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Displaying records 41 to 50 of 78 records.
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41. Interdiffusion in Polystyrene and End-Functional Polystyrene Thin Films Near a Solid Surface
Published: 9/1/2003
Authors: C M Wang, Vivek M Prabhu, Christopher L Soles, B D. Vogt, Wen-Li Wu, Eric K Lin, Sushil K. Satija
Abstract: Polymer interdiffusion near the polymer/solid interface is studied using neutron reflectometry. Bilayers of hydrogenated polystyrene (hPS) and deuterated polystyrene (dPS) or hydrogenated dicarboxy terminated polystyrene (hPS(COOH)2) and dPS are prep ...

42. Interfacial Structure of Photoresist Thin Films in Developer Solutions
Published: 3/1/2005
Authors: Vivek M Prabhu, B D. Vogt, Wen-Li Wu, Jack F Douglas, Sushil K. Satija, D M Goldfarb, H Ito
Abstract: The development step is critical to the fabrication of nanostructures in chemically amplified photoresist technology. With critical dimensions (CD) shrinking to sub-100 nm and the concurrent reduction in exposure radiation wavelength, line-edge roug ...

43. Lateral Length Scales of Latent Image Roughness as Determined by Off-Specular Neutron Reflectivity
Published: 2/14/2008
Authors: Kristopher Lavery, Vivek M Prabhu, Eric K Lin, Wen-Li Wu, Sushil K. Satija, Kwang-Woo Choi, M Wormington
Abstract: A combination of specular and off-specular neutron reflectometry was used to measure the buried lateral roughness of the reaction-diffusion front in a model extreme ultraviolet lithography photoresist. Compositional heterogeneity at the latent react ...

44. Lateral Uniformity in Chemical Composition along a Buried Reaction Front in Polymers
Published: 11/15/2010
Authors: Kristopher Lavery, Vivek M Prabhu, Sushil K. Satija, Wen-Li Wu
Abstract: Off-specular neutron reflectometry was applied to characterize the form and amplitude of lateral compositional variations at a buried reaction-diffusion front. In this work, off-specular neutron measurements were first calibrated using off-specular ...

45. Manipulation of the asymmetric swelling fronts of photoresist polyelectrolyte gradient thin films
Published: 9/22/2008
Authors: Vivek M Prabhu, Ashwin Rao, Shuhui Kang, Eric K Lin, Sushil K. Satija
Abstract: The depth profile of swelling polyelectrolyte layers is characterized by a static substrate layer and an asymmetric profile with position and shape parameters that describe the near substrate and solution-side of the interfacial region. The character ...

46. Measurements of the Reaction-Diffusion Front of Model Chemically Amplified Photoresists With Varying Photoacid Size
Published: 10/26/2006
Authors: B D. Vogt, Shuhui Kang, Vivek M Prabhu, Eric K Lin, Sushil K. Satija, Karen Turnquest, Wen-Li Wu
Abstract: Neutron reflectivity and Fourier transform infrared spectroscopy measurements are used to profile the deprotection reaction-diffusion front with a nanometer resolution in a model photoresist polymer using three perfluoroalkane-based photoacid generat ...

47. Methodology for quantitative measurements of multilayer polymer thin films with IR spectroscopic ellipsometry
Published: 7/2/2009
Authors: Shuhui Kang, Vivek M Prabhu, Christopher L Soles, Eric K Lin, Wen-Li Wu
Abstract: A new methodology to quantify the sensitivity and resolution of infrared variable angle spectroscopic ellipsometry (IRSE) measurements was developed for probing the depth profile of composition in thin polymer films. A multilayer system comprised of ...

48. Nanoelectronics Lithography
Published: 3/1/2011
Authors: Stephen Knight, Vivek M Prabhu, John H Burnett, James Alexander Liddle, Christopher L Soles, Alain C. Diebold
Abstract: This is a compiled chapter that will be included into the Handbook of Nanophysics.

49. Nanoparticle assembly, DNA provides control
Published: 5/1/2009
Authors: Vivek M Prabhu, Steven D Hudson
Abstract: No abstract this is a Nature Materials News and Views (less than 800 word) article.

50. Near-Edge X-Ray Absorption Fine Structure Measurements of Surface Segregation in 157 nm Photoresist Blends
Published: 12/1/2003
Authors: E Jablonski, Vivek M Prabhu, S Sambasivan, Eric K Lin, Daniel A Fischer, D L Goldfarb, M Angelopoulos, H Ito
Abstract: The surface and bulk chemistry of photoresist blends for use at the 157 nm node were analyzed using near edge x-ray absorption fine structure (NEXAFS) spectroscopy to quantify component segregation and identify surface phenomena that may impact patte ...

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