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You searched on: Author: charles tarrio

Displaying records 51 to 60 of 106 records.
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51. Accurate reflectometry for Extreme Ultraviolet Lithography at the National Institute of Standards and Technology
Published: 1/1/2002
Authors: Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101547

52. Characterization of the response of chromium-doped alumina screens in the vacuum ultraviolet using synchrotron radiation,
Published: 1/1/2002
Authors: James K McCarthy, A Baciero, B Zurro, Uwe Arp, Charles S Tarrio, Thomas B Lucatorto, A Morono, P Martin, E R Hodgson
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101617

53. Upgrades to the NIST/DARPA EUV Reflectometry Facility
Published: 12/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto, S Grantham, M B. Squires, Uwe Arp, Lu Deng
Abstract: We have recently installed a new sample chamber at the NIST/DARPA EUV Reflectometry Facility at the National Institute of Standards and Technology. The chamber replaces a much smaller system on Beamline 7 at the Synchrotron Ultraviolet Radiation Fac ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841579

54. Tomography of Integrated Circuit Interconnects
Published: 10/1/2001
Authors: Zachary H Levine, A R Kalukin, M Kuhn, S P Frigo, I McNulty, C C Retsch, Y Wang, Uwe Arp, Thomas B Lucatorto, Bruce D Ravel, Charles S Tarrio
Abstract: 00 Word summary based on the paper:Z. H. Levine, A. R. Kalukin, M. Kuhn, S. P. Frigo, I. McNulty,>C. C. Retsch, Y. Wang, U. Arp, T. B. Lucatorto, B. D. Ravel, and C. Tarrio,>``Microtomography of Integrated Circuit Interconnect with an> Electromigra ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840113

55. Absolute Extreme Ultraviolet Metrology
Published: 8/1/2001
Authors: Charles S Tarrio, Robert Edward Vest, S Grantham
Abstract: NIST has a long-standing program for the calibration of extreme ultraviolet optical components. Begun with the advent of the Synchrotron Ultraviolet Radiation Facility (SURF) almost 40 years ago, early activities centered on the development and char ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840110

56. Evaluating Optical Materials
Published: 5/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto
Abstract: curately quantifying optical constants is key to fabricating successful multiplayer film components
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840104

57. Evaluating optical materials,
Published: 5/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100202

58. Advanced Optics Characterization
Published: 2/1/2001
Authors: Angela Davies, Charles S Tarrio, Christopher J. Evans
Abstract: Science, commerce, and defense continuously drive the optical community to provide less expensive, more perfect products. High performance optical systems always demand tighter tolerances-and tighter tolerances drive the need for ever better metrolo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821884

59. Absolute EUV Metrology,
Published: 1/1/2001
Authors: Charles S Tarrio, Robert Edward Vest, S Grantham
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100203

60. Advanced optics characterization
Published: 1/1/2001
Authors: A Davies, Charles S Tarrio, C J Evans
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101865



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