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21.
Time-resolved Measurements of Ion Energy Distributions and Optical Emissions in Pulsed Radio-Frequency Discharges
Published: 3/1/2000
Authors: Yicheng Wang, Eric C Benck, Martin Misakian, M. Edamura, James K Olthoff
Abstract: In pulse-modulated inductively coupled plasmas generated in CF^d4^:Ar mixtures, a transition between a capacitive coupling mode (E mode) and an inductive coupling mode (H mode) was observed. For a pulsed plasma in a 50%CF^d4^:50%Ar volume mixture wi
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=9483
22.
Electron Interactions With SF^d6^
Published: 1/1/2000
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: Sulfur hexafluoride (SF^d6^) is commonly used as a gaseous dielectric and as a plasma etching gas. In this work, the state of knowledge on electron-interaction cross sections and electron-swarm parameters in SF^d6^ is comprehensively reviewed and c
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=7801
23.
Electron Interactions with CF^d3^I
Series: J. Phys. & Chem. Ref. Data (JPCRD)
Published: 1/1/2000
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: Low-energy electron collision data for the plasma processing gas CF^d3^I are sparse. Limited cross section data are available only for total and differential elastic electron scattering, electron-impact ionization, and electron attachment processes.
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=26781
24.
Electron Interactions with Plasma Processing Gases: An Update for CF^d4^, CHF^d3^, C^d2^F^d6^ and C^d3^F^d8^
Published: 12/1/1999
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: An update of electron-collision cross sections and electron transport parameters is presented for CF^d4^, CHF^d3^, C^d2^F^d6^, and C^d3^F^d8^.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=2666
25.
Ion-Molecule Reactions and Ion Energies in CF^d4^ Discharges
Published: 12/1/1999
Authors: B. Peko, I. V. Dyakov, R. Champion, MVVS. Rao, James K Olthoff
Abstract: Absolute cross sections have been measured for reactants typically found in carbon tetrafluoride (CF^d4^) discharges for collision energies below a few hundred electron volts. The reactions investigated include collision-induced dissociation and dis
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=15076
26.
Boltzmann Analysis of Electron Swarm Parameters in CF^d4^ Using Independently Assessed Electron-Collision Cross Sections
Published: 10/1/1999
Authors: M. C. Bordage, P. Segur, Loucas G. Christophorou, James K Olthoff
Abstract: Using independently assessed electron-collision cross sections, electron swarm parameters were calculated via the solution of the Boltzmann equation under the hydrodynamic regime. The cross sections used for the calculations were from a previously p
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=24276
27.
Electron Collision Cross Sections Derived from Critically Assessed Data
Published: 7/1/1999
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: Electron-molecule collisions are among the most fundamental processes in gas discharges. They are also the precursors of the ions and the radicals which drive the etch, cleaning, or deposition processes in plasma reactors. Hence, there is a need fo
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=4991
28.
Negative Ion-Neutral Reactions in Townsend Discharges
Published: 7/1/1999
Authors: James K Olthoff, MVVS. Rao
Abstract: Relative intensities and translational ion-flux energy distributions are presented for negative ions sampled from Townsend discharges in O^d2^, SF^d6^, and CF^d4^ for a high range of density reduced electric fields greater than 2 W 10^u-18^ V m^u2^ (
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=25977
29.
Studies of Ion Bombardment in High Density Plasmas Containing CF^d4^
Published: 7/1/1999
Authors: James K Olthoff, Yicheng Wang
Abstract: We report ion energy distributions, relative ion intensities, and absolute total ion current densities at the grounded electrode of an inductively coupled Gaseous Electronics Conference radio-frequency reference cell for discharges generated in pure
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=6462
30.
Electron Drift and Attachment in CHF^d3^ and its Mixtures With Argon
Published: 5/1/1999
Authors: Yicheng Wang, Loucas G. Christophorou, James K Olthoff, J. K. Verbrugge
Abstract: Measurements are reported of the electron drift velocity, w, in CHF^d3^ gas and in its mixtures with argon. The E/N dependence of w in the mixtures exhibits regions of distinct negative differential conductivity. A small electron attachment rate co
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=20509