelengths, or can be optimized for other applications. The development of next generation x-ray sources (synchrotrons ...

96. Optics for Extreme Ultraviolet Lithography
Published: Date unknown
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Thomas B Lucatorto
Abstract: Extreme Ultraviolet Lithography (EUVL) is considered by many to be the next generation lithography that will fabricate integrated circuits in the next decade. Although EUVL is conceptually similar to optical or deep-UV lithography, it represents a m ...

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