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Author: james olthoff
Displaying records 41 to 50 of 133 records.
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41.
Conference Report: Gaseous Dielectrics VIII (Eighth International Symposium on Gaseous Dielectrics, Jun 2-5, 1998, Virginia Beach, VA)
Series: Journal of Research (NIST JRES)
Published: 9/1/1998
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: A brief conference report is given on the Eighth International Symposium on Gaseous Dielectrics. The meeting was held on June 2-5, 1998, at Virginia Beach, VA. It was attended by over 100 participants from 18 countries. Seventy-seven papers -- of whi
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=24486
42.
Electron Interactions with Plasma Processing Gases
Series: Special Publication (NIST SP)
Report Number: 926
Published: 8/1/1998
Authors: Loucas G. Christophorou, James K Olthoff
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=16721
43.
Gases for Electrical Insulation and Arc Interruption: Possible Present and Future Alternatives to Pure SF^d6^
Series: Technical Note (NIST TN)
Published: 2/12/1998
Authors: Loucas G. Christophorou, James K Olthoff, David S. Green
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901712
44.
Electron Interactions With Plasma Processing Gases: CF^d4^, CHF^d3^, C^d2^F^d6^, and C^d3^F^d8^
Published: 1/1/1998
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: A review of our efforts to evaluate and assess electron interaction data for the plasma processing community is presented. Specifically we present in this paper our recommended electron-interaction cross sections for CF^d4^, CHF^d3^, C^d2^F^d6^, and
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=16418
45.
Electron Interactions with C2F6
Published: 1/1/1998
Authors: Loucas G. Christophorou, James K Olthoff
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=12125
46.
Electron Interactions with C3F8
Published: 1/1/1998
Authors: Loucas G. Christophorou, James K Olthoff
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=28266
47.
Mass Spectrometric Measurement of Molecular Dissociation in Inductively-coupled Plasmas
Published: 1/1/1998
Authors: Yicheng Wang, Richard J. Van Brunt, James K Olthoff
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=14879
48.
Gases for Electrical Insulation and Arc Interruption: Possible Present and Future Alternatives to Pure SF^d6^
Series: Technical Note (NIST TN)
Report Number: 1425
Published: 11/1/1997
Authors: Loucas G. Christophorou, James K Olthoff, David S. Green
Abstract: The electric power industry's preferred gaseous dielectric (besides air), sulfur hexafluoride (SF6) has been shown to be a greenhouse gas. In this report we provide information that is useful in identifying possible replacement gases, in the event t
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http://www.nist.gov/manuscript-publication-search.cfm?pub_id=14202
49.
Sulfur Hexafluoride and the Electric Power Industry
Published: 9/1/1997
Authors: Loucas G. Christophorou, James K Olthoff, Richard J. Van Brunt
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=29211
50.
Kinetic-Energy Distributions of Positive Ions Produced in Townsend Discharges of Oxygen at High Electric Field-to-Gas Density Ratios
Published: 7/1/1997
Authors: MVVS. Rao, Richard J. Van Brunt, James K Olthoff
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=23133