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You searched on: Author: charles tarrio

Displaying records 41 to 50 of 106 records.
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41. Facility for EUV reflectometry of lithography optics,
Published: 1/1/2003
Authors: Charles S Tarrio, Steven E Grantham, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101761

42. Forty Years of Metrology with Synchrtron Radiation at SURF
Published: 1/1/2003
Authors: Uwe Arp, Alex P. Farrell, Mitchell L. Furst, Steven E Grantham, Edward W Hagley, Simon Grant Kaplan, Ping-Shine Shaw, Charles S Tarrio, Robert Edward Vest
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100995

43. Forty years of metrology with synchrotron radiation at SURF
Published: 1/1/2003
Authors: Uwe Arp, Alex P. Farrell, Mitchell L. Furst, Steven E Grantham, Edward W Hagley, Simon Grant Kaplan, Ping-Shine Shaw, Charles S Tarrio, Robert Edward Vest
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100997

44. Mass Absorption Coefficient of Tungsten and Tantalum, 1450 eV to 2350 eV: Experiment, Theory, and Application
Series: Journal of Research (NIST JRES)
Published: 1/1/2003
Authors: Zachary H Levine, S Grantham, Charles S Tarrio, D Paterson, I McNulty, T M Levin, A L Ankudinov, J J Rehr
Abstract: The mass absorption coefficient of tungsten and tantalum was measured with soft x-ray photons from 1450 eV to 2350 eV using an undulator source. This includes the M^d3^, M^d4^, and M^d5^ absorption edges. X-ray absorption fine structure was calcul ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840133

45. Mass Absorption Coefficient of Tungsten and Tantalum,1450 eV to 2350 eV: Experiment, Theory, and Application
Series: Journal of Research (NIST JRES)
Published: 1/1/2003
Authors: Zachary H Levine, S Grantham, Charles S Tarrio, D Patterson, I McNulty, T M Levin, A L Ankudinov, J J Rehr
Abstract: Summary of the WERB approved article Mass Absorption Coefficient of Tungsten and Tantalum, 1450 to 2350 eV: Experiment, Theory, and Application by myself and 7 other authors in J. Res. NIST 108 1-10 (2003)
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840177

46. Mass absorption coefficient of tungsten and tantalum, 1450 eV to 2350 eV: experiment, theory, and application,
Published: 1/1/2003
Authors: Zachary H Levine, Steven E Grantham, Charles S Tarrio, D J Paterson, I McNulty, T M Levin, A L Ankudinov, J J Rehr
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101858

47. Towards high accuracy reflectometry for extreme-ultraviolet lithography,
Published: 1/1/2003
Authors: Charles S Tarrio, Steven E Grantham, M B. Squires, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101861

48. Accurate Reflectometry for Extreme-Ultraviolet Lithography at the National Institute of Standards and Technology
Published: 12/1/2002
Authors: S Grantham, Charles S Tarrio, Thomas B Lucatorto
Abstract: The most demanding application of extreme ultraviolet (EUV) multilayer optics is in lithography. The optics in current alpha-class tools are large, and the multilayer coatings must have both optimized reflectance and extremely high uniformity. At N ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840143

49. Characterisation of the Response of Chromium-Doped Alumina Screens in the Vacuum Ultraviolet Using Synchrotron Radiation
Published: 12/1/2002
Authors: James K McCarthy, A Baciero, B Zurro, Uwe Arp, Charles S Tarrio, Thomas B Lucatorto, A Morono, P Martin, E R Hodgson
Abstract: We have measured the response of chromium-doped alumina screens to vacuum ultraviolet radiation and derived quantum efficiency curves for the energy range from 30 to 300 eV. A model is presented to explain the structure in this curve. In addition, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840027

50. First Results From the Updated NIST/DARPA EUV Reflectometry Facility
Published: 7/1/2002
Authors: S Grantham, Charles S Tarrio, M B. Squires, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme-ultraviolet (EUV) optics is in lithography. A commercial extreme-ultraviolet stepper will likely have six or more normal-incidence reflective optics, and the largest of these will be tens of cm in d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840123



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