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Author: vivek prabhu
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Displaying records 21 to 30 of 78 records.
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21. Deprotection Volume Characteristics and Line Edge Morphology in Chemically Amplified Resists
Published: 6/1/2003
Authors: Ronald Leland Jones, C G Willson, T J Hu, Vivek M Prabhu, Christopher L Soles, Eric K Lin, Wen-Li Wu, D L Goldfarb, M Angelopoulos, B C Trinque
Abstract: The focus of this paper is the form of spatial heterogeneity of deprotection at the eventual pattern edge. The form results from the packing of fuzzy blobs consisting of volumes of deprotection created by individual photogenerated acids. The for ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852190

22. Dielectric Properties of Nylon 6/Clay Nanocomposites From On-Line Process Monitoring and Off-Line Measurements
Published: 7/1/2005
Authors: N Noda, Y E Lee, Anthony J. Bur, Vivek M Prabhu, Chad R Snyder, S C Roth, M M McBrearty
Abstract: Nylon 6/ clay nanocomposites were studied by dielectric relaxation spectroscopy (DRS) to correlate morphology and microstructure with relaxation behavior of the polymer matrix at the molecular level. Two types of microstructure, agglomerated and exf ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852234

23. Direct Measurement of the Counterion Distribution Within Swollen Polyelectrolyte Films
Published: 7/19/2005
Authors: Vivek M Prabhu, B D. Vogt, Wen-Li Wu, Eric K Lin, Jack F Douglas, Sushil K Satija, D L Goldfarb, H Ito
Abstract: The depth profile of the counterion concentration within thin polyelectrolyte films was measured in situ using contrast variant specular neutron reflectivity to characterize the initial swelling stage of the film dissolution.Wefind substantial counte ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852397

24. Direct Measurement of the Counterion Distribution Within Swollen Polyelectrolyte Films
Published: 5/20/2005
Authors: Vivek M Prabhu, B D. Vogt, Wen-Li Wu, Jack F Douglas, Eric K Lin, Sushil K Satija, D M Goldfarb, H Ito
Abstract: A depth profile of the counterion concentration within thin polyelectrolyte films was measured in-situ using contrast variant specular neutron reflectivity to characterize the initial swelling stage of the film dissolution. We find a substantial coun ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854005

25. Direct measurement of the spatial extent of the in situ developed latent image by neutron reflectivity
Published: 12/11/2007
Authors: Vivek M Prabhu, B D. Vogt, Shuhui Kang, Eric K Lin, Sushil K Satija
Abstract: The spatial distribution of polymer photoresist and deuterium labeled base developer highlights a fraction of the line edge that swells but does not dissolve. This residual swelling fraction remains swollen during both the in situ aqueous hydroxide ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852747

26. Dissolution Fundamentals of 193-nm Methacrylate Based Photoresists
Published: 2/19/2006
Authors: Ashwin Rao, Shuhui Kang, B D. Vogt, Vivek M Prabhu, Eric K Lin, Wen-Li Wu, Karen Turnquest, W D Hinsberg
Abstract: The dissolution of partially deprotected chemically amplified photoresists is the final step in printing lithographic features. Since this process step can be tuned independently from the design of the photoresist chemistry, fundamental measurements ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852551

27. Dynamic light scattering investigations of nanoparticle aggregation following a light-induced pH jump
Published: 5/19/2010
Authors: Ryan Murphy, Denis Pristinski, Kalman D Migler, Jack F Douglas, Vivek M Prabhu
Abstract: We use dynamic light scattering to characterize the kinetics of nanoparticle aggregation. The aggregation process was conveniently initiated in photoacid generator (PAG) solutions where changes in the pH of the solution can be controlled by exposure ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904974

28. Effect of Photoacid Generator Concentration and Developer Strength on the Patterning Capabilities of a Model EUV Photoresist
Published: 2/25/2007
Authors: Kwang-Woo Choi, Vivek M Prabhu, Kristopher Lavery, Eric K Lin, Wen-Li Wu, John Taylor Woodward IV, Michael Leeson, H Cao, Manish Chandhok, George Thompson
Abstract: Current extreme ultraviolet (EUV) photoresist materials do not yet meet requirements on exposure-dose sensitivity, line-width roughness (LWR), and resolution. Fundamental studies are required to quantify the trade-offs in materials properties and pr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852725

29. Evaluation of the 3D Compositional Fluctuation Effect on Line-Edge-Roughness
Published: 2/25/2007
Authors: Shuhui Kang, Wen-Li Wu, B D. Vogt, Vivek M Prabhu, Eric K Lin, Karen Turnquest
Abstract: Line-edge-roughness (LER) and the relationship to resist processing and materials design is a critical problem for sub-65 nm photolithography. In this work we investigate how chemical composition fluctuations (heterogeneity) produced by the reaction ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852724

30. Exposure Dose Effects on the Reaction-Diffusion Process in Model extreme ultraviolet Photoresists
Published: 11/30/2006
Authors: Kristopher Lavery, B D. Vogt, Vivek M Prabhu, Eric K Lin, Wen-Li Wu, Kwang-Woo Choi
Abstract: The effect of exposure dose on the latent image deprotection profile in a model extreme ultraviolet (EUV) photoresist polymer, poly(hydroxystyrene-co-d9-tert-butyl acrylate), is measured with neutron reflectometry. As the photoacid concentration is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852653



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