NIST logo

Publications Portal

You searched on: Author: thomas lucatorto Sorted by: date

Displaying records 31 to 40 of 111 records.
Resort by: Date / Title

31. First Results From the Updated NIST/DARPA EUV Reflectometry Facility
Published: 7/1/2002
Authors: S Grantham, Charles S Tarrio, M B Squires, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme-ultraviolet (EUV) optics is in lithography. A commercial extreme-ultraviolet stepper will likely have six or more normal-incidence reflective optics, and the largest of these will be tens of cm in d ...

32. Studies of Intensity Noise at Synchrotron Ultraviolet Radiation Facility III
Published: 3/1/2002
Authors: Uwe Arp, Thomas B Lucatorto, K Harkay, K Kim
Abstract: Suppression of beam instabilities has become an important goal at synchrotron radiation light sources, where highly sensitive applications like metrology, Fourier--transform spectroscopy and microscopy are now in use. We describe measurements connect ...

33. The New UV Radiometry Facility at SURF
Published: 3/1/2002
Authors: Ping-Shine Shaw, Keith R Lykke, R Gupta, Uwe Arp, Thomas B Lucatorto, Albert C Parr
Abstract: The Synchrotron Ultraviolet Radiation Facility (SURF III) at the National Institute of Standards and Technology (NIST) provides a unique opportunity for high-accuracy VUV to visible radiometry with the completion of a recent upgrade to improve the un ...

34. Accurate reflectometry for Extreme Ultraviolet Lithography at the National Institute of Standards and Technology
Published: 1/1/2002
Authors: Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto

35. Characterization of the response of chromium-doped alumina screens in the vacuum ultraviolet using synchrotron radiation,
Published: 1/1/2002
Authors: James K McCarthy, A Baciero, B Zurro, Uwe Arp, Charles S Tarrio, Thomas B Lucatorto, A Morono, P Martin, E R Hodgson

36. Studies of intensity noise at SURF III
Published: 1/1/2002
Authors: Uwe Arp, Thomas B Lucatorto, K Harkay, Kyoungsik Kim

37. Upgrades to the NIST/DARPA EUV Reflectometry Facility
Published: 12/1/2001
Authors: Charles S Tarrio, Thomas B Lucatorto, S Grantham, M B Squires, Uwe Arp, Lu Deng
Abstract: We have recently installed a new sample chamber at the NIST/DARPA EUV Reflectometry Facility at the National Institute of Standards and Technology. The chamber replaces a much smaller system on Beamline 7 at the Synchrotron Ultraviolet Radiation Fac ...

38. Tomography of Integrated Circuit Interconnects
Published: 10/1/2001
Authors: Zachary H Levine, A R Kalukin, M Kuhn, S P Frigo, I McNulty, C C Retsch, Y Wang, Uwe Arp, Thomas B Lucatorto, Bruce D Ravel, Charles S Tarrio
Abstract: 00 Word summary based on the paper:Z. H. Levine, A. R. Kalukin, M. Kuhn, S. P. Frigo, I. McNulty,>C. C. Retsch, Y. Wang, U. Arp, T. B. Lucatorto, B. D. Ravel, and C. Tarrio,>``Microtomography of Integrated Circuit Interconnect with an> Electromigra ...

39. Elimation of Intensity Noise at SURF III
Published: 8/1/2001
Authors: Uwe Arp, K Harkay, K Kim, Thomas B Lucatorto
Abstract: Most applications of synchrotron radiation are not very sensitive to source intensity fluctuations. Fourier-transform spectroscopy, however, is very sensitive to intensity noise with frequencies of few Hz to several kHz. An infrared spectrometer in ...

40. Accurate Pattern Registration for Integrated Circuit Tomography
Published: 7/1/2001
Authors: Zachary H Levine, S Grantham, S Neogi, S P Frigo, I McNulty, C C Retsch, Y Wang, Thomas B Lucatorto
Abstract: As part of an effort to develop high resolution microtomography for engineered structures, a two-level copper integrated circuit interconnect was imaged using 1.83 keV x-rays at 14 angles employing a full-field Fresnel zone plate microscope. A major ...

Search NIST-wide:

(Search abstract and keywords)

Last Name:
First Name:

Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series