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Author: charles tarrio

Displaying records 51 to 60 of 102 records.
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51. Evaluating Optical Materials
Published: 5/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto
Abstract: curately quantifying optical constants is key to fabricating successful multiplayer film components
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840104

52. Evaluating optical materials,
Published: 5/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100202

53. Advanced Optics Characterization
Published: 2/1/2001
Authors: Angela Davies, Charles S Tarrio, Christopher J. Evans
Abstract: Science, commerce, and defense continuously drive the optical community to provide less expensive, more perfect products. High performance optical systems always demand tighter tolerances-and tighter tolerances drive the need for ever better metrolo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821884

54. Absolute EUV Metrology,
Published: 1/1/2001
Authors: Charles S Tarrio, Robert Edward Vest, S Grantham
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100203

55. Advanced optics characterization
Published: 1/1/2001
Authors: A Davies, Charles S Tarrio, C J Evans
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101865

56. Extreme Ultraviolet Metrology at SURF III
Published: 1/1/2001
Authors: Charles S Tarrio, Robert Edward Vest, S Grantham, Thomas B Lucatorto
Abstract: The last two decades have seen the development normal-incidence multiplayer mirrors and semiconductor photodiodes for extreme ultraviolet (EUV) radiation. Applications such as in astrophysics, lithography, and plasma physics, require precise calibra ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840120

57. Extreme-Ultraviolet Metrology at SURF III,
Published: 1/1/2001
Authors: Charles S Tarrio, Robert Edward Vest, Steven E Grantham, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101762

58. Improvements to the NIST/DARPA EUV Reflectometry Facility
Published: 1/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto, S Grantham, M B Squires, Uwe Arp, Lu Deng
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100201

59. Selected Programs at the New SURF III Electron Storage Ring
Published: 6/1/2000
Authors: Mitchell L. Furst, Uwe Arp, G P Cauchon, A D Hamilton, L R Hughey, Thomas B Lucatorto, Charles S Tarrio
Abstract: The conversion of the electron storage ring at NIST (the National Institute of Standards and Technology) to SURF III (the Synchrotron Ultraviolet Radiation Facility) has resulted in a significant improvement to the azimuthal uniformity of magnetic fi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841424

60. Tomography of Integrated Circuit Interconnect With an Electromigration Void
Published: 5/1/2000
Authors: Zachary H Levine, A R Kalukin, M Kuhn, S P Frigo, I McNulty, C C Retsch, Y Wang, Uwe Arp, Thomas B Lucatorto, Bruce D Ravel, Charles S Tarrio
Abstract: An integrated circuit interconnect was subject to accelerated-life conditions to induce an electromigration void. The silicon substrate was removed, leaving only the interconnect encased test structure encased in silica. We imaged the sample wit ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840087



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