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Author: vivek prabhu

Displaying records 11 to 20 of 77 records.
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11. Architectural Effects on Reaction-Diffusion Kinetics in Molecular Glass Photoresists
Published: 4/20/2010
Authors: Vivek M Prabhu, Shuhui Kang, Christopher L Soles, Christopher K. Ober, Jing Sha, Jin-Kyun Lee, Peter V. Bonnesen
Abstract: Understanding acid reaction-diffusion kinetics is crucial for controlling the lithographic performance of chemically amplified photoresists. In this work, we study how the molecular architectures of positive-tone chemically amplified molecular glass ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904649

12. Characterization of the photoacid diffusion length and reaction kinetics in EUV photoresists with IR spectroscopy
Published: 4/14/2010
Authors: Shuhui Kang, Wen-Li Wu, Kwang-Woo Choi, Vivek M Prabhu, Anuja De Silva, Christopher K. Ober
Abstract: A soft-contact film transfer method was developed to prepare multilayer photoresist thin films that enable high resolution spectroscopic and reflectivity measurements for determining the reaction-diffusion kinetic parameters and photoacid diffusion ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904320

13. Structure and Properties of Small Molecule-Polymer Blend Semiconductors and High-k Polymer Dielectric for Printable Organic Electronics
Published: 12/1/2009
Authors: Do Yeung Yoon, Jeongwon Kang, Nayool Shin, Do Young Jang, Youngeun Jo, Yeon Sook Chung, Vivek M Prabhu, Dean M DeLongchamp, Regis J Kline, Lee J Richter, David J Gundlach, John E Anthony
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=907173

14. Thin Film Solid State Proton NMR Measurements Using A Synthetic Mica Substrate: Polymer Blends
Published: 8/25/2009
Authors: David Lloyd VanderHart, Vivek M Prabhu, Kristopher Lavery, Cindi L Dennis, Ashwin Rao, Eric K Lin
Abstract: We demonstrate that a synthetic fluorophlogopite mica can be used as a proton-free, diamagnetic substrate for examining solid thin-film samples using conventional solid-state proton nuclear magnetic resonance (NMR) experiments. The context of this w ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900180

15. Methodology for quantitative measurements of multilayer polymer thin films with IR spectroscopic ellipsometry
Published: 7/2/2009
Authors: Shuhui Kang, Vivek M Prabhu, Christopher L Soles, Eric K Lin, Wen-Li Wu
Abstract: A new methodology to quantify the sensitivity and resolution of infrared variable angle spectroscopic ellipsometry (IRSE) measurements was developed for probing the depth profile of composition in thin polymer films. A multilayer system comprised of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902197

16. Nanoparticle assembly, DNA provides control
Published: 5/1/2009
Authors: Vivek M Prabhu, Steven D Hudson
Abstract: No abstract this is a Nature Materials News and Views (less than 800 word) article.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902344

17. Quantitative Measurement of the Polydispersity in the Extent of Functionalization of Glass Forming Resorcinarenes
Published: 5/1/2009
Authors: William E Wallace III, Kathleen M. Flynn, Charles Martin Guttman, David Lloyd VanderHart, Vivek M Prabhu, Anuja De Silva, Nelson Felix, Christopher K. Ober
Abstract: The polydispersity in the degree of functionalization for two calix[4]resorcinarenes was determined by measuring their molecular mass distribution with matrix-assisted laser desorption/ionization time of flight mass spectrometry. A mathematical meth ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854457

18. Solid State NMR Investigation of Photoresist Molecular Glasses Including Blend Behavior With a Photoacid Generator
Published: 3/5/2009
Authors: David Lloyd VanderHart, Vivek M Prabhu, Anuja De Silva, Nelson Felix, Christopher K. Ober
Abstract: We have examined four molecular glass (MG) materials which show promise as photoresists for extreme ultraviolet (EUV) lithography. These glass-forming materials were investigated by both proton and 13C solid state nuclear magnetic resonance (NMR) te ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854157

19. Solid State NMR Investigation of Photoresist Molecular Glasses Including Mixing Behavior With a Photoacid Generator
Published: 3/5/2009
Authors: David Lloyd VanderHart, Vivek M Prabhu, Anuja De Silva, Nelson Felix, Christopher K. Ober
Abstract: We have examined four model molecular glasses (MGs) which are candidates for extreme ultraviolet lithography. One rationale for employing MGs is that these materials, on the basis of being molecules smaller than the usual polymeric materials, might ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853586

20. Characterization of the Photoacid Diffusion Length
Published: 2/27/2009
Authors: Shuhui Kang, Vivek M Prabhu, Wen-Li Wu, Eric K Lin, Kwang-Woo Choi, Manish Chandhok, Todd Younkin, Wang Yueh
Abstract: The photoacid diffusion length is a critical issue for EUV photoresists and photolithography because it governs critical dimension (CD), line-edge-roughness (LER) and line-width-roughness (LWR). This paper provides an approach to characterize the pho ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902190