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Author: charles tarrio

Displaying records 91 to 100 of 102 records.
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91. Local Fields in Solids: Microscopic Aspects for Dielectrics,
Published: 1/1/1992
Authors: S E Schnatterly, Charles S Tarrio
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101704

92. Momentum Dependence of Local Fields in Solids,
Published: 1/1/1992
Authors: Charles S Tarrio, S E Schnatterly
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101768

93. Photon Damage and Absolute Photoluminescent Efficiency of Sodium Salicylate in the Soft X-ray Regime
Published: 1/1/1992
Authors: D E Husk, Charles S Tarrio, E L Benitez, S E Schnatterly
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101562

94. Ultrahigh-Resolution Photographic Films for X-Ray/EUV/FUV Astronomy, ed. by R.B. Hoover and A.B.C. Walker Jr.
Published: 1/1/1992
Authors: Richard Brice Hoover, A B Walker, C E Deforest, R N. Watts, Charles S Tarrio
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100164

95. XUV Optics Characterization at NIST,
Published: 1/1/1992
Authors: R N. Watts, Charles S Tarrio, Thomas B Lucatorto, R P. Madden, R Deslattes, Ariel Caticha, A Henins
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100210

96. XUV Optics Characterization at NIST,
Published: 1/1/1992
Authors: R N. Watts, Charles S Tarrio, Thomas B Lucatorto, R P. Madden, R Deslattes, Ariel Caticha, Albert Henins
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101843

97. Local Fields Effects,
Published: 1/1/1991
Authors: Charles S Tarrio, S E Schnatterly
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101770

98. Effect of Xenon Bombardment on Ruthenium-Coated Grazing Incidence Collector Mirror Lifetime for EUV Lithography
Published: Date unknown
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S Tarrio, Yaniv Barad, Steven E Grantham, Thomas B Lucatorto, Bryan Rice
Abstract: The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performance of mirrors is of vital importance for the performance of discharge- and laser-produced plasma extreme ultraviolet lithography (EUVL) sources. To s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840246

99. Energetic and Thermal Sn Interactions and Their Effect on EUVL Source Collector Mirror Lifetime at High Temperatures
Published: Date unknown
Authors: J P Allain, M Nieto, M R Hendricks, A Hassanein, Charles S Tarrio, Steven E Grantham, Vivek Bakshi
Abstract: Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources remains one of the highest critical issues of source component lifetime and commercial feasibility of EUV lithography technology. Studies at Argonne h ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840260

100. High Effeciency Fast Scintillators for the Development of Optical Soft X-Ray Arrays for Laboratory Plasma Diagnostics
Published: Date unknown
Authors: L F Delgado-Aparicio, R Vero, D Stutman, M Finkenthal, K Tritz, G Suliman, H W Moos, R Kaita, R Majeski, B Stratton, L Roquemore, D Johnson, Charles S Tarrio
Abstract: Scintillator-based optical soft x-ray (OSXR) arrays may in the near future, replace the conventional diode arrays used for plasma imaging, tomographic reconstruction, magnetohydrodynamics, transport and turbulence studies in magnetically confined ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840207



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