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You searched on: Author: james olthoff

Displaying records 41 to 50 of 134 records.
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41. Electron Drift Velocities and Electron Attachment Coefficients in Pure CHF^d3^, and its Mixtures with Argon
Published: 12/1/1998
Authors: Yicheng Wang, Loucas G. Christophorou, James K Olthoff, J. K. Verbrugge
Abstract: Measurements are reported of (i) the electron drift velocity in pure trifluoromethane (CHF^d3^) gas and in its mixtures with argon, and (ii) electron attachment in pure CHF^d3^. The E/N dependence on the electron drift velocity in mixtures exhibits ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=3598

42. Conference Report: Gaseous Dielectrics VIII (Eighth International Symposium on Gaseous Dielectrics, Jun 2-5, 1998, Virginia Beach, VA)
Series: Journal of Research (NIST JRES)
Published: 9/1/1998
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: A brief conference report is given on the Eighth International Symposium on Gaseous Dielectrics. The meeting was held on June 2-5, 1998, at Virginia Beach, VA. It was attended by over 100 participants from 18 countries. Seventy-seven papers -- of whi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=24486

43. Electron Interactions with Plasma Processing Gases
Series: Special Publication (NIST SP)
Report Number: 926
Published: 8/1/1998
Authors: Loucas G. Christophorou, James K Olthoff
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=16721

44. Gases for Electrical Insulation and Arc Interruption: Possible Present and Future Alternatives to Pure SF^d6^
Series: Technical Note (NIST TN)
Published: 2/12/1998
Authors: Loucas G. Christophorou, James K Olthoff, David S. Green
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901712

45. Electron Interactions With Plasma Processing Gases: CF^d4^, CHF^d3^, C^d2^F^d6^, and C^d3^F^d8^
Published: 1/1/1998
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: A review of our efforts to evaluate and assess electron interaction data for the plasma processing community is presented. Specifically we present in this paper our recommended electron-interaction cross sections for CF^d4^, CHF^d3^, C^d2^F^d6^, and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=16418

46. Electron Interactions with C2F6
Published: 1/1/1998
Authors: Loucas G. Christophorou, James K Olthoff
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=12125

47. Electron Interactions with C3F8
Published: 1/1/1998
Authors: Loucas G. Christophorou, James K Olthoff
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=28266

48. Mass Spectrometric Measurement of Molecular Dissociation in Inductively-coupled Plasmas
Published: 1/1/1998
Authors: Yicheng Wang, Richard J. Van Brunt, James K Olthoff
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=14879

49. Gases for Electrical Insulation and Arc Interruption: Possible Present and Future Alternatives to Pure SF^d6^
Series: Technical Note (NIST TN)
Report Number: 1425
Published: 11/1/1997
Authors: Loucas G. Christophorou, James K Olthoff, David S. Green
Abstract: The electric power industry's preferred gaseous dielectric (besides air), sulfur hexafluoride (SF6) has been shown to be a greenhouse gas. In this report we provide information that is useful in identifying possible replacement gases, in the event t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=14202

50. Sulfur Hexafluoride and the Electric Power Industry
Published: 9/1/1997
Authors: Loucas G. Christophorou, James K Olthoff, Richard J. Van Brunt
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=29211



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