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Author: thomas lucatorto
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Displaying records 101 to 108.
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101. XUV Optics Characterization at NIST,
Published: 1/1/1992
Authors: R N. Watts, Charles S Tarrio, Thomas B Lucatorto, R P. Madden, R Deslattes, Ariel Caticha, A Henins
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100210

102. XUV Optics Characterization at NIST,
Published: 1/1/1992
Authors: R N. Watts, Charles S Tarrio, Thomas B Lucatorto, R P. Madden, R Deslattes, Ariel Caticha, Albert Henins
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101843

103. National Institute of Standards and Technology Metrology for Soft-X-Ray Multilayer Optics,
Published: 1/1/1991
Authors: R N. Watts, D L Ederer, Thomas B Lucatorto, M Isaacson
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100212

104. National Institute of Standards and Technology Metrology for Soft-X-Ray Multilayer Optics,
Published: 1/1/1991
Authors: R N. Watts, D L Ederer, Thomas B Lucatorto, M Isaacson
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101839

105. Upgraded Facility for Multilayer Mirror Characterization at NIST, ed. by N.M. Ceglio
Published: 1/1/1991
Authors: R N. Watts, D L Ederer, R Deslattes, Thomas B Lucatorto, W T Estler, C J Evans, Theodore Vincent Vorburger
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100211

106. Upgraded Facility for Multilayer Mirror Characterization at NIST, ed. by N.M. Seglio
Published: 1/1/1991
Authors: R N. Watts, D L Ederer, R Deslattes, Thomas B Lucatorto, W T Estler, C J Evans, T V Vorburger
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=102936

107. Effect of Xenon Bombardment on Ruthenium-Coated Grazing Incidence Collector Mirror Lifetime for EUV Lithography
Published: Date unknown
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S Tarrio, Yaniv Barad, Steven E Grantham, Thomas B Lucatorto, Bryan Rice
Abstract: The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performance of mirrors is of vital importance for the performance of discharge- and laser-produced plasma extreme ultraviolet lithography (EUVL) sources. To s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840246

108. Optics for Extreme Ultraviolet Lithography
Published: Date unknown
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Thomas B Lucatorto
Abstract: Extreme Ultraviolet Lithography (EUVL) is considered by many to be the next generation lithography that will fabricate integrated circuits in the next decade. Although EUVL is conceptually similar to optical or deep-UV lithography, it represents a m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840225



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