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Author: james olthoff
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31.
Electron Collision Cross Sections Derived from Critically Assessed Data
Published: 7/1/1999
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: Electron-molecule collisions are among the most fundamental processes in gas discharges. They are also the precursors of the ions and the radicals which drive the etch, cleaning, or deposition processes in plasma reactors. Hence, there is a need fo
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=4991
32.
Electron Collision Data for Plasma-Processing Gases
Published: 10/1/2000
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: Low-temperature plasma applications require detailed understanding of the physical and chemical processes occurring in the plasmas themselves. For instance, as the push for smaller feature sizes and higher quality devices in the semiconductor indu
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=7872
33.
Electron Drift Velocities and Electron Attachment Coefficients in Pure CHF^d3^, and its Mixtures with Argon
Published: 12/1/1998
Authors: Yicheng Wang, Loucas G. Christophorou, James K Olthoff, J. K. Verbrugge
Abstract: Measurements are reported of (i) the electron drift velocity in pure trifluoromethane (CHF^d3^) gas and in its mixtures with argon, and (ii) electron attachment in pure CHF^d3^. The E/N dependence on the electron drift velocity in mixtures exhibits
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=3598
34.
Electron Drift and Attachment in CHF^d3^ and its Mixtures With Argon
Published: 5/1/1999
Authors: Yicheng Wang, Loucas G. Christophorou, James K Olthoff, J. K. Verbrugge
Abstract: Measurements are reported of the electron drift velocity, w, in CHF^d3^ gas and in its mixtures with argon. The E/N dependence of w in the mixtures exhibits regions of distinct negative differential conductivity. A small electron attachment rate co
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=20509
35.
Electron Interactions With C^d3^F^d8^
Published: 9/1/1996
Authors: Loucas G. Christophorou, James K Olthoff, MVVS. Rao
Abstract: To aid the many and diverse applications for which perfluoropropane (C^d3^F^d8^) is suited, we critically evaluate and synthesize existing knowledge on electron scattering and electron energy-loss processes for the C^d3^F^d8^ molecule, and provide re
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=16060
36.
Electron Interactions With Cl^d2^
Published: 4/1/1999
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: Low energy electron interactions with the Cl^d2^ molecule are reviewed. Information is synthesized and assessed on the cross sections for total electron scattering, total rotational excitation, total elastic electron scattering, momentum transfer, to
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=8765
37.
Electron Interactions With Plasma Processing Gases: CF^d4^, CHF^d3^, C^d2^F^d6^, and C^d3^F^d8^
Published: 1/1/1998
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: A review of our efforts to evaluate and assess electron interaction data for the plasma processing community is presented. Specifically we present in this paper our recommended electron-interaction cross sections for CF^d4^, CHF^d3^, C^d2^F^d6^, and
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=16418
38.
Electron Interactions With SF^d6^
Published: 1/1/2000
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: Sulfur hexafluoride (SF^d6^) is commonly used as a gaseous dielectric and as a plasma etching gas. In this work, the state of knowledge on electron-interaction cross sections and electron-swarm parameters in SF^d6^ is comprehensively reviewed and c
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=7801
39.
Electron Interactions with BCL^d3^
Published: 12/1/2002
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: In this paper we review and assess the cross sections for collisions of low-energy electrons with boron trichloride (BCI3). The only available experimental cross section data are for partial and total ionization and electron attachment, and the elec
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=27780
40.
Electron Interactions with C2F6
Published: 1/1/1998
Authors: Loucas G. Christophorou, James K Olthoff
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=12125