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Author: vivek prabhu
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Displaying records 61 to 70 of 78 records.
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61. Quantitative depth profiling of photoacid generators in photoresist materials by near-edge x-ray absorption fine structure spectroscopy
Published: 11/15/2006
Authors: Vivek M Prabhu, S Sambasivan, Daniel A Fischer, Linda K Sundberg, Robert D Allen
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854199

62. Reaction Front Induced Roughness in Chemically Amplified Photoresists
Published: 8/1/2002
Authors: Vivek M Prabhu, Ronald Leland Jones, Eric K Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Christopher L Soles, Wen-Li Wu, D L Goldfarb, M Angelopoulos
Abstract: We have examined, with tapping mode atomic force microscopy(AFM), the effect of post-exposure bake times and developer on surface roughness using model bilayer interfaces of deuterium-labeled poly(tert-butyloxycarbonyloxy styrene) and poly(hydroxysty ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852008

63. Solid State NMR Investigation of Photoresist Molecular Glasses Including Blend Behavior With a Photoacid Generator
Published: 3/5/2009
Authors: David Lloyd VanderHart, Vivek M Prabhu, Anuja De Silva, Nelson Felix, Christopher K. Ober
Abstract: We have examined four molecular glass (MG) materials which show promise as photoresists for extreme ultraviolet (EUV) lithography. These glass-forming materials were investigated by both proton and 13C solid state nuclear magnetic resonance (NMR) te ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854157

64. Solid State NMR Investigation of Photoresist Molecular Glasses Including Mixing Behavior With a Photoacid Generator
Published: 3/5/2009
Authors: David Lloyd VanderHart, Vivek M Prabhu, Anuja De Silva, Nelson Felix, Christopher K. Ober
Abstract: We have examined four model molecular glasses (MGs) which are candidates for extreme ultraviolet lithography. One rationale for employing MGs is that these materials, on the basis of being molecules smaller than the usual polymeric materials, might ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853586

65. Structure and Properties of Small Molecule-Polymer Blend Semiconductors and High-k Polymer Dielectric for Printable Organic Electronics
Published: 12/1/2009
Authors: Do Yeung Yoon, Jeongwon Kang, Nayool Shin, Do Young Jang, Youngeun Jo, Yeon Sook Chung, Vivek M Prabhu, Dean M DeLongchamp, Regis J Kline, Lee J Richter, David J Gundlach, John E Anthony
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907173

66. Structure and Properties of Small Molecule-Polymer Blend Semiconductors for Organic Thin Film Transistors
Published: 6/4/2008
Authors: Vivek M Prabhu, Jihoon Kang, Nayool Shin, Do Y. Yoon, Do Young Jang
Abstract: A comprehensive structural and electrical characterization of solution-processed blend films of 6,13-bis(triisopropylsilylethynyl)pentacene (TIPS-pentacene) and poly(alpha-methylstyrene) (PaMS) was performed to understand and optimize the blend semic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854087

67. Surface Effects in Chemically Amplified Photoresists: Environmental Stability and Segregation
Published: 2/1/2004
Authors: E Jablonski, Vivek M Prabhu, S Sambasivan, Daniel A Fischer, Eric K Lin, D L Goldfarb, M Angelopoulos, H Ito
Abstract: It is well known that chemically amplified photoresists are sensitive to certain airborne molecular contaminants, notably amines, during post exposure delay, although the actual cause and specific failure mechanism are unknown. To assess the effect o ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852321

68. Surface and Bulk Chemistry of Chemically Amplified Photoresists: Segregation in Thin Films and Environmental Stability Issues
Published: 9/1/2004
Authors: E Jablonski, Vivek M Prabhu, S Sambasivan, Daniel A Fischer, Eric K Lin, D L Goldfarb, M Angelopolous, H Ito
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852294

69. The Deprotection Reaction Front Profile for Model 193 nm Methacrylate-Based Chemically Amplified Photoresists
Published: 3/1/2006
Authors: B D. Vogt, Shuhui Kang, Vivek M Prabhu, Ashwin Rao, Eric K Lin, Sushil K. Satija, Karen Turnquest, Wen-Li Wu
Abstract: An understanding of acid diffusion-reaction in chemically amplified photoresists during the post-exposure bake (PEB) is critical for both critical dimension (CD) and line edge roughness (LER) control. Despite its importance, there remains a lack of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852589

70. The Effect of Deprotection Extent on Swelling and Dissolution Regimes of Thin Polymer Films
Published: 10/28/2006
Authors: Ashwin Rao, Shuhui Kang, B D. Vogt, Vivek M Prabhu, Eric K Lin, Wen-Li Wu, M Muthukumar
Abstract: The response of unentangled polymer thin films to aqueous hydroxide solutions is measured as a function of increasing weakly-acidic methacrylic acid comonomer content produced by an in-situ reaction-diffusion process. Quartz crystal microbalance wit ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852637



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