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Author: thomas lucatorto
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Displaying records 31 to 40 of 101 records.
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31. Extreme Ultraviolet Metrology at SURF III
Published: 1/1/2001
Authors: Charles S Tarrio, Robert Edward Vest, S Grantham, Thomas B Lucatorto
Abstract: The last two decades have seen the development normal-incidence multiplayer mirrors and semiconductor photodiodes for extreme ultraviolet (EUV) radiation. Applications such as in astrophysics, lithography, and plasma physics, require precise calibra ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840120

32. Extreme-Ultraviolet Metrology at SURF III,
Published: 1/1/2001
Authors: Charles S Tarrio, Robert Edward Vest, Steven E Grantham, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101762

33. Facility for EUV reflectometry of lithography optics,
Published: 1/1/2003
Authors: Charles S Tarrio, Steven E Grantham, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101761

34. Facility for Extreme Ultraviolet Reflectometry of Lithography Optics
Published: 2/1/2003
Authors: Charles S Tarrio, S Grantham, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme-ultraviolet (EUV) optics is in lithography. A commercial extreme-ultraviolet stepper will likely have six or more normal-incidence reflective optics, and the largest of these will be tens of cm in d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840130

35. Facility for Pulsed Extreme Ultraviolet Detector Calibration
Published: Date unknown
Authors: Steven E Grantham, Robert Edward Vest, Charles S Tarrio, Thomas B Lucatorto
Abstract: All of the Extreme Ultraviolet light sources currently under consideration for Extreme Ultraviolet lithography are based on plasmas that emit radiation with a wavelength of approximately 13.4 nm. These sources whether they are produced by a discharg ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841761

36. First Results From the Updated NIST/DARPA EUV Reflectometry Facility
Published: 7/1/2002
Authors: S Grantham, Charles S Tarrio, M B Squires, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme-ultraviolet (EUV) optics is in lithography. A commercial extreme-ultraviolet stepper will likely have six or more normal-incidence reflective optics, and the largest of these will be tens of cm in d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840123

37. Improved Dose Metrology in Optical Lithograph
Published: 1/1/1996
Authors: C L Cromer, Thomas B Lucatorto, Thomas R. O'Brian, M Walhout
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=103703

38. Improved Dose Metrology in Optical Lithography,
Published: 1/1/1995
Authors: C L Cromer, Thomas B Lucatorto, Thomas R. O'Brian, M Walhout
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101491

39. Improved Radiometry For Extreme-Ultraviolet Lithography
Published: 11/1/2004
Authors: Charles S Tarrio, Robert Edward Vest, Steven E Grantham, K Liu, Thomas B Lucatorto, Ping-Shine Shaw
Abstract: The absolute cryogenic radiometer (ACR), an electrical-substitution-based detector, is the most accurate method for measurement of radiant power in the extreme ultraviolet. At the National Institute of Standards and Technology, ACR-based measurements ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840173

40. Improvements to the NIST/DARPA EUV Reflectometry Facility
Published: 1/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto, S Grantham, M B Squires, Uwe Arp, Lu Deng
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100201



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