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Author: james olthoff

Displaying records 31 to 40 of 133 records.
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31. Ion Energy Distributions in Inductively Coupled Radio-Frequency Discharges in Argon, Nitrogen, Oxygen, Chlorine, and Their Mixtures
Published: 5/1/1999
Authors: Yicheng Wang, James K Olthoff
Abstract: We report ion energy distributions, relative ion intensities, and absolute total ion current densities at the grounded electrode of an inductively-coupled Gaseous Electronics Conference radio-frequency reference cell for discharges generated in pure ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=1506

32. Electron Interactions With Cl^d2^
Published: 4/1/1999
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: Low energy electron interactions with the Cl^d2^ molecule are reviewed. Information is synthesized and assessed on the cross sections for total electron scattering, total rotational excitation, total elastic electron scattering, momentum transfer, to ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=8765

33. Ion Energy Distributions and Sheath Voltages in Radio-Frequency-Biased, Inductively Coupled, High-Density Plasma Reactor
Published: 4/1/1999
Authors: Mark A Sobolewski, James K Olthoff, Yicheng Wang
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=23723

34. Ion Energy Distributions and Sheath Voltages in Radio-Frequency-Biased, Inductively-Coupled, High-Density Plasma Reactor
Published: 4/1/1999
Authors: Mark A Sobolewski, James K Olthoff, Yicheng Wang
Abstract: Ion energy distributions were measured at a grounded surface in an inductively-coupled, high-density plasma reactor for pure argon, argon-helium, and argon-xenon discharges at 1.33 Pa (10 mTorr), as a function of radio-frequency (rf) bias amplitude, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830610

35. Kinetic-energy Distributions of Positive and Negative Ions in Townsend Discharges in Oxygen
Published: 4/1/1999
Authors: MVVS. Rao, Richard J. Van Brunt, James K Olthoff
Abstract: Translational flux-energy distributions of positive and negative ions have been measured at high electric field-to-gas density ratios (E/N) up to 40 x 10^u-18^ V m^u2^ (40 kTd) in diffuse, parallel-plate Townsend discharges in oxygen using an ion ene ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=6288

36. Ion-Molecule Reactions and Ion Kinetics in DC Townsend Discharges in Dielectric Gases
Published: 1/1/1999
Authors: MVVS. Rao, James K Olthoff
Abstract: The transport of positive and negative ions plays an important role in the initiation and behavior of discharges in gaseous dielectrics. In many cases, the identities, intensities, and kinetic energies of ions are determined by ion-molecule collisio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=21154

37. Total Electron Scattering Cross Section for Cl^d2^
Published: 1/1/1999
Authors: Gary D. Cooper, Jason E. Sanabia, J. H. Moore, James K Olthoff, Loucas G. Christophorou
Abstract: Absolute measurements of the total electron scattering cross section for chlorine, Cl2, are reported for electron energies ranging from .3 eV to 23 eV. The present data are in reasonable agreement with previous measurements of the cross sections for ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=2608

38. A Search for Possible `Universal-Applications' Gas Mixtures
Published: 12/1/1998
Authors: Loucas G. Christophorou, James K Olthoff, David S. Green
Abstract: In an effort to respond to the recent concerns over the possible impact of SF^d6^ on global warming, we have searched for an SF^d6^ substitute gas that could be used in high voltage equipment instead of pure SF^d6^, with minimal changes in practice, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=19048

39. Applications of Electron-Interaction Reference Data to the Semiconductor Industry
Published: 12/1/1998
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: Many advanced plasma diagnostic techniques and plasma models require fundamental physical data in order to make accurate measurements or predictions. Fundamental electron-interaction data are among the most critical since electron collisions are the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=6001

40. Electron Drift Velocities and Electron Attachment Coefficients in Pure CHF^d3^, and its Mixtures with Argon
Published: 12/1/1998
Authors: Yicheng Wang, Loucas G. Christophorou, James K Olthoff, J. K. Verbrugge
Abstract: Measurements are reported of (i) the electron drift velocity in pure trifluoromethane (CHF^d3^) gas and in its mixtures with argon, and (ii) electron attachment in pure CHF^d3^. The E/N dependence on the electron drift velocity in mixtures exhibits ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=3598



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