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Author: vivek prabhu

Displaying records 61 to 70 of 77 records.
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61. Water Absorption in Thin Photoresist Films
Published: 2/1/2004
Authors: B D. Vogt, Christopher L Soles, Ronald Leland Jones, Vivek M Prabhu, Wen-Li Wu, Eric K Lin
Abstract: In this work, we quantify deviations in the moisture absorption into model photoresist films upon changing thickness. Both the thermodynamics and kinetics of the absorption process are examined. Water in the resist films has been shown to have a sign ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852354

62. Counterion Associative Behavior with Flexible Polyelectrolytes
Published: 1/1/2004
Authors: Vivek M Prabhu, Eric J. Amis, D P Bossev, N S Rosov
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853951

63. Proton NMR Determination of Miscibility in a Bulk Model Photoresist System: Poly(4-hydroxystyrene) and the Photoacid Generator, Di-(t-butylphenyl) Iodonium Perfluorooctanesulfonate
Published: 1/1/2004
Authors: David Lloyd VanderHart, Vivek M Prabhu, Eric K Lin
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853953

64. Near-Edge X-Ray Absorption Fine Structure Measurements of Surface Segregation in 157 nm Photoresist Blends
Published: 12/1/2003
Authors: E Jablonski, Vivek M Prabhu, S Sambasivan, Eric K Lin, Daniel A Fischer, D L Goldfarb, M Angelopoulos, H Ito
Abstract: The surface and bulk chemistry of photoresist blends for use at the 157 nm node were analyzed using near edge x-ray absorption fine structure (NEXAFS) spectroscopy to quantify component segregation and identify surface phenomena that may impact patte ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852205

65. Interdiffision in Polystyrene and End-Functional Polystyrene Thin Films Near a Solid Surface
Published: 9/10/2003
Authors: Chengqing C. Wang, Vivek M Prabhu, Christopher L Soles, B D. Vogt, Wen-Li Wu, Eric K Lin, Sushil K Satija
Abstract: Polymer interdiffusion near the polymer/solid interface is studied using neutron reflectometry. Bilayers of hydrogenated polystyrene (hPS) and deuterated polystyrene (dPS) or hydrogenated dicarboxy terminated polystyrene (hPS(COOH)2) and dPS are prep ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852188

66. Form of Deprotection in Chemically Amplified Resists
Published: 9/1/2003
Authors: Ronald Leland Jones, T J Hu, Vivek M Prabhu, Christopher L Soles, Eric K Lin, Wen-Li Wu, D L Goldfarb, M Angelopoulos
Abstract: The push to mass production of patterns with sub-100 nm dimensions will require nanometer level control of feature size, including line edge roughness (LER). Control of LER and sidewall roughness within the length scale of individual molecules requi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852161

67. Interdiffusion in Polystyrene and End-Functional Polystyrene Thin Films Near a Solid Surface
Published: 9/1/2003
Authors: C M Wang, Vivek M Prabhu, Christopher L Soles, B D. Vogt, Wen-Li Wu, Eric K Lin, Sushil K Satija
Abstract: Polymer interdiffusion near the polymer/solid interface is studied using neutron reflectometry. Bilayers of hydrogenated polystyrene (hPS) and deuterated polystyrene (dPS) or hydrogenated dicarboxy terminated polystyrene (hPS(COOH)2) and dPS are prep ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852237

68. Polyelectrolyte Effects in Model Photoresist Developer Solutions
Published: 8/1/2003
Authors: Vivek M Prabhu, Ronald Leland Jones, Eric K Lin, Wen-Li Wu
Abstract: We demonstrate that the industrially relevant deprotected photoresist poly(4-hydroxy styrene) is a polyelectrolyte when dissolved in aqueous base solutions. These findings demonstrate the well-known monomer-monomer correlations indicative of polyel ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852091

69. Deprotection Volume Characteristics and Line Edge Morphology in Chemically Amplified Resists
Published: 6/1/2003
Authors: Ronald Leland Jones, C G Willson, T J Hu, Vivek M Prabhu, Christopher L Soles, Eric K Lin, Wen-Li Wu, D L Goldfarb, M Angelopoulos, B C Trinque
Abstract: The focus of this paper is the form of spatial heterogeneity of deprotection at the eventual pattern edge. The form results from the packing of fuzzy blobs consisting of volumes of deprotection created by individual photogenerated acids. The for ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852190

70. Chemically Amplified Resist Fundamentals Studies by Combinatorial approaches
Published: 3/1/2003
Authors: M Wang, Vivek M Prabhu, Eric K Lin, Michael J Fasolka, Alamgir Karim
Abstract: Sub-100 nm lithography requires more understanding of photoresist material properties and processing conditions to achieve necessary critical dimension control of patterned structures. As resist thickness and feature linewidth decrease, fundamental ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852278