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Author: charles tarrio

Displaying records 31 to 40 of 102 records.
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31. 40 Years of Metrology With Synchrotron Radiation at SURF
Published: 9/1/2003
Authors: Uwe Arp, Steven E Grantham, Simon Grant Kaplan, Ping-Shine Shaw, Charles S Tarrio, Robert Edward Vest
Abstract: the advantages of a compact synchrotron radiation source like the Synchrotron Ultraviolet Radiation Facility for metrology in the ultraviolet and extreme ultraviolet are shown. The capabilities of the different experimental stations are explained an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840164

32. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography
Series: Journal of Research (NIST JRES)
Published: 7/1/2003
Authors: Charles S Tarrio, S Grantham, M B Squires, Robert Edward Vest, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer EUV stepper mirrors require the highest attainable reflectivity a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841623

33. Design and Performance of Capping Layers for EUV Multilayer Mirrors
Published: 6/1/2003
Authors: S Bajt, H N Chapman, Nhan Nguyen, J Alameda, J C Robinson, M Malinowski, E Gullikson, Andrew Aquila, Charles S Tarrio, Steven E Grantham
Abstract: The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of utmost importance to ensure continuous exposures with minimum maintenance cost. We have made substantial progress in d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840159

34. Facility for Extreme Ultraviolet Reflectometry of Lithography Optics
Published: 2/1/2003
Authors: Charles S Tarrio, S Grantham, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme-ultraviolet (EUV) optics is in lithography. A commercial extreme-ultraviolet stepper will likely have six or more normal-incidence reflective optics, and the largest of these will be tens of cm in d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840130

35. Design and performance of capping layers for extreme-ultraviolet multilayer mirrors
Published: 1/1/2003
Authors: S Bajt, H N Chapman, Nhan Nguyen, J Alameda, J C Robinson, M E Malinowski, Eric M Gullikson, Andrew Aquila, Charles S Tarrio, Steven E Grantham
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101435

36. Facility for EUV reflectometry of lithography optics,
Published: 1/1/2003
Authors: Charles S Tarrio, Steven E Grantham, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101761

37. Forty Years of Metrology with Synchrtron Radiation at SURF
Published: 1/1/2003
Authors: Uwe Arp, Alex P. Farrell, Mitchell L. Furst, Steven E Grantham, Edward Walter Hagley, Simon Grant Kaplan, Ping-Shine Shaw, Charles S Tarrio, Robert Edward Vest
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100995

38. Forty years of metrology with synchrotron radiation at SURF
Published: 1/1/2003
Authors: Uwe Arp, Alex P. Farrell, Mitchell L. Furst, Steven E Grantham, Edward Walter Hagley, Simon Grant Kaplan, Ping-Shine Shaw, Charles S Tarrio, Robert Edward Vest
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100997

39. Mass Absorption Coefficient of Tungsten and Tantalum, 1450 eV to 2350 eV: Experiment, Theory, and Application
Series: Journal of Research (NIST JRES)
Published: 1/1/2003
Authors: Zachary H Levine, S Grantham, Charles S Tarrio, D Paterson, I McNulty, T M Levin, A L Ankudinov, J J Rehr
Abstract: The mass absorption coefficient of tungsten and tantalum was measured with soft x-ray photons from 1450 eV to 2350 eV using an undulator source. This includes the M^d3^, M^d4^, and M^d5^ absorption edges. X-ray absorption fine structure was calcul ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840133

40. Mass Absorption Coefficient of Tungsten and Tantalum,1450 eV to 2350 eV: Experiment, Theory, and Application
Series: Journal of Research (NIST JRES)
Published: 1/1/2003
Authors: Zachary H Levine, S Grantham, Charles S Tarrio, D Patterson, I McNulty, T M Levin, A L Ankudinov, J J Rehr
Abstract: Summary of the WERB approved article Mass Absorption Coefficient of Tungsten and Tantalum, 1450 to 2350 eV: Experiment, Theory, and Application by myself and 7 other authors in J. Res. NIST 108 1-10 (2003)
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840177



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