Publications Portal

You searched on:
Author: vivek prabhu
Sorted by: title

Displaying records 51 to 60 of 77 records.
Resort by: Date / Title

51. Photoacid Generator Dispersion in Partially Fluorinated Photoresist Polymers and their Blends
Published: Date unknown
Authors: David Lloyd VanderHart, Vivek M Prabhu
Abstract: Solid state proton NMR methods are used to probe the intimacy of mixing in materials relevant to photoresist applications. Bulk blends, made solvent casting, consisted of partially fluorinated polymers and the photoacid generator, di(t-butylphenyl) ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852494

52. Photoresist latent and developer images as probed by neutron reflectivity methods
Published: 9/16/2010
Authors: Vivek M Prabhu, Shuhui Kang, David Lloyd VanderHart, Eric K Lin, Wen-Li Wu
Abstract: Photoresist materials enable the fabrication of advanced integrated circuits with ever decreasing feature sizes. As next-generation light sources are developed, using extreme ultraviolet light of wavelength 13.5 nm, these highly-tuned formulations m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902742

53. Polyelectrolyte Effects in Model Photoresist Developer Solutions
Published: 8/1/2003
Authors: Vivek M Prabhu, Ronald Leland Jones, Eric K Lin, Wen-Li Wu
Abstract: We demonstrate that the industrially relevant deprotected photoresist poly(4-hydroxy styrene) is a polyelectrolyte when dissolved in aqueous base solutions. These findings demonstrate the well-known monomer-monomer correlations indicative of polyel ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852091

54. Polyelectrolyte Effects in Model Photoresist Developer Solutions: Roles of Base Concentration and Added Salts
Published: 1/1/2003
Authors: Vivek M Prabhu, Ronald Leland Jones, Eric K Lin, Christopher L Soles, Wen-Li Wu, D L Goldfarb, M Angelopoulos
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853867

55. Polymer Dynamics and Diffusive Properties in Ultra-Thin Photoresist Films
Published: 2/1/2003
Authors: Christopher L Soles, Ronald Leland Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Vivek M Prabhu, Wen-Li Wu, Eric K Lin, D L Goldfarb, M Angelopoulos
Abstract: A series of experiments are presented to demonstrate thin film confinement effects on the diffusive properties in poly(tert-butoxycarboxystyrene) (PBOCSt). Bilayer diffusion couple measurements reveal that as the thickness of a PBOCSt film is decrea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852201

56. Proton NMR Determination of Miscibility in a Bulk Model Photoresist System Poly (4-Hydroxystyene) and the Photoacid Generator, Di(t-butylphenyl) Iodonium Perfluorooctane Sulfonate
Published: 7/13/2004
Authors: David Lloyd VanderHart, Vivek M Prabhu, Eric K Lin
Abstract: The intimacy of component mixing in 2 blends of poly(4-hydroxystyrene) (PHS) and a photoacid generator (PAG), di(t-butylphenyl) iodonium perfluorooctane sulfonate (PFOS) were studied by solid state proton NMR. Mass ratios were 91/9 and 85/15 PHS/PFO ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852101

57. Proton NMR Determination of Miscibility in a Bulk Model Photoresist System: Poly(4-hydroxystyrene) and the Photoacid Generator, Di-(t-butylphenyl) Iodonium Perfluorooctanesulfonate
Published: 1/1/2004
Authors: David Lloyd VanderHart, Vivek M Prabhu, Eric K Lin
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853953

58. Quantitative Depth Profiling of Photoacid Generators in Photoresist Materials by Near-Edge X-Ray Absorption Fine Structure Spectroscopy
Published: 5/9/2006
Authors: Vivek M Prabhu, S Sambasivan, Daniel A Fischer, Linda K Sundberg, Robert D Allen
Abstract: We apply near-edge x-ray absorption fine structure (NEXAFS) spectroscopy to quantify the surface composition and depth profiling of photoacid generators in thin film photoresist materials by varying the entrance-grid bias of the photoelectron detecto ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852582

59. Quantitative Measurement of the Polydispersity in the Extent of Functionalization of Glass Forming Resorcinarenes
Published: 5/1/2009
Authors: William E Wallace III, Kathleen M. Flynn, Charles Martin Guttman, David Lloyd VanderHart, Vivek M Prabhu, Anuja De Silva, Nelson Felix, Christopher K. Ober
Abstract: The polydispersity in the degree of functionalization for two calix[4]resorcinarenes was determined by measuring their molecular mass distribution with matrix-assisted laser desorption/ionization time of flight mass spectrometry. A mathematical meth ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854457

60. Quantitative depth profiling of photoacid generators in photoresist materials by near-edge x-ray absorption fine structure spectroscopy
Published: 11/15/2006
Authors: Vivek M Prabhu, S Sambasivan, Daniel A Fischer, Linda K Sundberg, Robert D Allen
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854199