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You searched on: Author: charles tarrio

Displaying records 41 to 50 of 104 records.
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41. Mass Absorption Coefficient of Tungsten and Tantalum, 1450 eV to 2350 eV: Experiment, Theory, and Application
Series: Journal of Research (NIST JRES)
Published: 1/1/2003
Authors: Zachary H Levine, S Grantham, Charles S Tarrio, D Paterson, I McNulty, T M Levin, A L Ankudinov, J J Rehr
Abstract: The mass absorption coefficient of tungsten and tantalum was measured with soft x-ray photons from 1450 eV to 2350 eV using an undulator source. This includes the M^d3^, M^d4^, and M^d5^ absorption edges. X-ray absorption fine structure was calcul ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840133

42. Mass Absorption Coefficient of Tungsten and Tantalum,1450 eV to 2350 eV: Experiment, Theory, and Application
Series: Journal of Research (NIST JRES)
Published: 1/1/2003
Authors: Zachary H Levine, S Grantham, Charles S Tarrio, D Patterson, I McNulty, T M Levin, A L Ankudinov, J J Rehr
Abstract: Summary of the WERB approved article Mass Absorption Coefficient of Tungsten and Tantalum, 1450 to 2350 eV: Experiment, Theory, and Application by myself and 7 other authors in J. Res. NIST 108 1-10 (2003)
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840177

43. Mass absorption coefficient of tungsten and tantalum, 1450 eV to 2350 eV: experiment, theory, and application,
Published: 1/1/2003
Authors: Zachary H Levine, Steven E Grantham, Charles S Tarrio, D J Paterson, I McNulty, T M Levin, A L Ankudinov, J J Rehr
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101858

44. Towards high accuracy reflectometry for extreme-ultraviolet lithography,
Published: 1/1/2003
Authors: Charles S Tarrio, Steven E Grantham, M B Squires, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101861

45. Accurate Reflectometry for Extreme-Ultraviolet Lithography at the National Institute of Standards and Technology
Published: 12/1/2002
Authors: S Grantham, Charles S Tarrio, Thomas B Lucatorto
Abstract: The most demanding application of extreme ultraviolet (EUV) multilayer optics is in lithography. The optics in current alpha-class tools are large, and the multilayer coatings must have both optimized reflectance and extremely high uniformity. At N ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840143

46. Characterisation of the Response of Chromium-Doped Alumina Screens in the Vacuum Ultraviolet Using Synchrotron Radiation
Published: 12/1/2002
Authors: James K McCarthy, A Baciero, B Zurro, Uwe Arp, Charles S Tarrio, Thomas B Lucatorto, A Morono, P Martin, E R Hodgson
Abstract: We have measured the response of chromium-doped alumina screens to vacuum ultraviolet radiation and derived quantum efficiency curves for the energy range from 30 to 300 eV. A model is presented to explain the structure in this curve. In addition, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840027

47. First Results From the Updated NIST/DARPA EUV Reflectometry Facility
Published: 7/1/2002
Authors: S Grantham, Charles S Tarrio, M B Squires, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme-ultraviolet (EUV) optics is in lithography. A commercial extreme-ultraviolet stepper will likely have six or more normal-incidence reflective optics, and the largest of these will be tens of cm in d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840123

48. Accurate reflectometry for Extreme Ultraviolet Lithography at the National Institute of Standards and Technology
Published: 1/1/2002
Authors: Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101547

49. Characterization of the response of chromium-doped alumina screens in the vacuum ultraviolet using synchrotron radiation,
Published: 1/1/2002
Authors: James K McCarthy, A Baciero, B Zurro, Uwe Arp, Charles S Tarrio, Thomas B Lucatorto, A Morono, P Martin, E R Hodgson
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101617

50. Upgrades to the NIST/DARPA EUV Reflectometry Facility
Published: 12/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto, S Grantham, M B Squires, Uwe Arp, Lu Deng
Abstract: We have recently installed a new sample chamber at the NIST/DARPA EUV Reflectometry Facility at the National Institute of Standards and Technology. The chamber replaces a much smaller system on Beamline 7 at the Synchrotron Ultraviolet Radiation Fac ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841579



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