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71. Thin Film Solid State Proton NMR Measurements Using A Synthetic Mica Substrate: Polymer Blends
Published: 8/25/2009
Authors: David Lloyd VanderHart, Vivek M Prabhu, Kristopher Lavery, Cindi L Dennis, Ashwin Rao, Eric K Lin
Abstract: We demonstrate that a synthetic fluorophlogopite mica can be used as a proton-free, diamagnetic substrate for examining solid thin-film samples using conventional solid-state proton nuclear magnetic resonance (NMR) experiments. The context of this w ...

72. Vertically Segregated Structure and Properties of small molecule-polymer blend semiconductors for organic thin film transistors
Published: 8/27/2012
Authors: Nayool Shin, Dean M DeLongchamp, Jihoon Kang, Regis J Kline, Lee J Richter, Vivek M Prabhu, Balaji Purushothamanc, John E Anthony, Do Y Yoon
Abstract: The phase-segregated structure and the electrical properties of thin film blends of the small-molecule semiconductor fluorinated 5,11-bis(triethylsilylethynyl) anthradithiophene with insulating binder polymers were studied for organic thin film trans ...

73. Water Absorption in Thin Photoresist Films
Published: 2/1/2004
Authors: B D. Vogt, Christopher Soles, Ronald Leland Jones, Vivek M Prabhu, Wen-Li Wu, Eric K Lin
Abstract: In this work, we quantify deviations in the moisture absorption into model photoresist films upon changing thickness. Both the thermodynamics and kinetics of the absorption process are examined. Water in the resist films has been shown to have a sign ...

74. Water Distribution Within Immersed Polymer Films
Published: 2/1/2005
Authors: B D. Vogt, Christopher Soles, Vivek M Prabhu, Sushil K. Satija, Eric K Lin, Wen-Li Wu
Abstract: The emergence of immersion lithography as a potential alternative for the extension of current lithography tools will require a fundamental understanding of the interactions between the photoresist and the immersion liquid such as water. The water c ...

75. Water Immersion of Model Photoresists: Interfacial Influences on Water Concentration and Surface Morphology
Published: 2/1/2005
Authors: B D. Vogt, D L Goldfarb, M Angelopoulos, Christopher Soles, C M Wang, Vivek M Prabhu, P M McGuiggan, Jack F Douglas, Eric K Lin, Wen-Li Wu, Sushil K. Satija
Abstract: Immersion lithography has emerged as an alternative to the 157 nm node and as such understanding of the interactions between the photoresist and immersion fluid (water) has become a pressing issue. The water concentration within the model photoresis ...

76. X-Ray and Neutron Reflectivity Measurements of Moisture Transport Through Model Multilayered Barrier Films for Oled Applications
Published: 1/1/2005
Authors: B D. Vogt, V. J. Lee, Vivek M Prabhu, Dean M DeLongchamp, Eric K Lin, Wen-Li Wu

77. Zone-Refinement Effect in Small Molecule‹Polymer Blend Semiconductors for Organic Thin Film Transistors
Published: 12/14/2010
Authors: Yeon Sook Chung, Nayool Shin, Jihoon Kang, Youngeun Jo, Vivek M Prabhu, Regis J Kline, John E Anthony, Do Y Yoon
Abstract: The blend films of small molecule semiconductors with insulating polymers exhibit not only an excellent solution processability, but also superior performance characteristics (field-effect mobility, on/off ratio, threshold voltage and stability) over ...

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