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You searched on: Author: charles tarrio

Displaying records 51 to 60 of 106 records.
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51. Characterization of the response of chromium-doped alumina screens in the vacuum ultraviolet using synchrotron radiation,
Published: 1/1/2002
Authors: James K McCarthy, A Baciero, B Zurro, Uwe Arp, Charles S Tarrio, Thomas B Lucatorto, A Morono, P Martin, E R Hodgson

52. Upgrades to the NIST/DARPA EUV Reflectometry Facility
Published: 12/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto, S Grantham, M B Squires, Uwe Arp, Lu Deng
Abstract: We have recently installed a new sample chamber at the NIST/DARPA EUV Reflectometry Facility at the National Institute of Standards and Technology. The chamber replaces a much smaller system on Beamline 7 at the Synchrotron Ultraviolet Radiation Fac ...

53. Tomography of Integrated Circuit Interconnects
Published: 10/1/2001
Authors: Zachary H Levine, A R Kalukin, M Kuhn, S P Frigo, I McNulty, C C Retsch, Y Wang, Uwe Arp, Thomas B Lucatorto, Bruce D Ravel, Charles S Tarrio
Abstract: 00 Word summary based on the paper:Z. H. Levine, A. R. Kalukin, M. Kuhn, S. P. Frigo, I. McNulty,>C. C. Retsch, Y. Wang, U. Arp, T. B. Lucatorto, B. D. Ravel, and C. Tarrio,>``Microtomography of Integrated Circuit Interconnect with an> Electromigra ...

54. Absolute Extreme Ultraviolet Metrology
Published: 8/1/2001
Authors: Charles S Tarrio, Robert Edward Vest, S Grantham
Abstract: NIST has a long-standing program for the calibration of extreme ultraviolet optical components. Begun with the advent of the Synchrotron Ultraviolet Radiation Facility (SURF) almost 40 years ago, early activities centered on the development and char ...

55. Evaluating Optical Materials
Published: 5/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto
Abstract: curately quantifying optical constants is key to fabricating successful multiplayer film components

56. Evaluating optical materials,
Published: 5/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto

57. Advanced Optics Characterization
Published: 2/1/2001
Authors: Angela Davies, Charles S Tarrio, Christopher J. Evans
Abstract: Science, commerce, and defense continuously drive the optical community to provide less expensive, more perfect products. High performance optical systems always demand tighter tolerances-and tighter tolerances drive the need for ever better metrolo ...

58. Absolute EUV Metrology,
Published: 1/1/2001
Authors: Charles S Tarrio, Robert Edward Vest, S Grantham

59. Advanced optics characterization
Published: 1/1/2001
Authors: A Davies, Charles S Tarrio, C J Evans

60. Extreme Ultraviolet Metrology at SURF III
Published: 1/1/2001
Authors: Charles S Tarrio, Robert Edward Vest, S Grantham, Thomas B Lucatorto
Abstract: The last two decades have seen the development normal-incidence multiplayer mirrors and semiconductor photodiodes for extreme ultraviolet (EUV) radiation. Applications such as in astrophysics, lithography, and plasma physics, require precise calibra ...

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