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Author: james olthoff

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1. Fundamental Electron Interactions with Plasma Processing Gases
Published: 11/1/2003
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: This volume deals with the basic knowledge and undestanding of fundamtal interactions of low energy electrons with molecules. It provides an up-to-date and comprehensive account of the fundamental interactions of low energy energy electrons with mole ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31439

2. Electricity Division Programs, Activities, and Accomplishments
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6953
Published: 5/21/2003
Authors: James K Olthoff, Barry A. Bell
Abstract: This book describes the research programs, activities, and recent accomplishments of the Electricity Division organized by research project. After the project descriptions is a list of the calibration services that the Division provides, NRC Postdoct ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=30928

3. Electron Interactions with BCL^d3^
Published: 12/1/2002
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: In this paper we review and assess the cross sections for collisions of low-energy electrons with boron trichloride (BCI3). The only available experimental cross section data are for partial and total ionization and electron attachment, and the elec ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=27780

4. Electron Interactions with Plasma Processing Gases: Present Status and Future Needs
Published: 9/9/2002
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: The work conducted at the National Institute of Standards and Technology over the last 7 years on the systematic synthesis and assessment of fundamental knowledge on low-energy electron interactions with plasma processing gases is briefly summariezed ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=30830

5. Measured cross sections and ion energies for a CHF^d^3 discharge.
Published: 8/1/2002
Authors: B. Peko, R. Champion, MVVS. Rao, James K Olthoff
Abstract: Trifluoromenthane (CHF^d^3) is used in semiconductor plasma processing chambers to achieve high etch selectivity of an oxide layer over a silicon substrate. Such surface etching is governed by the ion and molecule fluxes near the surface, the concent ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=9195

6. Electricity Division Programs, Activities, and Accomplishments 2001
Series: NIST Interagency/Internal Report (NISTIR)
Published: 1/30/2002
Authors: James K Olthoff, Barry A. Bell
Abstract: A review of the Technical Accomplishments in the Electricity Division.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=20627

7. Electron Interactions with c-C4F8
Published: 7/1/2001
Authors: Loucas G. Christophorou, James K Olthoff
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=15944

8. Electron, Transport, Ionization and Attachment Coefficients in C2F4 and C2F4/Ar Mixtures
Published: 7/1/2001
Authors: Amanda N Goyettes, G. de Hann, Yicheng Wang, Loucas G. Christophorou, James K Olthoff
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=25327

9. Ion Compositions and Energies in Inductively Coupled Plasmas Containing SF6
Published: 7/1/2001
Authors: Amanda N Goyettes, Yicheng Wang, James K Olthoff
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=24749

10. Electron Transport, Ionization, and Attachment Coefficients in C^d2^F^d4^ and C^d2^F^d4^/Ar Mixtures
Published: 5/1/2001
Authors: Amanda N Goyettes, G. de Hann, Yicheng Wang, Loucas G. Christophorou, James K Olthoff
Abstract: This is a summary report of the paper to be published in the Journal of Chemical Physics. Measurements of electron transport, effective ionization, and attachment coefficients are reported for C^d2^F^d4^. In addition, measurements of the electron dr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=8575



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