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Author: vivek prabhu
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Displaying records 71 to 78.
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71. The Effect of EUV Molecular Glass Architecture on the Bulk Dispersion of a Photo-Acid Generator
Published: 2/22/2008
Authors: David Lloyd VanderHart, Vivek M Prabhu, Anuja De Silva, Nelson Felix, Christopher K. Ober
Abstract: We have examined four molecular glasses (MGs) which are candidates for EUV photoresist formulations. These derivatized glasses and their unprotected precursors were investigated by both 1H and 13C solid state NMR in the bulk state as pure materials ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853578

72. Thin Film Solid State Proton NMR Measurements Using A Synthetic Mica Substrate: Polymer Blends
Published: 8/25/2009
Authors: David Lloyd VanderHart, Vivek M Prabhu, Kristopher Lavery, Cindi L Dennis, Ashwin Rao, Eric K Lin
Abstract: We demonstrate that a synthetic fluorophlogopite mica can be used as a proton-free, diamagnetic substrate for examining solid thin-film samples using conventional solid-state proton nuclear magnetic resonance (NMR) experiments. The context of this w ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900180

73. Vertically Segregated Structure and Properties of small molecule-polymer blend semiconductors for organic thin film transistors
Published: 8/27/2012
Authors: Nayool Shin, Dean M DeLongchamp, Jihoon Kang, Regis J Kline, Lee J Richter, Vivek M Prabhu, Balaji Purushothamanc, John E Anthony, Do Y Yoon
Abstract: The phase-segregated structure and the electrical properties of thin film blends of the small-molecule semiconductor fluorinated 5,11-bis(triethylsilylethynyl) anthradithiophene with insulating binder polymers were studied for organic thin film trans ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906842

74. Water Absorption in Thin Photoresist Films
Published: 2/1/2004
Authors: B D. Vogt, Christopher L Soles, Ronald Leland Jones, Vivek M Prabhu, Wen-Li Wu, Eric K Lin
Abstract: In this work, we quantify deviations in the moisture absorption into model photoresist films upon changing thickness. Both the thermodynamics and kinetics of the absorption process are examined. Water in the resist films has been shown to have a sign ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852354

75. Water Distribution Within Immersed Polymer Films
Published: 2/1/2005
Authors: B D. Vogt, Christopher L Soles, Vivek M Prabhu, Sushil K Satija, Eric K Lin, Wen-Li Wu
Abstract: The emergence of immersion lithography as a potential alternative for the extension of current lithography tools will require a fundamental understanding of the interactions between the photoresist and the immersion liquid such as water. The water c ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852459

76. Water Immersion of Model Photoresists: Interfacial Influences on Water Concentration and Surface Morphology
Published: 2/1/2005
Authors: B D. Vogt, D L Goldfarb, M Angelopoulos, Christopher L Soles, C M Wang, Vivek M Prabhu, P M McGuiggan, Jack F Douglas, Eric K Lin, Wen-Li Wu, Sushil K Satija
Abstract: Immersion lithography has emerged as an alternative to the 157 nm node and as such understanding of the interactions between the photoresist and immersion fluid (water) has become a pressing issue. The water concentration within the model photoresis ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852338

77. X-Ray and Neutron Reflectivity Measurements of Moisture Transport Through Model Multilayered Barrier Films for Oled Applications
Published: 1/1/2005
Authors: B D. Vogt, V. J. Lee, Vivek M Prabhu, Dean M DeLongchamp, Eric K Lin, Wen-Li Wu
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853976

78. Zone-Refinement Effect in Small Molecule‹Polymer Blend Semiconductors for Organic Thin Film Transistors
Published: 12/14/2010
Authors: Yeon Sook Chung, Nayool Shin, Jihoon Kang, Youngeun Jo, Vivek M Prabhu, Regis J Kline, John E Anthony, Do Y Yoon
Abstract: The blend films of small molecule semiconductors with insulating polymers exhibit not only an excellent solution processability, but also superior performance characteristics (field-effect mobility, on/off ratio, threshold voltage and stability) over ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906520



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