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Author: thomas lucatorto
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Displaying records 21 to 30 of 109 records.
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21. Improved Radiometry For Extreme-Ultraviolet Lithography
Published: 11/1/2004
Authors: Charles S Tarrio, Robert Edward Vest, Steven E Grantham, K Liu, Thomas B Lucatorto, Ping-Shine Shaw
Abstract: The absolute cryogenic radiometer (ACR), an electrical-substitution-based detector, is the most accurate method for measurement of radiant power in the extreme ultraviolet. At the National Institute of Standards and Technology, ACR-based measurements ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840173

22. Facility for Pulsed Extreme Ultraviolet Detector Calibration
Published: 10/8/2003
Authors: Steven E Grantham, Robert Edward Vest, Charles S Tarrio, Thomas B Lucatorto
Abstract: All of the Extreme Ultraviolet light sources currently under consideration for Extreme Ultraviolet lithography are based on plasmas that emit radiation with a wavelength of approximately 13.4 nm. These sources whether they are produced by a discharg ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841761

23. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography
Series: Journal of Research (NIST JRES)
Published: 7/1/2003
Authors: Charles S Tarrio, S Grantham, M B Squires, Robert Edward Vest, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer EUV stepper mirrors require the highest attainable reflectivity a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841623

24. Facility for Extreme Ultraviolet Reflectometry of Lithography Optics
Published: 2/1/2003
Authors: Charles S Tarrio, S Grantham, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme-ultraviolet (EUV) optics is in lithography. A commercial extreme-ultraviolet stepper will likely have six or more normal-incidence reflective optics, and the largest of these will be tens of cm in d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840130

25. Facility for EUV reflectometry of lithography optics,
Published: 1/1/2003
Authors: Charles S Tarrio, Steven E Grantham, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101761

26. Towards high accuracy reflectometry for extreme-ultraviolet lithography,
Published: 1/1/2003
Authors: Charles S Tarrio, Steven E Grantham, M B Squires, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101861

27. Accurate Reflectometry for Extreme-Ultraviolet Lithography at the National Institute of Standards and Technology
Published: 12/1/2002
Authors: S Grantham, Charles S Tarrio, Thomas B Lucatorto
Abstract: The most demanding application of extreme ultraviolet (EUV) multilayer optics is in lithography. The optics in current alpha-class tools are large, and the multilayer coatings must have both optimized reflectance and extremely high uniformity. At N ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840143

28. Characterisation of the Response of Chromium-Doped Alumina Screens in the Vacuum Ultraviolet Using Synchrotron Radiation
Published: 12/1/2002
Authors: James K McCarthy, A Baciero, B Zurro, Uwe Arp, Charles S Tarrio, Thomas B Lucatorto, A Morono, P Martin, E R Hodgson
Abstract: We have measured the response of chromium-doped alumina screens to vacuum ultraviolet radiation and derived quantum efficiency curves for the energy range from 30 to 300 eV. A model is presented to explain the structure in this curve. In addition, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840027

29. First Results From the Updated NIST/DARPA EUV Reflectometry Facility
Published: 7/1/2002
Authors: S Grantham, Charles S Tarrio, M B Squires, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme-ultraviolet (EUV) optics is in lithography. A commercial extreme-ultraviolet stepper will likely have six or more normal-incidence reflective optics, and the largest of these will be tens of cm in d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840123

30. Studies of Intensity Noise at Synchrotron Ultraviolet Radiation Facility III
Published: 3/1/2002
Authors: Uwe Arp, Thomas B Lucatorto, K Harkay, K Kim
Abstract: Suppression of beam instabilities has become an important goal at synchrotron radiation light sources, where highly sensitive applications like metrology, Fourier--transform spectroscopy and microscopy are now in use. We describe measurements connect ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841549



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