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Author: vivek prabhu

Displaying records 11 to 20 of 78 records.
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11. Dynamic light scattering investigations of nanoparticle aggregation following a light-induced pH jump
Published: 5/19/2010
Authors: Ryan Murphy, Denis Pristinski, Kalman D Migler, Jack F Douglas, Vivek M Prabhu
Abstract: We use dynamic light scattering to characterize the kinetics of nanoparticle aggregation. The aggregation process was conveniently initiated in photoacid generator (PAG) solutions where changes in the pH of the solution can be controlled by exposure ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904974

12. Architectural Effects on Reaction-Diffusion Kinetics in Molecular Glass Photoresists
Published: 4/20/2010
Authors: Vivek M Prabhu, Shuhui Kang, Christopher L Soles, Christopher K. Ober, Jing Sha, Jin-Kyun Lee, Peter V. Bonnesen
Abstract: Understanding acid reaction-diffusion kinetics is crucial for controlling the lithographic performance of chemically amplified photoresists. In this work, we study how the molecular architectures of positive-tone chemically amplified molecular glass ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904649

13. Characterization of the photoacid diffusion length and reaction kinetics in EUV photoresists with IR spectroscopy
Published: 4/14/2010
Authors: Shuhui Kang, Wen-Li Wu, Kwang-Woo Choi, Vivek M Prabhu, Anuja De Silva, Christopher K. Ober
Abstract: A soft-contact film transfer method was developed to prepare multilayer photoresist thin films that enable high resolution spectroscopic and reflectivity measurements for determining the reaction-diffusion kinetic parameters and photoacid diffusion ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904320

14. Structure and Properties of Small Molecule-Polymer Blend Semiconductors and High-k Polymer Dielectric for Printable Organic Electronics
Published: 12/1/2009
Authors: Do Yeung Yoon, Jeongwon Kang, Nayool Shin, Do Young Jang, Youngeun Jo, Yeon Sook Chung, Vivek M Prabhu, Dean M DeLongchamp, Regis J Kline, Lee J Richter, David J Gundlach, John E Anthony
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907173

15. Thin Film Solid State Proton NMR Measurements Using A Synthetic Mica Substrate: Polymer Blends
Published: 8/25/2009
Authors: David Lloyd VanderHart, Vivek M Prabhu, Kristopher Lavery, Cindi L. Dennis, Ashwin Rao, Eric K Lin
Abstract: We demonstrate that a synthetic fluorophlogopite mica can be used as a proton-free, diamagnetic substrate for examining solid thin-film samples using conventional solid-state proton nuclear magnetic resonance (NMR) experiments. The context of this w ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900180

16. Methodology for quantitative measurements of multilayer polymer thin films with IR spectroscopic ellipsometry
Published: 7/2/2009
Authors: Shuhui Kang, Vivek M Prabhu, Christopher L Soles, Eric K Lin, Wen-Li Wu
Abstract: A new methodology to quantify the sensitivity and resolution of infrared variable angle spectroscopic ellipsometry (IRSE) measurements was developed for probing the depth profile of composition in thin polymer films. A multilayer system comprised of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902197

17. Nanoparticle assembly, DNA provides control
Published: 5/1/2009
Authors: Vivek M Prabhu, Steven D Hudson
Abstract: No abstract this is a Nature Materials News and Views (less than 800 word) article.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902344

18. Quantitative Measurement of the Polydispersity in the Extent of Functionalization of Glass Forming Resorcinarenes
Published: 5/1/2009
Authors: William E Wallace III, Kathleen M. Flynn, Charles Martin Guttman, David Lloyd VanderHart, Vivek M Prabhu, Anuja De Silva, Nelson Felix, Christopher K. Ober
Abstract: The polydispersity in the degree of functionalization for two calix[4]resorcinarenes was determined by measuring their molecular mass distribution with matrix-assisted laser desorption/ionization time of flight mass spectrometry. A mathematical meth ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854457

19. Solid State NMR Investigation of Photoresist Molecular Glasses Including Blend Behavior With a Photoacid Generator
Published: 3/5/2009
Authors: David Lloyd VanderHart, Vivek M Prabhu, Anuja De Silva, Nelson Felix, Christopher K. Ober
Abstract: We have examined four molecular glass (MG) materials which show promise as photoresists for extreme ultraviolet (EUV) lithography. These glass-forming materials were investigated by both proton and 13C solid state nuclear magnetic resonance (NMR) te ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854157

20. Solid State NMR Investigation of Photoresist Molecular Glasses Including Mixing Behavior With a Photoacid Generator
Published: 3/5/2009
Authors: David Lloyd VanderHart, Vivek M Prabhu, Anuja De Silva, Nelson Felix, Christopher K. Ober
Abstract: We have examined four model molecular glasses (MGs) which are candidates for extreme ultraviolet lithography. One rationale for employing MGs is that these materials, on the basis of being molecules smaller than the usual polymeric materials, might ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853586



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