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Author: vivek prabhu
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Displaying records 31 to 40 of 77 records.
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31. FTIR measurements of compositional heterogeneities
Published: 2/25/2007
Authors: Shuhui Kang, B D. Vogt, Wen-Li Wu, Vivek M Prabhu, David Lloyd VanderHart, Ashwin Rao, Eric K Lin, Karen Turnquest
Abstract: A general approach to characterize compositional heterogeneity in polymer thin films using Fourier transform infrared (FTIR) spectroscopy has been demonstrated Polymer films with varying degrees of heterogeneity were prepared using a model chemically ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852722

32. Fluorescence Correlation Spectroscopy Investigation of Growth Factor Dynamics in Three Dimensional Extracellular Matrices
Published: Date unknown
Authors: Michael Weir, Chengqing C. Wang, Vivek M Prabhu, Eric K Lin, K Yamada, N Washburn
Abstract: Fluorescence correlation spectroscopy was used to measure the binding and diffusion of growth factors in model extracellular matrices in order to investigate the importance of protein-matrix interactions in regulating signaling molecules within a thr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852367

33. Form of Deprotection in Chemically Amplified Resists
Published: 9/1/2003
Authors: Ronald Leland Jones, T J Hu, Vivek M Prabhu, Christopher L Soles, Eric K Lin, Wen-Li Wu, D L Goldfarb, M Angelopoulos
Abstract: The push to mass production of patterns with sub-100 nm dimensions will require nanometer level control of feature size, including line edge roughness (LER). Control of LER and sidewall roughness within the length scale of individual molecules requi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852161

34. Fundamentals of Developer-Resist Interactions for Line-Edge Roughness and Critical Dimension Control in Model 248 nm and 157 nm Photoresists
Published: 5/1/2004
Authors: Vivek M Prabhu, M Wang, E Jablonski, B D. Vogt, Eric K Lin, Wen-Li Wu, D L Goldfarb, M Angelopoulos, H Ito
Abstract: Organic polar solvent (1-butanol) versus aqueous base (tetramethylammonium hydroxide, (TMAH)) development quality are distinguished by neutral versus charged polymer (polyelectrolyte) dissolution behavior of photoresist bilayers on silicon substrates ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852336

35. Fundamentals of the Reaction-Diffusion Process in Model EUV Photoresists
Published: 3/1/2006
Authors: Kristopher Lavery, George Thompson, Hai Deng, D S Fryer, Kwang-Woo Choi, B D. Vogt, Vivek M Prabhu, Eric K Lin, Wen-Li Wu, Sushil K. Satija, Michael Leeson, Heidi B Cao
Abstract: More demanding requirements are being made of photoresist materials for fabrication of nanostructures as the feature critical dimensions (CD) decrease. For EUV resists, control of line width roughness (LWR) and high resist sensitivity are key requir ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852624

36. Identifying Materials Limits of Chemically Amplified Photoresists
Published: 2/25/2007
Authors: Wen-Li Wu, Vivek M Prabhu, Eric K Lin
Abstract: Chemically amplified photoresists are likely to remain the primary imaging materials for the semiconductor industry. As feature sizes decrease to dimensions comparable to the characteristic size of the molecules in the photoresist, a significant cha ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852749

37. In situ electrochemical small-angle neutron scattering (eSANS) for quantitative structure and redox properties of nanoparticles
Published: 2/16/2012
Authors: Vivek M Prabhu, Vytautas Reipa
Abstract: Rapid growth in nanomaterial applications highlight limitations of available physicochemical characterization methods. An in situ electrochemical small-angle neutron scattering (eSANS) meth-odology was devised that enables direct measurements of nano ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909405

38. Influence of Base Additives on the Reaction Diffusion Front of Model Chemically Amplified Photoresists
Published: 1/11/2007
Authors: B D. Vogt, Shuhui Kang, Vivek M Prabhu, Ashwin Rao, Eric K Lin, Sushil K. Satija, Karen Turnquest, Wen-Li Wu
Abstract: The effects of amine base quencher on the photoacid catalyzed deprotection reaction-diffusion front in model photoresists was measured by combination of neutron reflectivity and Fourier transform infrared spectroscopy. Modulation in the location of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852647

39. Interdiffision in Polystyrene and End-Functional Polystyrene Thin Films Near a Solid Surface
Published: 9/10/2003
Authors: Chengqing C. Wang, Vivek M Prabhu, Christopher L Soles, B D. Vogt, Wen-Li Wu, Eric K Lin, Sushil K. Satija
Abstract: Polymer interdiffusion near the polymer/solid interface is studied using neutron reflectometry. Bilayers of hydrogenated polystyrene (hPS) and deuterated polystyrene (dPS) or hydrogenated dicarboxy terminated polystyrene (hPS(COOH)2) and dPS are prep ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852188

40. Interdiffusion in Polystyrene and End-Functional Polystyrene Thin Films Near a Solid Surface
Published: 9/1/2003
Authors: C M Wang, Vivek M Prabhu, Christopher L Soles, B D. Vogt, Wen-Li Wu, Eric K Lin, Sushil K. Satija
Abstract: Polymer interdiffusion near the polymer/solid interface is studied using neutron reflectometry. Bilayers of hydrogenated polystyrene (hPS) and deuterated polystyrene (dPS) or hydrogenated dicarboxy terminated polystyrene (hPS(COOH)2) and dPS are prep ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852237