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Author: thomas lucatorto
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Displaying records 1 to 10 of 101 records.
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1. 100 Years of Optics at NIST: Science, Standards, and Service
Published: 1/1/2001
Authors: William R Ott, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100010

2. A Novel Approach to Resonance Ionization Mass Spectrometry Employing a Glow Discharge Atom Source
Published: 1/1/1996
Authors: X Xiong, J M Hutchinson, K R Hess, J D Fassett, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=103402

3. A Novel Approach to Resonance Ionization Mass Spectrometry Employing a Glow Discharge Atom Source,
Published: 1/1/1996
Authors: X Xiong, J M Hutchinson, K R Hess, J D Fassett, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101812

4. A Transmission X-Ray Microscope Based on Secondary-Electron Imaging,
Published: 1/1/1997
Authors: R N. Watts, S D Liang, Zachary H Levine, Thomas B Lucatorto, F Polack, M R Scheinfein
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101792

5. A synchrotron beamline for extreme-ultraviolet photoresist testing
Published: 9/30/2011
Authors: Charles S Tarrio, Steven E Grantham, Shannon Bradley Hill, Nadir Sabirovich Faradzhev, Lee J Richter, Chester Knurek, Thomas B Lucatorto
Abstract: Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be evaluated for sensitivity and tested to ensure that they will not contaminate the scanner optics. The new NIST facility described here provides data on the contami ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908231

6. Accurate Pattern Registration for Integrated Circuit Tomography
Published: 7/1/2001
Authors: Zachary H Levine, S Grantham, S Neogi, S P Frigo, I McNulty, C C Retsch, Y Wang, Thomas B Lucatorto
Abstract: As part of an effort to develop high resolution microtomography for engineered structures, a two-level copper integrated circuit interconnect was imaged using 1.83 keV x-rays at 14 angles employing a full-field Fresnel zone plate microscope. A major ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840063

7. Accurate Reflectometry for Extreme-Ultraviolet Lithography at the National Institute of Standards and Technology
Published: 12/1/2002
Authors: S Grantham, Charles S Tarrio, Thomas B Lucatorto
Abstract: The most demanding application of extreme ultraviolet (EUV) multilayer optics is in lithography. The optics in current alpha-class tools are large, and the multilayer coatings must have both optimized reflectance and extremely high uniformity. At N ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840143

8. Accurate pattern registration for integrated circuit tomography
Published: 1/1/2001
Authors: Zachary H Levine, Steven E Grantham, S Neogi, S P Frigo, I McNulty, C C Retsch, Ying-ju Wang, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101603

9. Accurate reflectometry for Extreme Ultraviolet Lithography at the National Institute of Standards and Technology
Published: 1/1/2002
Authors: Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101547

10. At-Wavelength Metrology for EUV Lithography at NIST
Published: Date unknown
Authors: Charles S Tarrio, Steven E Grantham, Robert Edward Vest, Thomas B Lucatorto
Abstract: The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mir ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841693



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