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Author: thomas lucatorto
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Displaying records 91 to 100 of 109 records.
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91. The NIST EUV facility for advanced photoresist qualification using the witness-sample test
Published: 8/29/2011
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Lee J Richter, Thomas B Lucatorto, J. van Dijk, C. Kaya, N. Harned, R. Hoefnagels, M. Silova, J. Steinhoff
Abstract: Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be qualified to ensure that they will not excessively contaminate the scanner optics or other parts of the vacuum environment of the scanner. At the National Institute ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908029

92. The New NIST/DARPA National Soft X-Ray Reflectometry Facility,
Published: 1/1/1994
Authors: Charles S Tarrio, R N. Watts, Thomas B Lucatorto, M Haass, T A Callcott, J J Jia
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101765

93. The New UV Radiometry Facility at SURF
Published: 3/1/2002
Authors: Ping-Shine Shaw, Keith R Lykke, R Gupta, Uwe Arp, Thomas B Lucatorto, Albert C Parr
Abstract: The Synchrotron Ultraviolet Radiation Facility (SURF III) at the National Institute of Standards and Technology (NIST) provides a unique opportunity for high-accuracy VUV to visible radiometry with the completion of a recent upgrade to improve the un ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841980

94. Tomography of Integrated Circuit Interconnect With an Electromigration Void
Published: 5/1/2000
Authors: Zachary H Levine, A R Kalukin, M Kuhn, S P Frigo, I McNulty, C C Retsch, Y Wang, Uwe Arp, Thomas B Lucatorto, Bruce D Ravel, Charles S Tarrio
Abstract: An integrated circuit interconnect was subject to accelerated-life conditions to induce an electromigration void. The silicon substrate was removed, leaving only the interconnect encased test structure encased in silica. We imaged the sample wit ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840087

95. Tomography of Integrated Circuit Interconnects
Published: 10/1/2001
Authors: Zachary H Levine, A R Kalukin, M Kuhn, S P Frigo, I McNulty, C C Retsch, Y Wang, Uwe Arp, Thomas B Lucatorto, Bruce D Ravel, Charles S Tarrio
Abstract: 00 Word summary based on the paper:Z. H. Levine, A. R. Kalukin, M. Kuhn, S. P. Frigo, I. McNulty,>C. C. Retsch, Y. Wang, U. Arp, T. B. Lucatorto, B. D. Ravel, and C. Tarrio,>``Microtomography of Integrated Circuit Interconnect with an> Electromigra ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840113

96. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography
Series: Journal of Research (NIST JRES)
Published: 7/1/2003
Authors: Charles S Tarrio, S Grantham, M B Squires, Robert Edward Vest, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer EUV stepper mirrors require the highest attainable reflectivity a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841623

97. Towards high accuracy reflectometry for extreme-ultraviolet lithography,
Published: 1/1/2003
Authors: Charles S Tarrio, Steven E Grantham, M B Squires, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101861

98. Tracking down sources of carbon contamination in EUVL exposure tools
Published: 8/3/2009
Authors: Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto, R. Caudillo
Abstract: Optics in EUVL exposure tools are known to suffer reflectivity degradation, mostly from the buildup of carbon. The sources of this carbon have been difficult to identify. Vacuum cleanliness is normally monitored with a residual gas analyzer, but th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901665

99. UV Radiometry with Synchrotron Radiation and Cryogenic Radiometry,
Published: 1/1/1999
Authors: Ping-Shine Shaw, Keith R Lykke, R Gupta, Thomas R. O'Brian, Uwe Arp, H H White, Thomas B Lucatorto, J L Dehmer, Albert C Parr
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101716

100. UV radiometry using synchrotron radiation and absolute cryogenic radiometry
Published: 1/1/1999
Authors: Ping-Shine Shaw, Keith R Lykke, R Gupta, Thomas R. O'Brian, Uwe Arp, H H White, Thomas B Lucatorto, J L Dehmer, Albert C Parr
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104742



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